ZAD

SILICIN WAFER CLEANING

PREPARATION AND
DRYING

(ZINC ACETATE
DEHYDRATE)

PrOH

PrOH

OXIDATION BY PASSING DRY

O2 FOR 30 MIN FOR
FORMING SI02 DRYING

ETHANOL

ACETIC
ACID

STIRRING: 30 MIN

MEA

MIXTURE

AL PLATING AT BOTTOM
OPPOSITE SIDE BY
SPUTTERING

MIXTURE

DEA

MIXTURE

STIRRING AT 60 C
FOR 2HRS

TRANSPARENT
SOLUTION

AGING 24 HRS

ROUTE 1

ROUTE 4

ROUTE 3

DRAINAGE COATING

ROUTE 2

TRANSPARENT
SOLUTION

DIP COATING

REPEAT
WET
FILM

DRYING AT 100OC FOR 30 MIN

ZNO
THIN FILM

AGING AT 650C IN
WATER BATH FOR 2
HRS

TRANSPARENT
SOLUTION

REPEAT
WET
FILM

DRYING AT 100 O C FOR 30 MIN

ZNO
THIN FILM

ZNO
THIN FILM

PALLADIUM
CHLORIDE

ALUMINIUM ELECTRODE
FABRICATION

ETHANOL

MIXTURE
STIRRING FOR 30 MIN

DRAINAGE COATING

CONNECTIN WIRES TO THE

ELECTRODE THEN MEASURING
RESISTANCE BY MULTIMETR

HYDROGEN GAS SENSOR AND

TEST SET UP FEBRICATION AND