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IN
MOSFETS
Contents
Channel Length Modulation / Velocity Saturation
Threshold Voltage
Vt Variation:
SCE / RSCE
NCE / RNCE
Body bias
Leakage current mechanisms in MOSFETs
PN junction reverse bias leakage
Subthreshold leakage
Gate oxide tunneling
Injection of hot carrier
Drain Induced barrier Lowering(DIBL)
Gate induced drain leakage(GIDL)
Punchthrough
I D =K
W
V GSV T 2 1 V DS [1]
L
Where, we have
L
L
Thus the modulation parameter has higher value for short channels.
=
mirror
VDD
ID2
ID1
M2 VDS2
M1
VGS
I D2 12 V GS
=
I D1 12 V DS2
R OUT =
1
I D2
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Velocity Saturation
At higher V DS velocity of charge carrier saturates.
The results in linear dependence of the drain current on V GS V T
The value of transconductance(g m) becomes constant
Thus the Value of VDSAT< VGS- VT
Threshold Voltage
Threshold Voltage:
The value of gate to source voltage required to cause surface inversion for
channel formation is called threshold voltage.
C OX C OX
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Threshold Voltage
VG=0
Vt>VG>0(Depletion)
VG>Vt(Strong Inversion)
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Vt variation in an MOS
There are various trends seen in threshold voltage variation with scaling of MOS
transistors.
Various secondary effects leading to Vt variation in MOSFETs can be:
Body Bias
Short Channel effect(SCE)
DIBL
Reverse short channel effect(RSCE)
Narrow channel effect(NCE)
Reverse narrow channel effect(RNCE)
VDD
M2
M1
ID2
ID1
VDS
I D2 V GS V T1
=
I D1 V GS V T2 2
VGS
Body bias
Body bias or back gate effect is the name given to the change in threshold
Where,
VTN is the threshold voltage with substrate bias.
VTO is threshold voltage with substrate bias zero.
is the body effect parameter.
2 is the surface potential parameter.
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source voltage.
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doping).
In short channels halo doping of source and drain overlaps.
Threshold voltage is high as channel doping is higher.
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Fig:STI MOSFET
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Leakage mechanisms
Leakage Currents result in higher power consumption
Various Leakage current mechanisms in MOSFETs are:
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Subthreshold Leakage
Subthreshold or weak inversion conduction current is a mechanism of current
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Fig: FN tunneling
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Fig:Direct Tunneling
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elsewhere.
When the negative gate bias is large, the n+ drain region under the gate can be
depleted or even inverted
This causes more crowding and hence effects like avalanche multiplication and
BTBT.
Thinner Gate,Higher VDD, Moderately doped Drain has more GIDL.
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Punchthrough
In Short channel devices the source and drain depletion regions extend into the
channel.
Increase in reverse bias also pushes the depletion regions closer.
Punchthrough occurs when both the depletion regions touch each other.
Even if the channel is heavily doped, punchthrough may occur below it.
Due to punchthrough subthreshold current increases
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Drain extended by adding a drift region with similar doping between drain
and the intended channel.
Traps the majority of the lateral electric field,limiting the hot carrier effect to
this region,instead of the channel.
This improves the V DS breakdown voltage.
Increases the channel resistance.
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References
[1] Sung-Mo Kang, Yusuf Leblebici, Cmos Digital
Circuits.Reading,Tata Mcgraw Hills, 2003, ch. 3, pp. 107109.
Integrated
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Thank You
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BACKUP SLIDES
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EB diagram VG = 0
Assumptions:
P-type Substrate.
M=Si (Work function of metal & Semiconductor are Same)
No Trapped Charges in Oxide.
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EB diagram VG<0
Accumulation:
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Eb diagram VG>0
Depletion:
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EB diagram VG>>0
Inversion,Strong Inversion:
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QB
V th=2 F
C OX
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V th= MS 2 F
Q B Q OX
C OX C OX
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(DENMOS)
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