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1.Introduction
GNR,theBoltzmanntheorycanbeapplied,justattheprice
of assuming that only intraband transitions contribute to
theconductivity,whichistrueuptotheterahertzrange.
InthecaseofGNRlyingoveraconductingsubstrate,we
addresstheissuethatwithjustoneatomiclayerorafew
layers if double or three layer graphene is considered a
continuumofenergystatesaroundtheFermilevelofthe
substrate is induced in the GNR by the exponential tails
of the substrate wavefunctions. Thus, the GNR Fermi
levelonlyalignstotheconductorFermilevel,movingup
ordowndependingonitsinitialposition,andthisresults
in a sort of n or ptype doping for the GNR [2123].
Hence, the potential distribution has to be computed
accounting for proper boundary conditions at the
electrodes, determined by work functions and applied
voltages.
2.Deviceundertestandmodelling
}
+ =
i
i i
dE
A
E y x
E f
A
E y x
E f e Q )
) , , (
) (
) , , (
) ( (
2
2
2
2
2
2
1
1
( ) t
jkL
r
T
e H
E f
A
+
=
Im 4
) (
approach is equivalent to the NEGF, but, in our opinion,
it better highlights the physical behaviour of the system,
because:i)itmakesuseofelectronicmodesthatareeasily
normalized with respect to the physical current, ii) it
considers the physical ports of graphene circuits by the
same standard as the virtual ports, i.e., all the accessible
electronic wavefunctions, iii) it treats all the ports as
adapted ones, i.e., transparent or perfect absorbing, iv) it
allows an easy check of the lossless and reciprocity
constrains involved in charge transport through the
scattering matrix properties, v) it allows the use of
concepts wellknown in the microwave and RF
community, such as cascade of transmission lines,
transformers, lumped circuit elements, etc., all useful in
order to model long graphene structures eventually
containing defect, bending, discontinuities and
electrostaticperturbations.
( ) | ) (
0
+ = + + E H H H
r l
(1)
( )
=
+ = + +
i
i i i
jky
jkL
r
jkL
l
y y x x e
E e H H e H
) , (
) (
0
o
|
(2)
whereispanstheatomicsites,kisthewavenumberandL
is the length of the unit cell. The solutions of (2),
corresponding to different branches of the dispersion
curves, can be distinguished as propagating modes for
realk,andevanescentmodesforcomplexorimaginaryk.
In order to provide the correct mode normalization,
wavefunctionshavetobedividedby:
(3)
(4)
drain
z
Graphenenanoribbon V
G
G
SiO2
y
x
Drain
Source
2 respectively, e=1.610
19
C. The charge density (4) is
assumed as source term in the familiar Poisson equation
forthepotentialV.
q j i
j i
pq q p p
dE E S E f E f
h
e
I
, ,
,
) ( ) ( ) (
2
(5)
where S
i,j
pq is the scattering coefficient from mode i to
modejandfromportptoportq.
a)
b)
Figure1.a)GNRFET;b)definitionofmGNR.
3.Simulationresults
InthesimulationsofFig.2,theboundaryconditionsaregiven
by:Vg=0V,Vrangesfrom0to0.4V.Eachcurvecorresponds
to a different metal work function, ranging from 4.1eV to
4.35eV.TheGNRworkfunctionisassumed4.5eV.
1 2 m
x
mGNR
y
Nanomater. nanotechnol., 2012, Vol. 2, Art. 12:2012 4
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0
0
0.02
0.04
0.06
0.08
0.10
0.12
0.14
I
(
m
A
)
Figure2.a)IV
Figures 2 and
the metal d
functionredu
behaviour at
this particul
sensitivityof
Figure3.Comp
consistent(dot
The explana
graphically i
higher valu
graphene,i.e
In the situati
increase of t
injectedfrom
In the situati
the Fermi le
electrons to
contacts, so
Actually,the
according to
the overall
observedinF
situation d),
similar to b)
secondsubb
I
(
m
A
)
0.1
Vcharacteristicf
d 3 above sho
doping increa
uces.Thereis
t V=0.1V: in th
lar situation
fthecurrentto
parisonbetween
dashed)calculat
ation is quite
in Fig. 4(bd),
es of the F
e.,smallervalu
ion of Fig. 4(b
the Fermi lev
mtheleftconta
ion c), marked
evel is ineffe
be injected
that the net
echargedensi
selfconsisten
IV character
Fig.3,thiseffe
marked by a
) is reproduce
band.
0
0
0.02
0.04
0.06
0.08
0.10
0.12
0.14
I
(
m
A
)
0.2
V (V)
fordifferentval
ow that the cu
ases, i.e., as
howeverana
he figure below
where there
othemetalwo
nselfconsistent(
tion:thedifferen
simple and
where the ar
Fermi level o
uesofthemeta
b), marked by
el allows mo
actsothatthe
d by a red cir
ective because
both from th
t current rem
ityinthechan
ncy, also the l
ristic change,
ectisnotvery
a green circle,
ed, but now j
0.1
0.3
luesofmetalwo
urrent increase
the metal w
apparentlystr
w we mark in
is no signifi
orkfunction.
(dashed)andno
nceisquitesmall
can be resu
rrows point to
of the conta
alworkfuncti
y a blue circle
re electrons t
ecurrentincre
rcle, an increa
e it allows m
he left and r
mains unchan
nnelchanges,
ocal potential
, but, as alre
yimportant.In
, again a situa
just involving
0.2
V (V)
0.4
orkfunction(W
es as
work
ange
n red
icant
otself
.
umed
o the
acted
ion.
e, an
to be
eases.
se of
more
right
nged.
and,
l and
eady
nthe
ation
g the
Figu
decr
indic
a
b)
0.3
WF):highercurve
ure 4. a) zoom
reasingmetalw
catedbythearr
a)
d)
0.4
escorrespondto
m of Fig. 1(a)
orkfunction,i.e
rows,isassumed
osmallerworkf
at V=0.1V; fro
e.,anincreasing
dinthecalculat
functions.
om b) to d), a
gFermilevel,as
tion.
c)
a
s
Davide Mencarelli and Luca Pierantoni: Analysis of the Metal Work Function
Dependence of Charge Transfer in Contacted Graphene Nanoribbons
5
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4.Conclusions
5.References
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Nanomater. nanotechnol., 2012, Vol. 2, Art. 12:2012 6
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Davide Mencarelli and Luca Pierantoni: Analysis of the Metal Work Function
Dependence of Charge Transfer in Contacted Graphene Nanoribbons
7
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