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  • Sheet: Dip-In Laser Lithography (Dill)

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    muthurajan_h
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    Dip-in Laser Lithography (DiLL) is a novel 3D nano- and microfabrication technique developed by Nanoscribe that allows for high-resolution 3D patterning along the optical axis by directly dipping the high-NA objective lens into a liquid photoresist that serves as both the immersion medium and photosensitive material. DiLL is especially suitable for fabricating tall structures exceeding the objective's working distance and for patterning on opaque substrates. It offers constant homogeneity along the optical axis and is compatible with Nanoscribe's dedicated photoresists for producing structures over 100 micrometers tall.

    Descriere originală:

    This file contains the details about the photo resist used for Lithography application

    Titlu original

    Data Sheet of Lithography

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    Dip-in Laser Lithography (DiLL) is a novel 3D nano- and microfabrication technique developed by Nanoscribe that allows for high-resolution 3D patterning along the optical axis by directly dipping the high-NA objective lens into a liquid photoresist that serves as both the immersion medium and photosensitive material. DiLL is especially suitable for fabricating tall structures exceeding the objective's working distance and for patterning on opaque substrates. It offers constant homogeneity along the optical axis and is compatible with Nanoscribe's dedicated photoresists for producing structures over 100 micrometers tall.

    Drepturi de autor:

    Attribution Non-Commercial (BY-NC)
    Descărcați ca PDF, TXT sau citiți online pe Scribd
    Indicator pentru conținut neadecvat
    57 vizualizări1 pagină

    Sheet: Dip-In Laser Lithography (Dill)

    Încărcat de

    muthurajan_h
    Dip-in Laser Lithography (DiLL) is a novel 3D nano- and microfabrication technique developed by Nanoscribe that allows for high-resolution 3D patterning along the optical axis by directly dipping the high-NA objective lens into a liquid photoresist that serves as both the immersion medium and photosensitive material. DiLL is especially suitable for fabricating tall structures exceeding the objective's working distance and for patterning on opaque substrates. It offers constant homogeneity along the optical axis and is compatible with Nanoscribe's dedicated photoresists for producing structures over 100 micrometers tall.

    Drepturi de autor:

    Attribution Non-Commercial (BY-NC)
    Descărcați ca PDF, TXT sau citiți online pe Scribd
    Indicator pentru conținut neadecvat
    din 1

    DATA SHEET

    DIP-IN LASER LITHOGRAPHY (DILL)


    Dip-in Laser Lithography (DiLL) is a novel concept for nano- and microfabrication developed by Nanoscribe, allowing for three-dimensional (3D) patterning with optimal homogeneity along the optical axis. In the DiLL process, the objective lens is directly dipped into a liquid photoresist which serves as immersion medium and photosensitive material at the same time. The height of structures may even exceed the working distance of the high-NA objective. DiLL is especially suitable for fabricating tall structures (compared to the objective lens working distance) and for high-resolution patterning on opaque substrates.

    TECHNOLOGY & FEATURES


    Patent-pending Dip-in technology for liquid photoresists Upgrade to Nanoscribe's Photonic Professional lithography systems Constant homogeneity along the optical axis Perfect match with Nanoscribes dedicated IP-L and IP-L 780 photoresist Tall structures with high resolution
    100 m

    50 m

    Gallery of structures manufactured by using DiLL.

    40 m

    Calculated laser intensity distribution of the laser focus within an indexmatched photoresist.

    CONTACT

    Nanoscribe GmbH Tel +49 721 60 82 88 40 Hermann-von-Helmholtz-Platz 1 Fax +49 721 60 82 88 48 76344 Eggenstein-Leopoldshafen Germany E-Mail Web sales@nanoscribe.de www.nanoscribe.de

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