Documente Academic
Documente Profesional
Documente Cultură
Center of Nanoelectronic Systems y for Information Technology (IFF-IEM) 2A.F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, 194021, St. Petersburg, Russia
Outline
Electron Tunneling and Junctions (Overview) F Ferroelectric l ti T Tunnel lJ Junctions ti Size Effects and Boundary Conditions Tunnel Junction: An Interfacial Device A novel zoo of Tunnel Junctions
kx real
A
e
kx
imaginary
kx
real
C
x
B
Transmission coefficient
t 2 = T C exp 2m ( x) dx h 0
Frenkel, Phys. Rev. 36 (1930).; A. Sommerfeld and H. Bethe, Handbuch der Physik, Springer 1933, XXIV, p.450 R. Holm and W. Meissner, Z. Phys. 74, 715 (1932).
Eg
R/R
V
Sommerfeld/Frenkel/Holm
Giaever/Josephson
Esaki
Superconductor
Superconductor
Magnet
Magnet
I (V ) =
2 e A h
T ( E ) n1 ( E eV ) n2 ( E ) [f ( E eV ) f ( E )]dE
Ferroelectric tunnel junction:
Metal Metal
Ferroelectric Barrier
Patent Experiment
SrRuO3
e-
++++++++++++++++++++++++
---------------------------------4 nm
SrRuO3
x1 2 = T C exp e p 2m ( x ) dx d x0 h
t = to + d 33 V
-VC
VC
Voltage
h 0 + 3 S 33 EC = EC
k z2 =
2m *
2
0 EC Ez
)
3
Deformation Potential: Brooks 1955, Herring 1956, Kane 1970
c Change of the electron effective mass c. a: lattice parameter, Tight binding approx. 2h * m = 2 ,k =0 * * * m d 33 V * * m a EC m = m0 + S33 = m0 + S33 S 33 t0
Interfacial Effect
Symmetric barrier structure I t t`
1 1 2
2 1
Electrode
Ferroelectric Electrode
S Symmetric t i I-V IV
I
variable fixed
b = (1 + 2 ) / 2
2
V
Asymmetric I-V
+ + + +
FE
P
Metal
Metal
+ + + +
FE
P
Metal
Electrostatic Potential
Tunneling Potential
EF
EF
BaTiO3: 5nm
SrRuO3 BaTiO3 SrRuO3 SrTiO3
E (kV/cm) (kV/ ) 16 14
P (C C/cm )
2
E (KV/cm)
800 1200
30 20 10 0 -10 -20 -30 -1200 -800 -400 0 400 800 1200
400
@100 Hz H
12 pF) C (p 10 8 6 4 2 f=1000 Hz@ 300K -0,6 -0,4 -0,2 0,0 U (V) 0,2 0,4 0,6
-0.6
-0.4
-0.2
0.0
0.2
0.4
0.6
U (V)
-0,5
0,0
U (V)
0,5
1,0
PbZr0.52Ti0.48O3 SrRuO3
1000
0.2
t [mA] Current
6 nm PZT
0.0
8 5
4 1
0.0
@300 K
-0.5 0.0 0.5
-0.4 1.0
-1.0
Voltage [V]
No direct (elastic) tunnling Switching not caused by ferroelectricity! K. Szot et al., Nature Mat. 2006
SrTiO3
1
12 1999
Tybell (PZT)
4
Streiffer (P S PTO)
Year
0.4 nm
Junquera an nd Gh hosez (BT TO) Strei iffer (PTO O) Lichtenste L eiger (PTO O) Kim (BTO) an (PZT) Nagaraja Ra appe (PTO O) Gerr ra (BTO)
5 nm
Film
Sm = (b a0)/b
b = Substrate lattice parameter a0 = Equiv. cubic cell constant of free film, Prototypic cell
Metal
_____________________
+++++++++++++++++++++
E ds = 0
ED 0
(only for
ED
perfect screening!!)
P. Wrfel and I. P. Batra , Ferroelectrics 12, 55 (1976). J. Juncquera and Ph. Ghosez, Nature 422, 506 (2003).
+++++++++++++++++++++
_____________________
Metal
Tunneling g electrons are extremely y sensitive to barrier and interface properties!! examples? examples?
Magnons
J. S. Moodera, PRL 1998
n-Si/SiO2/Al
Nb/MgO/Ag
Co/Al2O3/Ni80Fe20
3 nm SrTiO3 barrier
Y. Lu et al., PRB 54, R8357 (1996).
Spinpolarization influenced by Barrier Material J. M. De Teresa et al., Science 286, 507 (1999).
Ch. Heiliger et al Ch al., Phys. Rev. B 73, 214441 2006 , G. Mathon J. S. Moodera, JMMM 200, 248 (1999).
Metal
_____________________
+++++++++++++++++++++
E ds = 0
ED 0
(only for
ED
perfect screening!!)
P. Wrfel and I. P. Batra , Ferroelectrics 12, 55 (1976). J. Juncquera and Ph. Ghosez, Nature 422, 506 (2003).
+++++++++++++++++++++
_____________________
Metal
CTF
Extension E t i of f the th ionic i i polarization l i ti into the metal; Ionic distortion also in the metal Sketch taken from G. Gerra et al., PRL 96. 107603 (2006). Fig.1
Fe/BaTiO3
P P
Interface between a ferromagnet g and a ferroelectric
Top interface
DOS
Paraelectric BTO
Bottom interface
Ferroelectric BTO
C.-G. Duan, S.S. Jaswal and E. Y. Tsymbal, PRL 97, 047201 (2006).
EF
BaTiO3
SrRuO3
Magnet or S Superconductor d t
TMR vs. P?
Josephson-Effects vs. P?
The (ferroelectric) Th (f l t i ) polarization l i ti might i ht modify the spin polarization and superconducting order parameter ( 0.1 nm) (at the interfaces)
Tunneling magneto resistance as well as quasiparticle current and Josephson current should depend on P!
+ + + -
Ferroelectric Anti-ferroelectric
Multiferroic (I (Insulator) l t ) (Tunnel Barrier)
+ + + -
Magnetic g Anti-ferromagnetic
Josephson-Junction Josephson Junction with a ferroelectric barrier dc and ac Josepson Effect vs. P? Magnetic Tunnel Junction Tunnel Magneto Resistance vs. P?
E. Y. Tsymbal and H. Kohlstedt, Science 2006
More about Multiferroics: N A N. A. Spaldin and M M. Fiebig Fiebig, Science (2005). R. Ramesh et al R al. Phil Mag. Lett. (2007). W. Eerenstein, e e ste , N. D. Mathur, at u , J. F. Scott Nature (2006).
Conclusion
Quantum Mechanical Electron Tunneling and M ltif Multiferroic i Materials: M t i l of new tunnel junctions j New Functionalities Will propel exciting theoretical approaches Tunneling T li Electrons El will ill be b applied li d as an analytical l i l tool l Better understanding of multiferroic materials on the nm level Multiple size effects Challenge: Defect free/ideal ferroelectric tunnel barriers, I- V curves alone are not sufficient to extract I the underlying switching mechanism There is a gap between theory and experiment!
Development p
Acknowledgement Sponsors:
Volkswagen-Foundation: N Nano-sized i df ferroelectric l ti h hybrids b id under d contract t t number b I/77 737 Joint NSF-DFG Project: University of Berkeley (Material Science Department) University of Aachen (RWTH) Research Center Juelich DFG: Displacive and Conductive Phenomena in Ferroelectric Thin Films: Scaling effects and switching properties properties Synchrotronstrahlungsexperimente zu Skalierungseffekten und ungewhnlichen g Phasen epitaktischer, p ,p perowskitscher Schichten