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Micro-Measurements

PhotoStress Instruments

Tech Note TN-702-2

Introduction to Stress Analysis by


the PhotoStress Method
1.0 General Information
PhotoStress is a widely used full-field technique for
accurately measuring surface strains to determine the
stresses in a part or structure during static or dynamic
testing.
With the PhotoStress method, a special strain-sensitive
plastic coating is first bonded to the test part. Then, as
test or service loads are applied to the part, the coating is
illuminated by polarized light from a reection polariscope.
When viewed through the polariscope, the coating displays
the strains in a colorful, informative pattern which
immediately reveals the overall strain distribution and
pinpoints highly strain areas. With an optical transducer
(compensator) attached to the polariscope, quantitative
stress analysis can be quickly and easily performed.
Permanent records of the overall strain distribution can be
made by photography or by video recording.
With PhotoStress, you can . . .
Instantly identify critical areas, highlighting
overstressed and understressed regions.
Accurately measure peak stresses and determine stress
concentrations around holes, notches, llets, and
other potential failure sites.
Optimize the stress distribution in parts and
structures for minimum weight and maximum
reliability.
Measure principal stresses and directions at any point
on the coated part.
Test repeatedly under varying load conditions,
without recoating the part.
Make stress measurements in the laboratory or in the
field unaffected by humidity or time.

Detect yielding, and observe redistribution of strains


in the plastic range of deformation.
PhotoStress coatings can be applied to the surface of
virtually any test part regardless of its shape, size, or
material composition. For coating complex shapes (see
Figure 1), liquid plastic is cast on a at-plate mold and
Document Number: 11212
Revision 29-Jun-2011

allowed to partially polymerize. While still in a pliable


state, the sheet is removed from the mold and formed by
hand to the contours of the test part (shown below). When
fully cured, the plastic coating is bonded in place with
special reective cement, and the part is then ready for
testing. For plane surfaces, pre-manufactured flat sheets
are cut to size and bonded directly to the test part. See
Application Notes IB-221 and IB-223.
PhotoStress has an established history of successful
applications in virtually every field of manufacture and
construction where stress analysis is employed, including:
automotive, farm machinery, aircraft and aerospace,
bu i ldi ng constr uction, eng i nes, pressure vessels,
shipbuilding, office equipment, bridges, appliances, plus
many others.

2.0 Polarized Light Fundamentals


Light or luminous rays are electromagnetic vibrations
similar to radio waves. An incandescent source emits
radiant energy which propagates in all directions and
contains a whole spectrum of vibrations of different
frequencies or wavelengths. A portion of this spectrum,
wavelengths between 400 and 800 nm [15 and 30 10 -6 in],
is useful within the limits of human perception.
The vibration associated with light is perpendicular to the
direction of propagation. A light source emits a train of
waves containing vibrations in all perpendicular planes.

For technical support, contact


photostress@vishaypg.com

www.micro-measurements.com
1

Tech Note

Identify and measure assembly stresses and residual


stresses.

Figure 1. PhotoStress coating being contoured to the


surface of a vehicle water pump casting

Tech
Note
TN-702-2
Tech
Note
TN-702-2
Vishay
Micro-Measurements
Vishay
Micro-Measurements

TN-702-2

Method
Tech
Note TN-702-2
Introduction
Stress
Analysis
the
PhotoStress
Introduction
toto
Stress
Analysis
byby
the
PhotoStress
Method
Micro-Measurements
Vishay Micro-Measurements

Introduction
StressAnalysis
Analysis by
by the

Introduction
to to
Stress
the PhotoStress
PhotoStressMethod
Method

Figure
2. Polarization
of light.
Figure
2. Polarization
of light.
Figure 2. Polarization of light

lter).
Such
an organized
beam
is called
polarized
Brewster's
established
The
relative
change
the the
lter).
Such
an organized
beam
is called
polarized
lightlight
Brewster's
law law
established
that:that:
The
relative
change
in in
or
"plane
polarized"
because
vibration
is contained
index
of refraction
is proportional
to
the difference
of prinBrewster's
lawisestablished
that:
The
relativeofchange
in
However,
by thebecause
introduction
of a polarizing
filter
or "plane
polarized"
the the
vibration
is contained
in inP index
of refraction
proportional
to the
difference
prinplane.
Ifonly
another
polarizing
is vibrations
placed
itswill
way,
strains,
index
of refraction
is proportional to the difference of
(Figure
one
component
of
be cipalcipal
one one
plane.
If 2),
another
polarizing
lterlter
A these
isAplaced
in itsinway,
strains,
or: or:
Figure
2.the
Polarization of light.
complete
extinction
of the
bethe
obtained
when
principal strains, or:
transmitted
(that
is beam
parallel
privileges
axis
of
complete
extinction
ofwhich
the
beam
can can
beto
obtained
when
the
nyK =K
nx nnxy =
(2) (2)
of two
the Such
two
lters
are perpendicular
to one
another. light
x xy y
the
filter).
anare
organized
beam to
is called
polarized
axesaxes
of the
lters
perpendicular
one
another.
(n

n
)=K(

)




(2) in
x
y
x
y
the
an organized
is called polarized
lightin
Brewster's law established that: The relative change
or lter).
"planeSuch
polarized"
becausebeam
the vibration
is contained
Light
propagates
a vacuum
in at
airaat
a contained
speed
Light
propagates
in ain
vacuum
or inor
air
speed
C ofC3ofin3
orone
"plane
polarized"
because
the
vibration
is
index
of
refraction
is
proportional
to
the
difference
of
princonstant
isis called
coefficient
plane. If another polarizing filter A is placed in its way, TheThe
constant
K isKKcalled
the the
strain-optical
coefficient
The
constant
called
the strain-optical
strain-optical
coefficient
10
cmsec.
In other
transparent
bodies,
the
speed
V is
1010
cmsec.
In
other
transparent
bodies,
the
speed
V isway,
10
one
plane.
If
another
polarizing
lter
placed
in when
its
strains,
or:
and
characterizes
a physical
physical
property
ofthe
the
material.
complete
extinction
of the beam
canAbeis obtained
the andcipal
characterizes
a physical
property
of of
the
material.
ItIt isIta
and
characterizes
a
property
material.
lower
the
is beam
called
the
index
of refraction.
In
lower
andand
theextinction
ratioratio
CVCV
called
the can
index
refraction.
Inthe
complete
ofis are
the
beof
obtained
when
a dimensionless
constant
usually
established
by
calibraaxes of the
two filters
perpendicular
to one another.
is a isdimensionless
dimensionless
constant
usually
established
by
calibraconstant usually established by calibration
a homogeneous
body,
this
index
is constant
regardless
of the
a homogeneous
body,
thisare
index
is constant
regardless
of the
nx nmay
=K
considered
(2)
x y similar
axes
of the two
lters
perpendicular
to one
another.
be
similar
tothe
the
gage
factor
tiontion
andand
may
to to
the
gage
factor
of ofof
and
mayybe
be considered
considered
similar
gage
factor
direction
of
propagation
or
plane
of
vibration.
However,
in
Lightofpropagates
inora plane
vacuum
or in air at
a speedinC of
direction
propagation
of vibration.
However,
resistance
strain
gages.
Combining
above,
strain
gages.
Combining
the the
expressions
above,
resistance
strain
gages.
Combining
the expressions
expressions
above,
propagates
in aupon
vacuum
or orientation
in bodies,
air atof
a speed
C ofV3is resistance
crystals
the
index
depends
upon
the
of speed
vibration
cmsec.
In
other
transparent
the
3 Light
the
1010index
crystals
depends
the orientation
vibration
The
constant K is called the strain-optical coefficient
we
have:
we
have:
10
we
have:
cmsec.
Inaxis.
other
transparent
bodies,
the
speed
VIn
is a
with
10 respect
toratio
index
axis.
materials,
plastics
lower
and
CV
isCertain
called
the
index
ofnotably
refraction.
with
respect
to the
index
Certain
materials,
notably
plastics
and characterizes a physical property of the material. It
lower
and
the ratio
CV
is index
called
index
ofregardless
refraction.
behave
isotropically
when
unstressed
but
become
optically
homogeneous
body,
this
isthe
constant
of In
the
behave
isotropically
when
unstressed
but
become
optically

in
transmission
by calibra(3)(3)
= tK
in transmission
= tK
xy y inusually
transmission
(3)
is a dimensionless
established
x constant
aanisotropic
homogeneous
body,
this
is constant
regardless
of the
when
stressed.
The
change
invibration.
index
of refraction
direction
of
propagation
or plane
However,
anisotropic
when
stressed.
Theindex
change
in of
index
of refraction
tion
and
may
be
considered
similar
to
the
gage
factor
of

in reflection (light passes
of
orstrain,
plane
of
vibration.
However,
inof
isfunction
function
of the
resulting
strain,
analogous
to the
resisina crystals
the
index
depends
upon
thetoorientation
is adirection
of propagation
the
resulting
analogous
the
resis2tK
= 2tK
in reflection
(light
passes
(4)(4)

= strain

xy Combining
(light
passes
(4)
resistance
gages.
the
expressions
above,
y in reflection
x

through the plastic twice)
crystals
theinindex
depends
upon
the axis.
orientation
of materials,
vibration
tance
change
arespect
strain
gage.
vibration
with
to
index
Certain
tance
change
ain
strain
gage.
through
the plastic
twice)
through
the plastic
twice)
we have:
with
respect
to
index
axis.
Certain
materials,
notably
plastics
notably plastics behave isotropically when unstressed but
When
a polarized
beam
a propagates
through
a optically
transparWhen
a isotropically
polarized
beam
a propagates
through
a transparConsequently,
basic
relation
measurement
Consequently,
basic
relation
for strain
measurement
Consequently,
thethe
basic
relation
for for
strain
measurement
behave
when
unstressed
become
become
optically anisotropic
when but
stressed.
The
change
= tK
the
in transmission
(3)
x y
ent
plastic
of
thickness
t,
where
X
and
Y
are
the
directions
ent anisotropic
plastic
of thickness
t,
where
X
and
Y
are
the
directions
using
thePhotoStress
PhotoStress
(photoelastic
coating)
technique
using
the
(photoelastic
coating)
technique
the PhotoStress
(photoelastic
coating)
technique
is: is:is:
stressed.
changeof
in the
index
of refraction
in index ofwhen
refraction
is aThe
function
resulting
strain, using
ofa principal
strains
at the
point
under
consideration,
the
of is
principal
strains
at resulting
the
point
under
consideration,
function
the
strain,
analogous
thethe
resisanalogous
toofthe
resistance change
in a strain to
gage.
=
in reflection (light passes (4)
x y
2tK
light
vector
splits
and
polarized
beams
are propagated
light
vector
splits
and
two two
polarized
beams
are propagated
in in
(5)(5)
y =
tance
change
in
a strain
gage.
x xy =
(5)
through
the plastic twice)
planes
X
and
Y (see
Figure
3 page
on page
If strain
theastrain
intenWhen
a polarized
beam
propagates
through
transparent
planes
X and
Y (see
Figure
3aon
3). If3).
the
inten2tK 2tK
When
aand
polarized
beam
through
a transparwhere
y,and
and
speed
of
the
along
X
and
plastic
thickness
t,and
X
are
the
of
ay,propagates
and
theYthe
speed
of directions
the
lightlight
sity sity
along
Xof
Y isYxis
Consequently,
the
basic relation
strain measurement
x and
Due
totorelative
the
relative
retardation
, two
thefor
arelonger
no longer
to the
retardation
, the
waves
are no
,two
thewaves
two
waves
are
no
Due
the
relative
retardation
ent
plastic
of
thickness
where
Xx and
YVyare
the directions
and
, respectively,
the Dueusing
vibrating
in
these
directions
V
principal
strains
at
thet,point
the
and
Vconsideration,
thelight
vibrating
in these
directions
is Vis
the
PhotoStress
(photoelastic
coating)
technique
is:will
xunder
y, respectively,
in
phase
when
emerging
from
the
plastic.
The
analyzer
A
in
phase
when
emerging
from
the
plastic.
The
analyzer
A
will
longer
in
phase
when
emerging
from
the
plastic.
The
of
principal
strains
at
the
point
under
consideration,
the
time
necessary
to
cross
the
plate
for
each
of
them
will
be
tV,
splits
and the
twoplate
polarized
time vector
necessary
to cross
for eachbeams
of themare
willpropagated
be tV,
transmit
one
component
ofone
each
of these
waves
(that
onlyonly
one
component
of
each
ofcomponent
these
waves
transmit
analyzer
only
of(that
each
vector
splits
and
polarized
are
propagated
in transmit
and
the
relative
retardation
between
these
two
beams
in planes
X
and
Y two
(see
Figure
3 beams
on
page
3).
Ifis:theis:strain
andlight
the
relative
retardation
between
these
two
beams
to
yA
=will
(5)of
x A)
parallel
to
A)
as
shown
in
Figure
3.
These
waves
will
interparallel
as
shown
in
Figure
3.
These
waves
will
interthese
waves
(that
parallel
to
A)
as
shown
in
Figure
3.
These
planes
X and
Y (see
Figure
page
3).
If
the
strain
intentK
2
and

,
and
the
speed
of
the
intensity
along
X and
Y is3 on
and
theinterfere
resulting
light
intensity
aintensity
function
of: be
x , and ythe speed of the light ferefere
Yt is
and
thewill
resulting
light
intensity
will will
be light
abe
function
of: will
t in
t xtdirections
waves
and
the
resulting
sity
along
X
and
light
vibrating
these
nyVx and Vy, respectively,
=
C
= and
t n=xt ynnxy is
=C
(1) (1)
Due
to
the
relative
retardation

,
the
two
waves
are
no
longer

function
of:
and for
Vy, each
respectively,
vibrating
these
Vxplate
the time in
necessary
the
of them the
will the
aretardation
the
retardation
V
x yto
y is
Vcross
Vx Vdirections
in
phase
whenemerging
from the plastic. The analyzer A will
time
necessary
to cross
the plate
for each of
them will
be tV,
be tV,
and the
relative
retardation
between
these
two the

the
angle
between
the
analyzer
direction
of
principal
angle between
analyzer
and
direction
of principal
transmit
only onethe
component
of and
each
of these
waves
(that


the
retardation
and
thenrelative
retardation
between these two beams is:
beams
is:

)
where:
= index
of refraction
strains
(

)
strains
(
where:
= nindex
of refraction
parallel to A) as shown in Figure 3. These waves will inter and
the the
angle
between
theintensity
analyzerwill
andbedirection
of of:
fere
resulting
light
a function
t


t
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Number:
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(1)(1) support,
Number:
11212
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contact
= C = t nx ny
Revision
02-Aug-05
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the retardation
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02-Aug-05
2 2
photostress@vishay.com
Vx Vy
the angle between the analyzer and direction of principal
where: nn =
where:
= index
index of
of refraction
refraction
strains ( )

( ( ) )( ( ) )
(

( ( ) )
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TECH NOTE
TECH N
OC
TH
E NOTE
TE
Tech Note

( ( ) )
(

( ( ) )

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Document Number: 11212


Document
Number:
11212
Revision
02-Aug-05
Revision 29-Jun-2011

Tech
Note
TN-702-2
TN-702-2
Tech
Note
TN-702-2
Tech
Note
TN-702-2
Vishay Micro-Measurements
Vishay
Micro-Measurements
Vishay
Micro-Measurements
Micro-Measurements

Introduction
to
Analysis
by
PhotoStress
Method
Method
Introduction
to Stress
Stress
Analysis
by the
the
PhotoStress
Introduction
to Stress
Analysis
bybythe
Introduction
to Stress
Analysis
thePhotoStress
PhotoStressMethod
Method

Figure 3. Plane polariscope.


FigureFigure
3. Plane
polariscope.
3. Plane
polariscope.

Figure 3. Plane polariscope

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technical
support,
contact
For technical
support,
contact
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Tech Note
TECH NOTE

Document Number: 11212


Document
Number:
1121211212
Document
Number:
Revision
02-Aug-05
Revision
02-Aug-05
Revision
02-Aug-05
Document Number: 11212
Revision 29-Jun-2011

TTEECCHH NNOOTTEE

theofcase
of polariscope,
plane polariscope,
the intensity
In theIncase
plane
the intensity
of light of light
In theIn
case
of
plane
polariscope,
the intensity
of light
emerging
will
be:
the
case
of
plane
polariscope,
the
intensity
of light
emerging will be:
emerging
will be:
emerging
will be:

I = b22 sin 22 22 (
) sin 22 2
(6) (6)
2
I = b Isin
(6) (6)
( 2()sin
= b 2sin
)
sin

= 0,
The light
becomes
zero when
Theintensity
light intensity
becomes
zero
when
-or
when
= 0, or when
to
=0,
when
light
intensity
becomes
zero
when
or=
0,direction
or
The
light intensity
becomes
zeroiswhen
theThe
crossed
polarizer/analyzer
is parallel
thedirection
of when of
the
crossed
polarizer/analyzer
parallel
to
the
the crossed
polarizer/analyzer
is parallel
to thetodirection
of of
the
crossed
polarizer/analyzer
is
parallel
the
direction
principalprincipal
strains. Thus,
a plane
setup is used
strains.
Thus,polariscope
a plane polariscope
setupto
is used to
principal
strains.
Thus,
a plane
polariscope
setup setup
is used
to
principal
strains.
Thus,
a
plane
polariscope
is
used to
measure
the
principal
strain
directions.
measure
the
principal
strain
directions.
measure
the principal
strainstrain
directions.
measure
the principal
directions.
Adding
optical
ltersfilters
known
as quarter-wave
platesplates
in in the
Adding
optical
known
as quarter-wave
Adding
optical
lters
known
as
quarter-wave
platesplates
in in
optical
ltersproduces
known
as
quarter-wave
the path Adding
of light
propagation
circularly
polarized
path
of
light
propagation
produces
circularly
polarized
the path
of
light
propagation
produces
circularly
polarized
the light
path4),
ofand
light
propagation
produces
polarized
light (Figure
the4),
image
observed
isobserved
notcircularly
inuenced
by
(Figure
and
the
image
is
not
inuenced
light (Figure
4), and
image
observed
is notisinuenced
by by
lightby(Figure
4),the
and
the
observed
notemerging
inuenced
the direction
of principal
strains.
The
intensive
of
the
direction
ofimage
principal
strains.
The
intensive
of
the direction
of principal
strains.
The intensive
of emerging
the
direction
of
principal
strains.
The
intensive
of
emerging
light thusemerging
becomes:light thus becomes:
light thus
lightbecomes:
thus becomes:
Figure 4. Circular polariscope.

(7)
FigureFigure
4. Circular
polariscope.
I = b22 sin 22 2 2
4. Circular
polariscope.
I = b Isin
(7) (7)
(7)
=b
Figure 4. Circular polariscope
sin
In a circular polariscope, the light intensity becomes zero
N = 2, () Retardation = 2 Fringes
In a circular
polariscope,
light
intensity
becomes
In a circular
polariscope,
the lightthe
intensity
becomes
zero zerozeroIf
light
intensity
becomes
If N =If
2,N(N
=) =
Retardation
= 2 Fringes
= 1, polariscope,
= 2 . . . , orthe
in general:
when =In0,acircular
2,
(()Retardation
If
2,
) Retardation
2 Fringes
or = 2 = 2=Fringes
orgeneral:
in general:
=when
0,==0,1=,0,=
=
,=or
when when
1=2, 1.=,. 2.
.2.in
. ., .general:
or. ,in
or =or2
=2=10
2-6
or
or = 45.4
nm]
-6 in [1150
= N
-6 -6 nm]
or =or45.4
N= N
=45.4
in10
in in
[1150
nm]
=N
=10
45.4
[1150
10
[1150
nm]
or
Once = N is known, the principal strain difference is
where N is 1, 2, 3, etc.
Once Once
by:
= N=is
the principal
strainstrain
difference
is
3, etc.
wherewhere
N where
is 1,N2,isN
3,1,is
etc.
=Nknown,
Nisisknown,
known,
theprincipal
principal
strain
difference
the
difference
is is
2,1,3,2,etc.
obtainedOnce
obtained
by: by: by:
This number N is also called fringe order and expresses
obtained
obtained
This number
number
N is
iscalled
also
called
and
This number
is also
fringefringe
orderorder
and expresses
This
N
also
called
fringe
order
andexpresses
expresses the

the size of
. TheNwavelength
selected
is:
size
of

.
The
wavelength
selected
is:
x y = = N
(8)
= Nf
the size
of

.
The
wavelength
selected
is:

2tK

the size of . The wavelength


selected is:
y =2tK== N
= Nf

(8) (8)
-6
x
N
Nf
=
=
(8)
= 22.7 10-6 in [575 nm]
x 2tK
y
2tK2tK 2tK
-6 nm]
= 22.7
10 in10[575
=22.7
in [575 nm]
where the fringe value, f, contains all constants, and N is the
The retardation, or photoelastic signal, is then simply
where thewhere
fringe
value,
f, contains
constants,
Nand
is the
The retardation,
retardation,
photoelastic
signal,
is then
simply
The retardation,
or photoelastic
signal,signal,
is
then
the
fringe
value,
f,allcontains
all and
constants,
the fringe
value,
f, contains
all constants,
N and
is theN is
ororphotoelastic
is simply
then
simply
resultwhere
of measurements.
describedThe
by N. As an example:
resultresult
of the
measurements.
described
by
N.
Asexample:
an example:
described
by N.by
AsN.
anAs
example:
of measurements.
ofresult
measurements.
described
an

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TN-702-2
Tech Note
TN-702-2
Micro-Measurements
Vishay Micro-Measurements

Introduction to Stress Analysis by the PhotoStress Method

Introduction to Stress Analysis by the PhotoStress Method


For background reference as needed, the topic of polarized
light,
used in conjunction
with photoelasticity,
is
Forasbackground
reference as needed,
the topic of polartreated
more
in the
textbooks
and otheris
ized light,
ascomprehensively
used in conjunction
with
photoelasticity,
references
listed
in the bibliography.
treated more
comprehensively
in the textbooks and other
references listed in the bibliography.

3.0 PhotoStress Instrumentation and Materials

PhotoStress
Instrumentation and Materials
3.1 3.0
Reection
Polariscope
For PhotoStress analysis, a reection polariscope
Reection
Polariscope
is3.1used
to observe
and measure the surface strains on
the For
photoelastically
coateda reection
test part polariscope
(Figure 5).is The
PhotoStress analysis,
used
PhotoStress
Plus
LF/Z-2
Reection
Polariscope
6)
to observe and measure the surface strains on the (Figure
photoelascovers
wide range
of strain
measurement
capabilities.
tically acoated
test part
(Figure
5). The PhotoStress
PlusFor
LF/
instance,
measurements
made
on small
parts
or in range
regions
Z-2 Reection
Polariscope
(Figure
6) covers
a wide
of
of
high
stress
concentration
are
both
easier
and
more
strain measurement capabilities. For instance, measurements
accurate
with the
video
camera
made on when
small zooming
parts or ininregions
of digital
high stress
concentrasupplied
witheasier
the and
polariscope.
Andwhen
the standard
tion are both
more accurate
zooming inlight
with
source
usedvideo
for static
measurements
readily
replaceable
the digital
camera
supplied withisthe
polariscope.
And
with
an optimal
stroboscopic
accessory
for cyclicalis
the standard
light
source usedlight
for static
measurements
dynamic measurements.
Quarterwave Plate

3.2 Coating Materials


readily replaceable with an optimal stroboscopic light accesThe selection of PhotoStress coatings and their proper
sory for cyclical dynamic measurements.
application to the test part are most essential to the success
of
analysis. A wide range of coating materials
3.2PhotoStress
Coating Materials
(Figure 7) is available in both at-sheet and liquid form
selectiontoofmetals,
PhotoStress
coatings
andrubber,
their proper
for The
application
concrete,
plastics
and
application
to the testThe
partcoatings
are mostare
essential
to controlled
the success
most
other materials.
carefully
of PhotoStressofanalysis.
A wide range
of coating
materials
formulations
resins blended
to provide
known
and
(Figure
7)
is
available
in
both
at-sheet
and
liquid
form for
repeatable photoelastic properties, and are supplied
application
to application
metals, concrete,
rubber,
and most
with
detailed
and plastics
handling
instructions.
otheravailable
materials. are
The specially
coatings are
carefullyapplication
controlled formuAlso
designed
kits,
lations of resins
blended
to provide
known and
repeatable
containing
everything
required
for successful
installation
photoelastic
properties,
andon
arethe
supplied
with detailed appliof
the PhotoStress
coating
test part.
cation and handling instructions. Also available are specially
designed application kits, containing everything required
for successful installation of the PhotoStress coating on the
test part.

Photoelastic Coating

Polarizer
Light Source

Figure 7. PhotoStress coating materials: flat sheets, liquid


plastics for casting contourable sheets, and adhesives

Test
Part

4.0 Analysis of Photoelastic Fringe Patterns


Figure 7. PhotoStress coating materials: at sheets, liquid
PhotoStress
the capability
the following
types of
plastics offers
for casting
contourablefor
sheets,
and adhesives.

analysis and measurement:


Observer
Analyzer
Quarterwave Plate

Reective Adhesive

TECT
HeN
Eote
cO
h TN

Figure 5. Schematic representation of reflection polariscope


Figure 5. Schematic representation of reection polariscope.

Figure 6. LF/Z-2
Reflection Polariscope

1. Full-eld Interpretation of fringe patterns, permitting


overall
assessment
nominal strain/stress
4.0 Analysis
of of
Photoelastic
Fringe Patterns
magnitudes and gradients.
PhotoStress offers the capability for the following types
2.ofQuantitative
analysis and measurements:
measurement:
a. The directions of principal strains and stresses at all
1. Full-eld interpretation of fringe patterns, permitting
points on the photoelastic coating.
overall assessment of nominal strain/stress magnitudes
b. 
Thegradients.
magnitude and sign of the tangential stress along
and
free (unloaded) boundaries, and in all regions where
2. Quantitative
measurements:
the state of stress
is uniaxial.
c. 
I
n
a
biaxial
stress
the magnitude
and
sign ofat all
a. The directions ofstate,
principal
strains and
stresses
the
difference
in
principal
strains
and
stresses
at
points on the photoelastic coating.
any selected point on the coated surface of the test
b.object.
The magnitude and sign of the tangential stress along
free (unloaded) boundaries, and in all regions where
the stateInterpretation
of stress is uniaxial.
4.1 Full-Field
of Strain Distribution
c. In a biaxial
stress state,
magnitude
and sign
of
In addition
to its capability
forthe
obtaining
accurate
strain
the difference
in principal test
strains
and stresses
at any
measurements
at preselected
points,
PhotoStress
selected
point
on the
coated surface
of the
provides
another
equally
important
capability
totest
theobject.
stress

Figure 6. LF/Z-2 Reection Polariscope.


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TN-702-2
Micro-Measurements
Introduction to Stress Analysis by the PhotoStress Method
analyst. This is the facility for immediate recognition
of nom inal strain (and stress) magnitudes, strain
gradients, and overall strain distribution including
identification of overstressed and understressed areas. This
extremely valuable attribute of PhotoStress, described as
full-eld interpretation, is unique to photoelastic methods
of stress analysis. Its successful application depends
only on the recognition of fringe orders by color, and an
understanding of the relationship between fringe order and
strain magnitude.
When a photoelastically coated test object is subjected to
loads, the resulting stresses cause strains to exist generally
throughout the part and over its surface. The surface
stresses and strains are commonly the largest, and of the
greatest importance. Because the PhotoStress coating is
intimately and uniformly bonded to the surface of the
part, the strains in the part are faithfully transmitted to the
coating. The strains in the coating produce proportional
optical effects which appear as isochromatic fringes when
viewed with a reection polariscope.
The PhotoStress fringe pattern is rich with information
and insights for the design engineer. If, for example, a part
is being stress analyzed as a result of field service failures,
the overall PhotoStress pattern will usually suggest
corrective measures for preventing the failures often
involving material removal and weight savings. Because
of the full-eld picture of stress distribution generated, it
may be noted that the overstressed zone responsible for
the failures is surrounded by an area of near-zero stress;
and a slight change in shape will redistribute the stresses so
as to eliminate the stress concentration, while forcing the
understressed material to carry its share of the load.
Similarly, in prototype stress analysis for produce
development purposes, the photoelastic pattern can
point the way toward design modifications to achieve the
minimum-weight, functionally adequate part i.e., the
optimum design. In addition, full-eld observation of
the stress distribution easily shows the effects of varying
modes of loading, as well as the relative significance of
individual loads, and/or load directions. These examples
are merely indicative of the many ways in which full-eld
fringe patterns in PhotoStress coated test parts speak out
to the knowledgeable stress analyst and provide a level
of comprehension not achievable from blind strain
measurements at a point.

When observed with a ref lection polariscope, the


PhotoStress fringe pattern appears as a series of successive
and contiguous different-colored bands (isochromatics)
in which each band represents a different degree of
birefringence corresponding to the underlying strain in the
Document Number: 11212
Revision 29-Jun-2011

Starting with the unloaded test part, and applying the


load, or loads, in increments, fringes will appear first at
the most highly stresses points (Figure 8). As the load is
increased and new fringes appear, the earlier fringes are
pushed toward the areas of lower stress. With further
loading, additional fringes are generated in the highly
stressed regions and move toward regions of zero or low
stress until the maximum load is reached. The fringes can
be assigned ordinal numbers (first, second, third, etc.) as
they appear, and they will retain their individual identifies
(orders) throughout the loading sequence. Not only are
fringes ordered in the sense of serial numbering, but they
are also orderly i.e., they are continuous, they never
cross or merge with one another, and they always maintain
their respective positions in the ordered sequence.

Figure 8. Incrementally loaded test part

4.3 Fringe Identification


White light, generally used for full-eld interpretation
of fringe patterns in PhotoStress testing, is composed of
all wavelengths in the visual spectrum. Thus, the relative
retardation which causes extinction of one wavelength
(color) does not generally extinguish others. When, with
increasing birefringence, each color in the spectrum is
extinguished in turn according to its wavelength (starting
with violet, the shortest visible wavelength), the observer
sees the complementary color. It is these complementary
colors that make up the visible fringe pattern in white
light. The complete color sequence is given in Table 1 (on
page 6), including, for each color, the relative retardation
and the numerical fringe order. Figure 9 (also on page 6)
including, for each color, the relative retardation and the
numerical fringe order. Figure 9 (also on page 6) shows
fringe identication on a test sample subjected to a uniaxial

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Tech Note

4.2 Fringe Generation

test part. Thus, the color of each and uniquely identifies the
birefringence, or fringe order (and strain level), everywhere
along that band. With an understanding of the unvarying
sequence in which the colors appear, the photoelastic
fringe pattern can be read much like a topographical map
to visualize the stress distribution over the surface of the
coated test part.

TN-702-2
Micro-Measurements
Tech Note
TN-702-2
Tech
Note TN-702-2
Vishay
Micro-Measurements
Introduction to Stress Analysis by the PhotoStress Method
Vishay Micro-Measurements

Introduction to Stress Analysis by the PhotoStress Method


tension force. Because of simultaneous multiple extinction
strain magnitude. The beam is coated
on one side with
Introduction to Stress Analysisto
by
the PhotoStress Method
of colors, the higher order fringes become fainter than
PhotoStress plastic and clamped (coated side up) to the
of simultaneous
extinction area
of colors,
thered
higher
the
first, and fallsmultiple
in the transition
between
and
order
fringes
become
fainter
than
the
rst,
and
falls
the
of Fringe
simultaneous
of colors,
theinhigher
green.
ordersmultiple
above 4extinction
or 5 are not
distinguishable
transition
area between
red
and green.
Fringe
orders
above
4the
order
fringes
become
fainter
than
the
rst,
and
falls
in
by color in white light. Although fringe orders higher than
or 5 transition
are not distinguishable
by color
in white
light.
Although
area
between
red
and
green.
Fringe
orders
above
3 are rarely encountered (or needed) in stress analysis with 4
fringe
higher
than 3 areby
rarely
(or needor orders
5 are not
distinguishable
colorencountered
in white
light.
PhotoStress
coatings,
fringes of very
high
order
canAlthough
always
ed) in
stress
analysis
with
PhotoStress
coatings,
fringes
of
fringe
orders
higher
than
3
are
rarely
encountered
(orwith
needbe detected by using the Model 036 Monochromator
veryed)
high
order
can
always
be PhotoStress
detected by coatings,
using thefringes
Modelof
in
stress
analysis
with
the reection polariscope.
036 very
Monochromator
with
the reection
polariscope.
high order can
always
be detected
by using the Model
A simple
cantilever beam
asthe
shown
in Figure
10 provides
036 Monochromator
with
reection
polariscope.
A simple cantilever beam as shown in Figure 10 provides
a means for understanding fringe identification as related
a means
for understanding
fringe
identication
A simple
cantilever beam
as shown
in Figureas
10related
provides
a means for understanding fringe identication as related

to
strain
The beam
is coated
on using
one side
with
edge
of amagnitude.
bench or table.
A weight
is hung,
a wire
or
PhotoStress
plastic
and
clamped
(coated
side
up)
to
the
to strain
magnitude.
is coated
on observed
one side with
cable,
on the
free endThe
of beam
the beam.
When
with
edge
of a bench
or table.
weight is
hung, side
usingup)
a wire
or
PhotoStress
plastic
and Aclamped
(coated
to the
the
polariscope
(circular
light
operation),
the retardation
cable,
on
the
freeorend
of A
theweight
beam.is When
observed
with
edge
of
a
bench
table.
hung,
using
a
wire
or
increases proportionally to the strain.
the
polariscope
(circular
operation),
retardation
cable,
on the free
end oflight
the beam.
Whenthe
observed
with
increases
proportionally
to light
the strain.
the polariscope
(circular
operation), the retardation
4.4 Quantitative Significance of Fringes
increases
proportionally
to the
strain.
4.4
Quantitative
Signicance
of Fringes
Photoelastic
fringes
have
characteristic
behaviors which
4.4 Quantitative Signicance of Fringes
fringes
have characteristic
behaviors which
arePhotoelastic
very helpful
in fringe
pattern interpretation.
For
are
very
helpful
in
fringe
pattern
interpretation.
For instance,
Photoelastic
fringes
have
characteristic
behaviors
which
instance, the fringes are ordinarily continuous
bands,
the
are ordinarily
continuous
bands,
forming
either
arefringes
very helpful
in
fringeloops
pattern
ForThe
instance,
forming
either
closed
orinterpretation.
curved
lines.
black
the fringes
are
continuous
bands,
forming
either
closed
loopsfringes
or ordinarily
curved
lines.
The
black
zero-order
fringes
zero-order
are usually
isolated
spots,
lines, or
areas
closed
loops
or or
curved
The
black
fringes
are
usually
isolated
spots,lines.
lines,
or
areas zero-order
surrounded
byThe
or
surrounded
by
adjacent
to
higher-order
fringes.
are usually isolated spots, lines, or areas surrounded by or

Force
Force
Direction
Force
Direction
Direction

Figure 9. Strain eld with fringes identied.


Figure
9. Strain
field
with
fringes
identified
Figure
9. Strain
eld
with
fringes
identied.
TABLE11
Isochromatic
ISOCHROMATICFringe
FRINGECharacteristics
CHARACTERISTICS
Table
TABLE 1 ISOCHROMATIC FRINGE CHARACTERISTICS
COLOR
Color
COLOR

Black
Black

0 00

0 0.0
0

0.0
0

PalePale
Yellow
Pale
Yellow
Yellow

345
345
345

1414.0
14

0.60
0.60
0.60

Dull Dull
Red
Dull
RedRed

520
520
520

2020.0
20

0.90
0.90
0.90

Red/Blue
Transition
Red/Blue
Transition
Red/Blue
Transition

575
575
575

22.7
22.7
22.7

1.00
1.00
1.00

700
700

28.0
28

1.22
1.22

Black

Blue-Green
Blue-Green
Blue-Green

700

28

1.22

Yellow
Yellow
Yellow

800
800
800

32
3232.0

1.39
1.39
1.39

1050
1050
1050

42
4242.0

1.82
1.82
1.82

Red/Green
Transition 1150
1150
Red/Green
Transition
1150
Red/Green
Transition

45.4
45.4
45.4

2.00
2.00
2.00

Green
Green
Green

1350
1350
1350

53
5353.0

2.35
2.35
2.35

Yellow
Yellow
Yellow

1440
1440
1440

57
5757.0

2.50
2.50
2.50

1520
1520
1520

60
6060.0

2.65
2.65
2.65

Red/Green
Transition
1730
Red/Green
Transition
1730
Red/Green Transition
1730

68
6868.0

3.00
3.00
3.00

Green
Green
Green

71
7171.0

3.10
3.10
3.10

Rose Red

Rose Red
Rose
Red

T E C THe N
cO
h T NE o t e
TECH NOTE

Approximate
APPROXIMATE
Fringe
APPROXIMATE FRINGE
RELATIVE
Relative
FRINGE
RELATIVE
Order
ORDER
RETARDATION
ORDER
Retardation
RETARDATION
NN
-6 -6
N
nmnm
in

10
-6
in
x
10
nm
in 10

Red

Red
Red

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6
6
6

1800
1800
1800

Thefringes
fringesare
arerelated
relatedtotoincreasing
increasing strain
strain magnitude
magnitude as summaThe
summarizedininthe
thetable.
table.(See
(SeeRelationships
Relationships Between
Between Fringe
Fringe Orders and
rized
and
MagnitudesofofStrain
Strainand
and Stress
Stress on
on page
page 8.
8. For
For reference, see
Magnitudes
see
Eq.
page3]:3]:
Eq.
(8)(8)
ononpage
0.100[2.54
[2.54mm]
mm]
t =t =0.100
0.15
KK
= =0.15
-6-6 in [575 nm]
22.7 1010

= =22.7
in [575 nm]
FringeOrder,
Order,NN
Fringe
0
(Black
Fringe)
0 (Black Fringe)
1 (Red-Blue)
1 (Red-Blue)
2 (1st Red-Green)
2 (1st Red-Green)
3 (2nd Red-Green)
3 (2nd Red-Green)

757 in/in/fringe
in/in/fringe
ff==757
m/m/fringe]
[[m/m/fringe]

Strain, ((x
y)) =
= Nf
Strain,
Nf
x
y
0
0
757 in/in [m/m] (1f )
757 in/in [m/m] (1f )
1514 in/in [m/m] (2f )
1514 in/in [m/m] (2f )
2271 in/in [m/m] (3f )
2271 in/in [m/m] (3f )

10. PhotoStress
of cantilever
FigureFigure
10. PhotoStress
analysisanalysis
of cantilever
beam. beam
Figure 10. PhotoStress analysis of cantilever beam.

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Document
Number:
11212
Document
Number:
11212
Revision
02-Aug-05
Revision 29-Jun-2011
Revision
02-Aug-05

TN-702-2
Micro-Measurements
Introduction to Stress Analysis by the PhotoStress Method
fringes never intersect, or otherwise lose their identifies,
and therefore the fringe order and strain level are uniform
at every point on a fringe. Furthermore, the fringes always
exist in a continuous sequence by both number and color.
In other words, if the first- and third-order fringes are
identied, the second-order fringe must lie between them.
The color sequence in any direction establishes whether
the fringe order and strain level increase or decrease in that
direction.
It turns out that the characteristics of photoelastic fringes
are the same as those of constant-level contours on a
colored topographic map. As a result, of any photoelastic
pattern can be considered, and visualized, as a contour
map of the difference (without regard to sign) between
principal strains or stresses over the surface of the test
part. In other words, the magnitudes of the strain levels,
as indicated by the fringe orders, correspond directly to
constant-altitude levels on a topographic map. And the
fringe pattern depicts peaks and valleys, plains and mesas
with sea level represented by the zero-order fringes.
If there is a zero-order fringe in the field of view, it will
usually be obvious by its black color. Assuming that
the coated test part has a free square corner or pointed
projection, the stress there will always be zero, and a zeroorder fringe (spot) will exist in the corner, irrespective
of the load magnitude, but shrinking in size slightly as
the load increases. When there is no zero-order fringe
evident, the rst-order fringe can often be recognized
because of the bright colors adjacent to the purple tint
of passage. As an alternative, when the test object can be
loaded incrementally from an initially stress-free state, the
starting zero-order fringe which covers the entire coating
can usually be followed throughout the loading process as
it recedes toward unstressed points, and regions where the
difference in principal stresses is zero.

Frequently, the process of locating the highest fringe


orders will lead the observer to one or more critical points
on a free boundary. When this occurs, the stress analyst
knows that the non zero principal stress at such a point
is tangent to the boundary, and its magnitude can be
obtained directly by multiplying the fringe order by a
Document Number: 11212
Revision 29-Jun-2011

5.0 Measurement of Principal Strain Directions


5.1 Measurement Principal
The principal strain directions are always measured with
reference to an established line, axis, or plane. Therefore,
the initial step for the determination of the direction or
principal strains (or stresses) will be to select a convenient
reference. In most cases, the reference direction is suggested
immediately, like an axis of symmetry of the test part or
structure; in other cases, a vertical or horizontal line will
sufce.
When a plane-polarized beam of light transverses a
photoelastic coating on a part subjected to stress, it splits
into waves propagating at different speeds along the
direction of the principal strains. After emerging from
the plastic, these two waves will be out of phase with one
another and will not recombine into a single vibration
parallel to the one entering the plastic. However, at points
where the direction of the principal stresses are parallel to
the axis of the polarizing filter, the beam will be unaffected
and the emerging vibration will be parallel to the entering
vibration. An analyzing filter A with its axis perpendicular
to the polarizing filter P will reproduce extinction of the
vibrations at these points (see Figure 11).
At every point where
PA are parallel to
the principal stresses,
a black line or
band is observed.

When PA are not


parallel, the light
is transmitted and
colors are seen.
Figure 11. Principal stress directions revealed by
rotation of the polarizer/analyzer axes to produce
complete extinction of light at the test point

For technical questions, contact


photostress@vishaypg.com

www.micro-measurements.com
7

Tech Note

Once one fringe has been identied, orders can be assigned


to the other fringes, making certain that the direction of
increasing fringe order corresponds to the correct color
sequence i.e., yellow-red-green, etc. By this process
the observer can quickly locate the highest fringe orders
and, generally, the most highly strained regions. Areas
of closely spaced ne fringes will usually attract the
observers attention, since regions of steep strain gradient
ordinarily signify high strains as well. The stress analyst
will also note any large areas where the pattern is almost
uniformly black or gray, usually indicating a signicantly
understressed region.

constant. The sign of the stress, plus or minus for tension


or compression, can also be determined very easily on a
free boundary with the reection polariscope.

TN-702-2
Tech
Note
TN-702-2
TechTech
Note
TN-702-2
Note
TN-702-2
Tech
Note
TN-702-2
Vishay
Micro-Measurements
Vishay
Micro-Measurements
Micro-Measurements
Vishay
Micro-Measurements
Vishay
Micro-Measurements
Method
Introduction
Stress
Analysis
byby
the
PhotoStress
Introduction
to Stress
Analysis
by the
PhotoStress
Method
Introduction
to
Stress
Analysis
by
the
PhotoStress
Method
Introduction
totoStress
Analysis
by
the
PhotoStress
Method
Introduction
to
Stress
Analysis
the
PhotoStress
Method

Observing
thestresses
stresses
partthrough
through
reflection
in
the
coating
(and
in
the of
surface
of
the
test
part).
This
Observing
the the
stresses
through
athrough
reflection
in the in
coating
(and
the
surface
theof
test
part).
This
Observing
the
part
a areflection
thein
coating
(and
in
the
the
test
part).
This
Observing
stresses
part
through
a reflection
polariscope
strains
in coating
thein
coating
(and
in the
surface
of the
part).
Observing
thepart
stresses
part
a reflection
the
(and
insurface
the
surface
of
the
testtest
part).
This
polariscope
(Figure
12),
black
lines
(or
even
areas)
appear.
simple
linear
relationship
is expressed
as[repeating
follows
[repeating
polariscope
(Figure
12),
black
lines
(or
even
areas)
appear.
simple
linear
relationship
is
expressed
as
follows
polariscope
(Figure
12),
black
lines
(or
even
areas)
appear.
simple
linear
relationship
is
expressed
as
follows
[repeating
(Figure
12), black
lines12),
(or even
appear.
simple
linear
relationship
is expressed
as follows
polariscope
(Figure
blackareas)
lines (or
even These
areas) lines
appear. This
simple
linear
relationship
is expressed
as follows
[repeating
These
lines
arecalled
calledisoclinics.
isoclinics.
At
every
point
on
an
isoEquation
her for
convenient
reference]: reference]:
These These
lines
are
called
isoclinics.
every
point
on
isoEquation
(8)
her(8)
for(8)
convenient
lines
are
Atpoint
every
point
on
anon
isoher
reference]:
areThese
called
isoclinics.
AtAt
every
ananpoint
isoclinic,
the
[repeating
Equation
(8)reference]:
her for
convenient
lines
are called
isoclinics.
At on
every
an
iso- Equation
Equation
(8)for
herconvenient
for
convenient
reference]:
clinic,
the
directions
of
principal
strains
are
parallel
to
the
clinic, clinic,
the
directions
of
principal
strains
are
parallel
to
the
the directions
of principal
strains
are parallel
to theto the
directions
of directions
principal
strains
are
parallel
to
direction
clinic,
the
of principal
strains
arethe
parallel

=
Nf
x y= Nf
(8)
=yNf
(8) (8)(8)
y (8)
= Nf
xxyyx=
direction
polarization
A
and
P.
With
respect
to
thethe
direction
polarization
ofAAand
and
With
respect
to
the
x
direction
ofofpolarization
ofofP.
AP.
and
With
respect
to
theto
ofofdirection
polarization
of
With
respect
to
the
selected
of
polarization
of
A P.
and
P.
With
respect
selected
reference
axis,
measurement
directions
a a
selected
reference
axis,
the
measurement
of
at
aa point
selected
reference
axis,
thethe
measurement
of of
directions
at at
awhere:
reference
axis,
the
measurement
of directions
directions
at
isat
selected
reference
axis,
the
measurement
of
directions
where:
x
y = principal
strains;
N = order
fringe
order
==
fringe
order
where:
x where:
y=
principal
strains;
Nstrains;
=strains;
fringe
x
point
is
simply
accomplished
by
the
rotation
of
A
and
P
point is
simply
accomplished
by
the
rotation
of
A
and
P
strains;
N =Nfringe
order
y principal
=y principal
=
principal
N
fringe
order
x yx =
point
is simply
accomplished
the
of A
and
simply
accomplished
by theby
rotation
of rotation
A and
Pof
together
point
is simply
accomplished
byrotation
the
AP
and P where:
together
until
a isoclinic
black
isoclinic
appears
at
point
where
thethe
together
until
aauntil
black
appears
at
the
where
the
(fringe
value
ofcoating)
coating)
f
=
(fringe
value
of
coating)
f = ff =
(fringe
value
of
together
aisoclinic
black
isoclinic
appears
atthe
thethe
point
where
thethe
until
black
appears
atpoint
point
where
together
until
a black
isoclinic
appears
at
the
point
where
= f = (fringe
valuevalue
of coating)
(fringe
of coating)
directions
are
to are
beare
measured.
directions
to
measured.
directions
toare
be
measured.
directions
are
tobe
be
measured.
directions
to
be
measured.
-6

=w=avelength
(in(in
white
light,
= wavelength
(in
white
light,
22.7
light,
10-6
in
wavelength
white
light,
22.7
-6
10in
inin
= 22.7
wavelength
light,
22.7

10
=wavelength
(in white
22.7
10-6
-6 (in white
in
or
575
nm
10
or 575or
nmor
575
nm
575
ornm
575 nm

t =tthickness
of coating
t = thickness
of
coating
=
thickness
coating
t = thickness
of of
coating
t = thickness
of
coating
K =Koptical
strain
optical
coefcient
of of
coating
K = strain
coefcient
of
coating
=
strain
optical
coefcient
coating
K = strain
optical
coefcient
of coating
K = strain
optical
coefcient
of
coating
Equation (8) can also be written in terms of shear strain,
Equation
(8)Equation
can(8)
also
be
written
inbe
terms
xystrain,
: strain,
(8)
can
also
be
written
in shear
terms
ofof
shear
Equation
Equation
can
also
be
written
in of
terms
of strain,
shear
strain,
xy:xy:xy:
(8)
can
also
written
in
terms
shear
xy:
(9)
= Nf
xyNf
=
(9) (9)(9)
xy = Nf
=
(9)
= Nf
xy

xy

where:
xy=
m=aximum
shear
strain
(in(in
the
plane
xy = maximum
shear strain
(in
thestrain
plane
of
the
where:where:
maximum
shear
strain
the
plane
ofof
thethe
where:
xymaximum
shear
strain
(in
the
plane
of the
shear
(in
the
plane
where:
xy =
xy = maximum
of
the
part
surface
at
any
point
part
surface
at
any
point
part
surface
at
any
point
part surface
at anyatpoint
part surface
any point
The significance of the preceding is that the difference
The signicance
of the of
preceding
ispreceding
that the
indifference
the in the
The
signicance
of
the
preceding
isdifference
that
the
difference
inin
the
The
signicance
the
preceding
that
the
difference
The
signicance
of
the
is
that
the
in
the
principal
strains,
or theis maximum
shear
strain
inthe
principal
strains,
orstrains,
the
maximum
shear
strain
in
the
surface
of
principal
or
the
maximum
shear
strain
in
the
surface
ofof
Figure Figure
12.
Principal
stress
directions
revealed
by
rotation
of
the
principal
strains,
or
the
maximum
shear
strain
in
the
surface
of
Figure
12.
Principal
stress
directions
revealed
by
rotation
of
principal
strains,
or
the
maximum
shear
strain
in
the
surface
Figure
12.
Principal
stress
directions
revealed
by
rotation
of
the
the surface of the test part, can be obtained by simply
12. Principal
stressstress
directions
revealed
by rotation
of theof the
Figure
12. Principal
directions
revealed
by rotation
the
part,
can
bepart,
obtained
byobtained
simply
recognizing
the fringe
polarizer/analyzer
axes toaxes
produce
complete
extinction
of light
atof
the
test
part,
can
be
obtained
simply
recognizing
the
fringe
the
polarizer/analyzer
axes
produce
complete
extinction
of
polarizer/analyzer
axes
to
produce
complete
extinction
light
at test
test
part,
can
be
obtained
by by
simply
recognizing
fringe
the
test
can
be
by
simply
recognizing
the
fringe
the
fringe
order
and
multiplying
bythe
the
fringe
polarizer/analyzer
to
produce
complete
extinction
of
light
polarizer/analyzer
axes
to to
produce
complete
extinction
of at
light
at therecognizing
order
andorder
multiplying
by the by
fringe
value
of
the
coating.
the testthe
point,
aat
plane
setuppolariscope
issetup
used.
an
isoand
multiplying
by
the
fringe
value
ofof
the
coating.
light
the point,
test
apolariscope
plane
setup
is Then,
used.
Then,
the
test
point,
a point,
plane
setup
is
used.
isoand
multiplying
theby
fringe
value
of
the
coating.
test
point,
a polariscope
plane
polariscope
is Then,
used.
Then,
an an
isoorder
and
multiplying
the
fringe
value
the
coating.
the
test
a plane
polariscope
setup
is used.
Then,
an
iso- order
value
of
the
coating.
clinic isclinic
positioned
over the
point
and
the
directions
measured
with
clinic
is
positioned
over
the
point
and
the
directions
measured
with
anclinic
is over
positioned
over
the
point
andmeasured
the
directions
isisoclinic
positioned
the
point
and
the
directions
with
is positioned
over
the
point
and
the
directions
measured
with
respectrespect
torespect
an established
reference.
Note,
with
the
Model
LF/Z-2
to
an
established
reference.
Note,
with
the
Model
LF/Z-2
measured
with
respect
to
an
established
reference.
Note,
with
Engineers
and
designers
often
work
with
stress
rather
than
Engineers
and
designers
often
work
with
stress
rather
to an to
established
reference.
Note, Note,
with the
LF/Z-2
respect
an established
reference.
withModel
the
Model
LF/Z-2
Engineers
designers
often
work
with
stress
rather
than
Engineers
andand
designers
often
work
with
stress
rather
than
Engineers
and
designers
often
work
with
stress
rather
than
Polariscope,
a Model
vertical
is Polariscope,
chosen
the
principal
strain
direcPolariscope,
aaxis
vertical
axis
isand
chosen
and
the
principal
strain
directhe
a vertical
axis
isprincipal
chosen
and
the
Polariscope,
a LF/Z-2
vertical
axis
isaxis
chosen
and
the
principal
strain
direcstrain;
and,
for
this
purpose,
Eqs.
(8)
and
(9)
can
be
transthan
strain;
and,
for
this
purpose,
Eqs.
(8)
and
(9)
can
be
Polariscope,
a vertical
is chosen
and
the
strain
direc- strain;
strain;
and,
for
this
purpose,
Eqs.
(8)
and
(9)
can
be
transand,
for
this
purpose,
Eqs.
(8)
and
(9)
can
be
transstrain;
and,
for
this
purpose,
Eqs.
(8)
and
(9)
can
be
transtions are
read
from
the
calibrated
dial.
tions
are
read
from
the
calibrated
dial.
principal
strain
directions
are read
from
tions
are
read
from
the
calibrated
dial.
tions
are
read
from
the
calibrated
dial. the calibrated dial. formed by
introducingbyHookes
law for
the biaxial
stress
transformed
introducing
Hookes
law for
the biaxial

formed
introducing
Hookes
for
stress
formed
by by
introducing
Hookes
lawlaw
for
the
biaxial
stress
formed
by
introducing
Hookes
law
forthe
thebiaxial
biaxial
stress
state instate
mechanically
isotropic
materials:
stress
state
in
mechanically
isotropic
materials:
state
in
mechanically
isotropic
materials:
in
mechanically
isotropic
materials:
state in mechanically isotropic materials:
If the isoclinics are narrow and sharply dened, it means
If thethat
isoclinics
are
narrow
and
sharply
dened,
it
means
the
isoclinics
narrow
and
sharply
dened,
it means
E
If Ifthe
areare
narrow
and
sharply
dened,
itfrom
means
narrow
and
rapidly
the
directions
of
Ifisoclinics
the
isoclinics
are
sharply
dened,
it one
means
x and
y vary
x = =
=xE=
E
+E
(10)(10)
(10) (10)

and

vary
rapidly
from
one
locathat the
directions
of
y +
x
y

and

vary
rapidly
from
one
locathat
the
directions
of
y y
(10)

and

vary
rapidly
from
one
locathat
the
directions
of
location
todirections
the next.xof
Isoclinics
broadfrom
black
lines
one
locathat the
x 2 2x 2+x
xy +
x x and
1 x 2x
y y forming
y vary rapidly
11
1


tion totion
the
next.
Isoclinics
forming
broad
black
lines
or
tion
the
next.
Isoclinics
forming
broad
black
lines
totothe
next.
Isoclinics
broad
black
lines
or or
and
y directions
vary
slowly
in or
or areas
indicate
that
the xforming
tion
to
the
next.
Isoclinics
forming
broad
black
lines
xthe
and
yand
directions
vary
slowly
inslowly
areas indicate
that
the
E
vary
areas
indicate
that
the
the
directions
vary
slowly
in in in
areas
indicate
that
that
region.
When
this
surrounding
x and
yboundary
directions
vary
slowly
areas
indicate
that
x and
y directions
xoccurs,
y the
y = =
=yE=
E
(11) (11)
+E
(11)(11)
x +
that region.
When
this
occurs,
the
boundary
surrounding
the
(11)
x x
y 2 2y 2+y
yx +
that
region.
When
this
occurs,
boundary
surrounding
thethe
1 y 2 y
that
When
this
occurs,
thethe
boundary
surrounding

theregion.
entire
isoclinic
should
be
marked
(not
merelythethe
that
region.
When
this
occurs,
the
boundary
surrounding
1

entire isoclinic
should
be
marked
(not
merely
the
center).
In

entire
isoclinic
should
be
marked
(not
merely
the
center).
In
entire
isoclinic
should
be
marked
(not
merely
the
center).
In
center).
the case
of a be
tensile
specimen
with the
a constant
entireIn
isoclinic
should
marked
(not merely
center).
In
and,
and,
and,
and,
the case
of
acase
tensile
specimen
with
awill
constant
cross
the
ofa tensile
aof
tensile
specimen
with
aseen
constant
cross
the
case
of
specimen
with
a constant
cross
section,
cross
section,
isoclinic
be
to section,
cover
thesection,
entire
the
case
aantensile
specimen
with
a constant
cross
section,
E
E EE
an isoclinic
will
be
seen
to
cover
the
entire
area
when
the
(12) (12)
(12)(12)
isoclinic
will
be
seen
cover
entire
area
when
thethe x y =
anan
isoclinic
will
seen
toto
cover
thethe
entire
area
when
thethe
area
when
thebe
axes
of
polarization
coincide
with
an
isoclinic
will
be
seen
to
cover
the
entire
area
when
*y *y *
1x+yx=
(12)
yx=y= y x* xyx
x
axes ofaxes
polarization
coincide
with
the
specimen
axes,
wince

1+1+
1
+
axes
ofpolarization
polarization
coincide
with
specimen
axes,
wince
of
coincide
thethe
specimen
wince
x isaxes,
the
same
at
specimen
axes, wince
the with
direction
of specimen
axes
of polarization
coincide
with
the
axes,
wince
x isofthe
at
every
the direction
ofpoint.
same
at
every
point.
the
direction
of
xsame
isx is
the
same
at point.
every
point.
the
direction
every
xthe
is
the
same
at every
point.
the
direction
of
Substituting
Equation
(8)
into(8)Equation
(12),
Substituting
Equation
(8)
into
Equation
(12),
Substituting
Equation
(8)
into
Equation
(12),
Substituting
Equation
into
Equation
(12),
Substituting
Equation
(8)
into
Equation
(12),
aid
in
identifying
the
strain
directions,
a
laser
light
To aidTo
in
identifying
the
strain
directions,
a
laser
light
is
E
aid
in
identifying
strain
directions,
a laser
light
ToTo
aid
inaid
identifying
thethe
strain
directions,
a laser
light
is is is =
To
in identifying
the
strain
directions,
a laser
light
E EE
(13) (13)
(13)(13)
x
istoattached
toReection
the LF/Z-2
Reection
Polariscope.
When
y x1x+yx=
attached
the LF/Z-2
Polariscope.
When
turned
(13)
Nf
Nf
y=y = Nf Nf
attached
toto
thethe
Reection
Polariscope.
When
turned
attached
LF/Z-2
Reection
Polariscope.
When
turned
attached
toLF/Z-2
the
LF/Z-2
Reection
Polariscope.
When
turned

1
+

1
+

1
+
turned
on,
a
laser
line
is
projected
on
the
PhotoStress
on, a on,
laser
line
is
projected
on
the
PhotoStress
coated
a
laser
line
is
projected
on
the
PhotoStress
coated
on,on,
a laser
line
is projected
on on
thethe
PhotoStress
coated
a laser
line
is projected
PhotoStress
coated
coated
showing
the strain
principal
strain
directions
atofthe
part showing
thepart
principal
strain
directions
atdirections
the at
point
where:
where:

principal
stresses
instresses
test
part
surface
x
y =
part
the
principal
directions
thethe
point
partshowing
showing
the
principal
strain
directions
at
point
of of where:
part
showing
the
principal
strain
atof
the
point
=
stresses
in
test
part
surface
where:
xy
in in
test
part
surface
where:
y principal
=y principal
=
principal
stresses
test
part
surface
x x
point of measurement.
measurement.
y = principal
stresses
in test part surface
measurement.
measurement.
measurement.
Ex=elastic
modulus
of
test
part
E =E elastic
modulus
of of
test
part
E elastic
= elastic
modulus
of
test
part
=
modulus
test
part
E = elastic
modulus
of test part
= Poissons
ratio
ofratio
test
part
= Poissons
of
test
part
6.0Measurement
Measurement
Stress
and
Strain
Magnitudes
=
Poissons
ratio
of
test
part
= Poissons
ratio
of
test
part
6.0 Measurement
of Stress
and
Strain
Magnitudes
6.0
ofof
and
Strain
Magnitudes
6.0
Measurement
of
Stress
and
Strain
Magnitudes
6.0
Measurement
ofStress
Stress
and
Strain
Magnitudes
= Poissons ratio of test part
And, noting
that
the
maximum
shear
stress,
MAX
, inthe
6.1 Relationships
Between
Fringe
Orders
And,
noting
that
the
maximum
shear
stress,
in,, in
the
And,
noting
that
the
maximum
shear
stress,
And,
noting
that
the
maximum
shear
stress,
,MAX
, the
inthethe
And,
noting
that
the
maximum
shear
stress,
in
6.16.1
Relationships
Between
Fringe
Orders
6.1
Relationships
Between
Fringe
Orders and
Relationships
Between
Fringe
Orders
MAX
MAX
MAX
6.1
Relationships
Between
Fringe
Orders
is (is
) (is
2,(
plane of
the
surface
at
any
point
ispoint
(
and Magnitudes
of
Strain
and
Stress
x
y

2,
plane
of
the
surface
at
any

)2,
plane
of
the
surface
at
any
point

2,
plane
of
the
surface
at
any
point

2,
plane
the
surface
and
Magnitudes
of
Strain
and
Stress
Magnitudes
of Strain
Stress
andand
Magnitudes
of Strain
andand
Stress

( )( ( ) ) )

( )( ( ) ) )

TECH NOTE
TECH NOTE
Tech Note
TECH NOTE

Magnitudes of Strain and Stress

( )( ( ) ) )

x xx x
y yy y

1 E
The fringe
orders
observed
inobserved
PhotoStress
coatings
arecoatings
1E
The
fringe
orders
observed
in in
PhotoStress
coatings
areareare MAX = = 1Nf
1 E E Nf
(14) (14) (14)
The
fringe
orders
in PhotoStress
The
fringe
orders
observed
PhotoStress
coatings
MAX
= = Nf
Nf
The
fringe
orders
observed
in
PhotoStress
coatings
are
(14)(14)
MAX
MAX
proportional
to
the
difference
between
the
principal
strains
2
1

+

21+1+
proportional
to
the
difference
between
the
principal
strains
2 21 +
proportional
to the
difference
between
the
principal
strains
proportional
to
the
difference
between
the
principal
strains
proportional to the difference between the principal
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technical
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technical
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technical
support,
contact
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Number:
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Document
Number:
Document
Number:
11212
Document
Number:
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02-Aug-05
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02-Aug-05
Document
Number:
11212
Revision 29-Jun-2011

TN-702-2
Tech Note TN-702-2
Micro-Measurements

Vishay Micro-Measurements

Introduction to Stress Analysis by the PhotoStress Method

Introduction to Stress Analysis by the PhotoStress Method


Equations (8) and (13), which are the primary relationships
used in photoelastic
coating
analysis,
give only
Equations
(8) and (13), which
are stress
the primary
relationships
the in
difference
in principal
strains
and stresses,
notthe
the
used
photoelastic
coating stress
analysis,
give only
individual
quantities.
To and
determine
difference
in principal
strains
stresses,the
notindividual
the indimagnitudes
andTo
signs
of either
principal
strains or
vidual
quantities.
determine
thethe
individual
magnitudes
stresses
generally
biaxial
stressgenerally
states, a
and
signs of
either therequires,
principal for
strains
or stresses
second for
measurement,
such
as the
sum ofmeasurement,
the principal
requires,
biaxial stress
states,
a second
strains
(see
page
There arestrains
many cases,
however,
when
such
as the
sum
of 12).
the principal
(see page
12). There
these
equations
provide when
all ofthese
the information
neededall
for
are
many
cases, however,
equations provide
analysis. For
instances
when
the ratio
principal
ofstress
the information
needed
for stress
analysis.
Forofinstances,
stresses
can be
other
when
the ratio
of inferred
principal from
stresses
can considerations
be inferred from
y =1),
a thin
a uniform
shaft in
(xshaft
y
other
considerations
torsion
a uniform
in torsion
(xwalled
/y=2), etc.
(this
relationship
can
vessel
(xpressure

)
=
2),
etc.

thisbe
=pressure
1), a thin
walled
vessel
x
y
combined can
withbeEquation
solve for
thetoindividual
relationship
combined(13)
withtoEquation
(13)
solve for
principal
stresses.
And,stresses.
whenever
the whenever
stress state
is stress
known
the
individual
principal
And,
the
x or
y
being
zero,
there
to be
uniaxial,
eitherwith
or

being
zero,is
state
is known
to bewith
uniaxial,
either
x
y
onlyisone
principal
stress
in the
plane
of of
the
there
onlynonzero
one nonzero
principal
stress
in the
plane
test-part
obtaineddirectly
directlyfrom
from
the
test-partsurface,
surface,and
andthis
this can
can be obtained
Equation
(6).For
For
example,
y=y =
0,0,
Equation
(6).
example,
if if

x =

E
Nf
1+

(15)
(15)

* Ishould
t shouldbebekept
keptininmind
mind that
that the
*It
the biaxial
biaxial Hookes
Hookeslaw,
law,involved
involvedinin
Equations
- (15),
strictly
applicable
only
homogeneousmateriEquations
(1)(1)
- (15),
is is
strictly
applicable
only
totohomogeneous
are isotropic
and linear-elastic
in their mechanical
alsmaterials
which arewhich
isotropic
and linear-elastic
in their mechanical
properties.
properties.
DocumentNumber:
Number: 11212
Document
11212
Revision02-Aug-05
29-Jun-2011
Revision

free-body diagrams of elements of matter removed from


the edges for examination. With the part under normal
service
loading,
and
service
loading,
andviewing
viewingthe
thecoating
coatingwith
withthe
thereection
reection
polariscope,
a
fringe
order
of
2
is
observed
at
point
polariscope, a fringe order of 2 is observed at pointa,a,and
and
about
calibration
hashas
established
a
about34
34atatpoint
pointb. b.Previous
Previous
calibration
established

per
fringe
for
this
coating.
Thus,
the
fringe
value
of
1100
a fringe value of 1100 per fringe for this coating. Thus,
stress
at pointatapoint
in the amore
critical
region
can region
be calculated
the stress
in the
more
critical
can be
directly
from
Equation
(15)
assuming
(for
steel)
that(for
E (1
+
calculated directly
from
Equation
(15)
assuming
steel)
6
)that
= 23.5

10
in
[162
GPa]:
6
E(1 + ) = 23.5 10 in [162 GPa]:
6
-6
x ==23.5

23.510
1061100
110010
10 -622==51
51700
700psi
psior,
or,
x

9
-6
x ==162
16210
1091100
1100 10
10 -622==356
356 MPa
MPa
x

Andsimilarly,
similarly,the
thestress
stressatatthe
theedge
edgeofofthe
therib
ribisisabout
about
And
psi[134
[134MPa].
MPa].
1919,400
400 psi
Summarizing,
between principal
principalstrains
strains
Summarizing, the
the difference
difference between
canbebedetermined
determinedfrom
fromEquation
Equation(8),
(8),and
andthe
thedifference
difference
can
between
principal
stresses
from
Equation
(13),atatany
anypoint
point
between
principal
stresses
from
Equation
(13),
photoelasticallycoated
coatedsurface.
surface.AtAtpoints
pointswhere
wherethe
the
onona aphotoelastically
stressstate
stateis isuniaxial,
uniaxial,Equation
Equation(15)
(15)gives
givesthe
theprincipal
principal
stress
stressinineach
eachcase,
case,the
theresult
resultisisobtained
obtainedbybymultiplying
multiplyingthe
the
stress
observedfringe
fringeorder
orderbybya aconstant.
constant.ItItremains,
remains,then,
then,only
only
observed
identifythe
thefringe
fringeorder
orderatatthe
thepoint
pointofofmeasurement.
measurement.
totoidentify
Techniquesfor
foraccomplishing
accomplishingthis
thisprecisely
preciselyand
andpositively
positively
Techniques
withthe
the
Model
LF/Z-2Reection
Reection
Polariscope
follow.
with
Model
LF/Z-2
Polariscope
follow.
6.2
Measurements
at aatPoint
6.2
Measurements
a Point
hasbeen
been shown
shown that
that in
ItIthas
in the
the rst
first step
stepofofmeasurement
measurement
one
observes
the
whole
area
and
assigns
one observes the whole area and assignstotoeach
eachfringe
fringeitsits
order
(N
=
1,
2,
3,
etc.)
At
every
point
on
a
fringe,
N
order (N = 1, 2, 3, etc.) At every point on a fringe, Nisisthen
then
known
and
therefore:
known
and
therefore:

xxyy==NfNf
general,the
the point
point of
of interest
interest on the
InIngeneral,
the structure
structurewill
willfall
fall
between
betweenfringes,
fringes,and
andit itwill
willbebenecessary
necessarytotoestablish
establishthe
the

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For
technicalquestions,
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contact
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T e c ThE C
NH
o tNeO T E


The cases in which one of the principal surface stresses
The cases in which one of the principal surface stresses is
is zero include all straight, uniform-cross-section members
zero include all straight, uniform-cross-section members
in axial tension or compression (and bending), away from
in axial tension or compression (and bending), away
points of load application. Even for mildly tapered memfrom points of load application. Even for mildly tapered
bers, so loaded, the stress state is very nearly uniaxial, and
members, so loaded, the stress state is very nearly uniaxial,
Equation (15) can often be applied as a very good approxiand Equation (15) can often be applied as a very good
mation. A much more important class of cases from the
approximation. A much more important class of cases
viewpoint of practical stress analysis involves all points on
from the viewpoint of practical stress analysis involves all
the boundaries and free edges of the test part.
points on the boundaries and free edges of the test part.
Consider, for example, an unloaded hole penetrating the
Consider, for example, an unloaded hole penetrating
test part. At every point on the edge of the hole the principal
the test part. At every point on the edge of the hole the
axes are normal and tangential, respectively, to the edge.
principal axes are normal and tangential, respectively, to
Because the principal stress normal to the edge is necessarily
the edge. Because the principal stress normal to the edge
zero, the stress state is uniaxial, and the only nonzero prinis necessarily zero, the stress state is uniaxial, and the
cipal stress is everywhere tangent to the hole edge. There are
only nonzero principal stress is everywhere tangent to the
many other cases, such as projecting anges and ribs, and
hole edge. There are many other cases, such as projecting
two-dimensional objects in general, in which the stress
anges and ribs, and two-dimensional objects in general,
state on the unloaded edge is always uniaxial. For all such
in which the stress state on the unloaded edge is always
cases, the single nonzero principal stress, which is tangent
uniaxial. For all such cases, the single nonzero principal
to the edge, can be determined directly from the observed
stress, which is tangent to the edge, can be determined
fringe order by substituting into Equation (15); or, in effect,
directly from the observed fringe order by substituting into
multiplying the fringe order by a constant.
Equation (15); or, in effect, multiplying the fringe order by
a Figure
constant.
13 shows a portion of the surface of a steel
machine part to which a PhotoStress coating has been
Figure 13 shows a portion of the surface of a steel machine
applied. As indicated, the coating has been nished to accupart to which a PhotoStress coating has been applied.
rately match the edge of the hole and that of the rib. The
As indicated, the coating has been nished to accurately
uniaxial stress state at points a and b is demonstrated by the
match the edge of the hole and that of the rib. The uniaxial
enlarged free-body diagrams of elements of matter removed
stress state at points a and b is demonstrated by the enlarged
from the edges for examination. With the part under normal

Figure 13. Section from a coated test member


showing uniaxial stress states on free edges.
Figure 13. Section from a coated test member showing uniaxial
stress states on free edges.

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TN-702-2
Tech Note
TN-702-2
Micro-Measurements
Vishay Micro-Measurements

Introduction to Stress Analysis by the PhotoStress Method

Introduction to Stress Analysis by the PhotoStress Method


fractional order or fraction of a fringe. The technique
used is called
compensation
whichThe
is accomplished
fractional
order
or fraction of a fringe.
technique used
using
thecompensation
PhotoStress Plus
Model
832 Null-Balance
is
called
which
is accomplished
using the
Compensator.
PhotoStress
Plus Model 832 Null-Balance Compensator.

6.2.1 Measurements Using The Null-Balance

6.2.1 Measurements Using


Compensation Method
The Null-Balance Compensation Method
Null-balance compensation operates on the principal
thepolariscope
principal of
of Null-balance
introducing compensation
into the lightoperates
path ofonthe
introducing
the light
path of theofpolariscope
a calia calibratedinto
variable
birefringence
opposite sign
to
brated
variable in
birefringence
of opposite
sign to
that induced
the photoelastic
coating
bythat
theinduced
strain
in
the When
photoelastic
coating by the
strain birefringence
eld. When the
field.
the opposite-sign
variable
is
opposite-sign
variable
birefringence
is
adjusted
adjusted to precisely match the magnitude of to
theprecisely
strainmatch
magnitude ofcomplete
the strain-induced
birefringence,
inducedthebirefringence,
cancellation
will occur,
complete
cancellation
will in
occur,
and the
netwill
birefringence
in
and the net
birefringence
the light
path
be zero. The
the
light
path
will
be
zero.
The
condition
of
zero
net
birefrincondition of zero net birefringence is easily recognized
gence
is easily
recognized
because
it produces
a black fringe
because
it produces
a black
fringe
in the isochromatic
in
the isochromatic
pattern
where, before
the
pattern
where, before
introducing
the introducing
compensating
compensating
a colored
fringe
existed14).
(Figure
birefringence,birefringence,
a colored fringe
existed
(Figure
The
14).
The
for synthesizing
a calibrated
variable biredevice
fordevice
synthesizing
a calibrated
variable birefringence
fringence
is
known
as
a
null-balance
compensator.
is known as a null-balance compensator.

TECH
Eote
T eN
cO
hT N

Figure
14. Initially
colored
fringe
is rendered
black
Figure
14. Initially
colored
fringe
is rendered
black
by nullby null-balance
compensation.
balance compensation.

The manner in which a null-balance compensator operates


The manner
in which a null-balance
is illustrated
schematically
in Figure 15compensator
by analogy operwith
ates
illustrated
schematically
in Figure
15 strain-induced
by analogy with
the is
common
knife-edge
balance.
The
the
common knife-edge
Theisstrain-induced
birebirefringence
(or opticalbalance.
signal)
represented by
an
fringence
(or
optical
signal)
is
represented
by
an
unknown
unknown mass on the left-hand pan of the scale, where it
mass
on the
left-hand pan of moment,
the scale,tipping
where the
it produces
produces
a counterclockwise
pointer
aoffcounterclockwise
moment,
tippingmasses
the pointer
offplaced
from
from center to the
left. Known
can be
center
to
the
left.
Known
masses
can
be
placed
on
the
on the right-hand pan (introducing a clockwise moment)
right-hand
pan
(introducing
a
clockwise
moment)
until
the
until the pointer is brought back to center again. When
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10
10

Figure 15. Principal of null-balance compensation


Figure 15. Principal of null-balance compensation.

the pointer
is centered,
sumagain.
of theWhen
known
pointer
is brought
back tothe
center
thecalibrated
pointer is
masses equals
theofunknown
The masses
operation
of the
centered,
the sum
the knownmass.
calibrated
equals
compensator
directly
parallels of
that
the balance directly
that
unknown
mass.
The operation
theofcompensator
is, compensating
birefringence
is added
to the light birepath
parallels
that of the
balance that
is, compensating
until is exactly
balances
the birefringence
induced
in the
fringence
is added
to the light
path until is exactly
balances
coating
by the strain
fieldin
onthe
thecoating
surfacebyofthe
thestrain
coated
part.
the
birefringence
induced
eld
on
the surface of the coated part.
With the Model 832 Electronic Compensator and PSCalc
computer
16a
and 16b onand
page
11),
With thesoftware
Model 832(Figures
Electronic
Compensator
PSCalc
measurement
and calculation
strain/stress
values
is
computer
software
(Figures of
16atheand
16b on page
11),
simple and quick.
the pointofofthe
measurement,
initial
measurement
and At
calculation
strain/stress an
values
is
) reading
is made
with
the compensator.
A
no-loadand
(ROquick.
simple
At the
point of
measurement,
an initial
is thenwith
made
loading the
second reading
(R LOAD
is) made
theafter
compensator.
A
no-load
(RO ) reading
part. After
these(R
null-balance
readings
the point
made (making
after loading
the
second
reading
LOAD) is then
of measurement
black), thereadings
numerical
information
is
part.
After these null-balance
(making
the point of
electronicallyblack),
transferred
to a computer
congured
with
measurement
the numerical
information
is electroniPhotoStress
PSCalc
software.
The computer
instantly
cally
transferred
to a computer
congured
with PhotoStress
makes and
displays
strain/stress
calculations
at disthe
PSCalc
software.
Thethe
computer
instantly
makes and
selected
of measurement.
to making
plays
the points
strain/stress
calculations at Prior
the selected
pointsthe
of
compensator readings,
other information
regarding
the
measurement.
Prior to making
the compensator
readings,
type and
thicknessregarding
of the PhotoStress
coating
beingofused,
other
information
the type and
thickness
the
physical constants
the material
beingconstants
tested, the
PhotoStress
coatingof
being
used, physical
of test
the
load sequence,
etc., is the
entered
into sequence,
the software.
material
being tested,
test load
etc., is entered
into the software.
In order for the null-balance measurement to be achieved,
the compensator must first be aligned in the direction
In order for the null-balance measurement to be achieved,
of the algebraically maximum principal strain. This is
the compensator must rst be aligned in the direction of the
easily determined by establishing the directions of the
algebraically maximum principal strain. This is easily detertwo principal strains at the point of measurement with
mined by establishing the directions of the two principal
an isoclinic measurement as described on page 8. The
strains at the point of measurement with an isoclinic meacompensator is then aligned with one of these directions,
surement as described on page 8. The compensator is then
and the compensation attempted. If null-balance cannot
aligned with one of these directions, and the compensation
be achieved, it means the compensator is aligned with
attempted. If null-balance cannot be achieved, it means the
the minimum principal strain direction. Repositioning
compensator is aligned with the minimum principal strain
the compensator 90 away will allow the null-balance
direction. Repositioning the compensator 90 away will
compensation to be performed.
allow the null-balance compensation to be performed.

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technical
questions,
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For
technical
support,
contact
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Number:11212
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Revision29-Jun-2011
02-Aug-05

TN-702-2

Tech Note
Note TN-702-2
TN-702-2
Tech
Tech
Note
TN-702-2
Micro-Measurements
Vishay Micro-Measurements
Vishay Micro-Measurements
Vishay Micro-Measurements

Introduction to Stress Analysis byIntroduction


the PhotoStress
MethodAnalysis by t
to Stress
th

Introduction to Stress Analysis by th

The PhotoStress
PhotoStress Separator
Separator Gage
Gage is
is based
based on
on this
this fundafundaThe
mental
principle of
of Separator
mechanics.Gage
As shown
shown
in on
Figure
17, the
the
The PhotoStress
is based
this 17,
fundamental
principle
mechanics.
As
in
Figure
gage
grid
consists
of
two
perpendicular
elements
connected
mental
principle
As shown
in Figure
17, the
gage grid
consistsofofmechanics.
two perpendicular
elements
connected
in series.
series.
The
indicated
strain
from the
the gage
gage
then corresponds
corresponds
gage
gridThe
consists
of two
perpendicular
elements
connected
in
indicated
strain
from
then
in series. The indicated strain from the gage then corresponds

Figure 17. PhotoStress Separator Gage

Figure 16a. Model 832 Compensator

Figure 16b. PSCalc Software results

7.0 Principal Strain/Stress Separation Methods


In order to obtain principal strain/stress values at locations
removed from free boundaries, an additional measurement
is required. This is usually obtained by using PhotoStress
Separator Gages or experimentally by creating an articial
free boundary called a slit. The pages that follow will
provide an introduction to each method and the governing
equations associated with them.

TT
ET E
C
H
O
T
ET EE
EC
C HHN N
NO
OT

If the sum of the principal strains can be determined at the


same point where the difference of the principal strains
is measured, then the separate principal strain values are
obtainable by simply solving equations simultaneously.

Document Number: 11212


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12

Figure 18
1
Figure
xx ++ yy18
2
Figure
x + y 2

The
The
and
its
The
and its
and its a
7.2 Slitt
Slit
7.2
7.2
Slitt
A slit
slit
A
tion
of
A
slitof
tion
bounda
tion
of
bounda
such as
as
bounda
such
such as

Tech Note

7.1 Strain Gage Separator Method

The PhotoStress Separator Gage is based on this


fundamental principle of mechanics. As shown in Figure
17, the gage grid consists of two perpendicular elements
connected
in 17.
series.
The indicated
Figure
17.
PhotoStress
Separatorstrain
Gage. from the gage
Figure
PhotoStress
Separator
Gage.
of the gage
then corresponds
to (x + Separator
y)2 regardless
Figure 17. PhotoStress
Gage.
orientation
on
the
coated
test
surface.
Representing
+ y)2
)2 regardless
regardless of
of the
the gage
gage orientation
orientation on
on the
the coated
coated the
to ((x +
to
x
youtput
gage
signal
by
the
symbol
SG
for
convenience
test
surface.
Representing
the
gage
output
signal
by
the
sym- in
regardless ofthe
thegage
gageoutput
orientation
coated
to
test(surface.
signalonbythe
the
symx + y)2Representing
algebraic
manipulation,
for
convenience
in
algebraic
manipulation,
bol
S
test
surface.
Representing
the gage output
signal by the symG for convenience
in algebraic
manipulation,
bol S
G
in algebraic manipulation,
bol SG for convenience

+
xx + yy
(16)
SSGG == +2
(16)
(16)
x 2 y
and
SG =
(16)
2
+ y =
= 2S
2SG
and
xx +
and
y
G
x + y = 2SG
and
Adding to,
to, and
and subtracting
subtracting from,
from, the
the measurement
measurement of
of the
the
Adding
difference
of
principal
strains,from,
Adding
and
subtracting
from,
measurement
of the
Adding
to,to,
and
subtracting
the the
measurement
of the
difference
of
principal
strains,
difference
of principal
strains,
difference
of principal
strains,
N N ff
xx yy == N
N
x +y == N
f
N
2
S
xx + yy = 2SGG
x + y = 2SG N f (17)
NNf
(17)
(17)
xx == SSGG ++ N N2 f
N
2
(17)
x = SG +
2
and
and
and
and = N f
xx yy = N NN f
x y == N
f

xx yy = 22NSSGG
x y = 2SG N f (18)
NNf
(18)
(18)
yy == SSGG N N2 f
(18)
y = SG N2
2 the usual procedure is to rst
In
practical
applications,
In
thethe
usual
procedure
is toisrst
Inpractical
practicalapplications,
applications,
usual
procedure
to first
complete
all
PhotoStress
observations
and
normal-incidence
Incomplete
practical
applications,
the usual
procedure
is to normalrst
complete
all PhotoStress
observations
and
normal-incidence
all
PhotoStress
observations
and
on the
the
coated
test
object.
Following
this,
measurements
(NN)) on
complete
all PhotoStress
observations
and
normal-incidence
coated
object.
Following
measurements
(N
incidence
measurements
(NNtest
) on
the
coated
testthis,
object.
N
separator
gages
are
installed
on
the
coating
at
the
potentially
)
on
the
coated
test
object.
Following
this,
measurements
(N
separator
gages
are
installed
on
the
coating
at
the
potentially
Following this,
N separator gages are installed on the coating
critical
points
established
by
PhotoStress
analysis.
Loads
separator
gages
are installed
onpoints
the coating
atanalysis.
the by
potentially
critical
points
established
by
PhotoStress
Loads
at the
potentially
critical
established
PhotoStress
are
then
reapplied
to
the
test
object,
and
the
separator
gageand
critical
points
established
byobject,
PhotoStress
Loads
are then
reapplied
to are
the then
test
and to
theanalysis.
separator
gage
analysis.
Loads
reapplied
the
test object,
measurements
are
recorded.
are
then
reapplied
to
the
test
object,
and
the
separator
gage
measurements
are gage
recorded.
the separator
measurements are recorded.
measurements
are recorded.
The
PhotoStress
Separator
Gage
(for
use
ononhigh-moduhigh-moduThe
(for
on
ThePhotoStress
PhotoStressSeparator
SeparatorGage
Gage
(foruse
use
high-modulus
lus
coatings
only)
embodies
a
number
of
special
features
The
PhotoStress
Separator
Gage
(for
use
on
high-modulus coatings
of of
special
features
coatingsonly)
only)embodies
embodiesa number
a number
special
features
designed
foronly)
ease embodies
of use
use and
and
optimum
performance
in
lus
coatings
a number
of performance
special features
designed
for
ease
of
optimum
in
PhotoStress
applications.
First
in
importance,
of course,
course,in
is
designed
forapplications.
ease of useFirst
and in
optimum
performance
PhotoStress
importance,
of
is
PhotoStress applications. First in importance, of course, is

that the
the
that
tion.the
It
that
tion.
It
sureme
tion.
It
suremen
avoid th
th
suremen
avoid
to the
thethgg
avoid
to
thethe
gag
to
g
the
gag
grid
is a
the
gridgag
is
for aaispr
pra
grid
for
for Grid
a pr
Grid
is
int
Grid
itit is
int
Vishay
it
is inte
Vishay
Vishay

For technical
technical support,
support, c
For
www.micro-measurements.com
photostress@vishay.
Forphotostress@vishay.
technical11support, c
photostress@vishay.

TN-702-2

Introduction
Introduction to
to Stress
Stress Analysis
Analysis by
by th
th

Micro-Measurements

To measure the strains at a slit boundary, refer to the equa-

To measure the strains at a slit boundary,


refer to the equaIntroduction to Stress Analysis tions
by below:
the PhotoStress Method
tions below:
designed for ease of use and optimum performance
in PhotoStress applications. First in importance, of
course, is that the gage does not require any particular
angular orientation. It is simply bonded at the point
where separation measurements are desired. Preattached
leadwires are provided to avoid the problems that users may
have in soldering the leads to the gage before installation,
or attempting to do so after the gage is bonded to the
photoelastic coatings. The gage grid is also encapsulated
in polyimide to eliminate the need for a protective coating
in most PhotoStress applications.
Grid resistance of the separator gage is 1000 ohms; and it
is intended that the gage be connected to an appropriate
Micro-Measurements strain indicator (Figure 18).
The complete technical background on the separator gage
and its application can be found in Tech Note TN-708.

where: 1, 2 = principal strains


1, 2 the
= principal
where:
To measure
strains strains
at a slit boundary, refer to the

=
principal
stresses
equations
11, below:
22 = principal stresses
elastic modulus
structure
2s =
=
strainsof
where: 1, E
E
= principal
elastic modulus
of structure
s

s =
structure
1,
= Poissons
principalconstant
stresses of
2s =
Poissons
constant
of structure
Ec ==Poissons
constantofofstructure
elastic modulus
c s= Poissons
constant of
PhotoStress Coating Material
PhotoStress
Coating
Material
s = Poissons constant
of structure
fc = calibration value for
fc =
calibration
value forof PhotoStress
oissons constant
Coating Material
c = PPhotoStress
PhotoStress
Coating Material
Coating Material
Ro = Digital compensator reading (no load)
Rfo =
Digital compensator reading (no load)
c = c alibration value for PhotoStress
R1 = Digital
(under load)
Coatingcompensator
Material reading
R = Digital
compensator
reading (under load)
1

R 0 = Digital compensator reading (no load)


R1 = Digital compensator reading (under load)
7.2.1 Slitting in the direction of 1:
7.2.1 Slitting in the direction of 1:

7.2.1 Slitting in the direction of 1:

Measurement before slitting


Measurement before slitting
Measurement before slitting
1 2 = fc ( R1 R0 )
(19)
1 2 = fc ( R1 R0 )
(19)
12 = fc (R1R 0) (19)
Measurement after
after slitting
parallel
to
Measurement
slittingwith
withcompensator
compensator
parallel
Measurement after slitting with compensator parallel to
slit
to slit
slit
f

(20)
1 = fcc ( R1 R0 )
(20)
1 = 1 + c ( R1 R0 )
(20)
1 + c

Figure 18. P3 Strain Indicator and Recorder

7.2 Slitting Method


A slit made in the PhotoStress coating in the direction of
1 or 2, creates a uniaxial stress state at the slit boundary.
To create a slit, appropriate tooling is needed, such as the
slitting tool shown in Figure 19.

7.2.2 Slit
7.2.2 Slit

Measure
Measure
slit
slit

Measurem
Measure
to slit
to slit

Calculate
Calculate

Note tha
Note tha
(22a) is th
(22a) is t

Once
Once
cipal stre
cipal stre

Measurement
after
slitting
withwith
compensator
perpendicular
Measurement
after
slitting
compensator
perpenafter slitting with compensator perpentoMeasurement
slit to slit
dicular
dicular to slit
f

1 = fcc ( R1 R0 )
(20a)
1 = 1 + c ( R1 R0 )
(20a)

(20a)
1
+

Calculated from (19) and (20)


Calculatedfrom
from(19)
(19)and
and(20)
(20)
Calculated
2 = 1 fc ( R1 R0 )
2 = 1 fc ( R1 R0 )

(21)
(21)

fc (R1Rbetween
Eqs. (20) and (20a)
(21)is
= 1[
0)]
Note that the2only
difference
Tech
Note
TN-702-2
Note that the only difference
between
Eqs. (20)
and (20a) is
that (20a) has a negative sign.
that (20a) has a negative
sign. Micro-Measurements
Vishay
Note that the only difference between Eqs. (20) and (20a) is
that (20a) has a negative sign.

Introduction to Stress Analysis by


the PhotoStress Method
7.2.1 Slitting in the direction of :
2

Tech Note

To measure the strains at a slit boundary, refer to the equations below:


where:

7.2.2 Slitting in the direction of 2:

= f (R R )
1 21 = 2fc (cR1 1R0 )0

1, 2 = principal strains
1, 2 = principal stresses
Es = elastic modulus of structure
Figure 19. A slitting tool

s = Poissons constant of structure

the same as (19) above


the same as (19) above

Measurementafter
afterslitting
slitting
with
compensator
parallel
Measurement
with
Compensator
parallel
to

Document
Number: 11212
to slit
slit
Document
Number: 11212
Revision
02-Aug-05
Revision 02-Aug-05f

2 =

c = Poissons constant of

1 + c

(R1 R0 )

For technical support, co


Forphotostress@vishay.co
technical support, co
photostress@vishay.co

(22)
(22)

www.micro-measurements.com
contact
Document Number: 11212
PhotoStress Coating Material For technical questions,
Measurement after slitting with Compensator
perpendicular
12
photostress@vishaypg.com
Revision
29-Jun-2011

fc = calibration value for

PhotoStress Coating Material

to slit

nalysis
nalysis by
by the
the PhotoStress
PhotoStress Method
Method

equae equa-

ad)
ad)
load)
load)

(19)
(19)

allel to
allel to
(20)
(20)

erpenerpen(20a)
(20a)

7.2.2 Slitting in the direction of 2:


7.2.2 Slitting in the direction of 2:

1 2 = fc ( R1 R0 )
1 2 = fc ( R1 R0 )

TN-702-2

the same as (19) above


the same as (19) above

Micro-Measurements

Measurement after slitting with Compensator parallel to


Measurement after slitting with Compensator parallel to
slit
slit
f
by the PhotoStress Method
= fcc ( R1 R0 ) to Stress Analysis
2 Introduction
(22)
2 = 1 + c ( R1 R0 )
(22)
1 + c
Measurement after slitting with Compensator perpen4. Zandman, F., S. Redner, and J.W. Dally, Photoelastic
Measurement
slitting with Compensator perpendicular
dicular to slitafter
Coatings. Ames, Iowa: Iowa State University Press,
Measurement
after
slitting
with
Compensator
perpendicular
to slit
1977.
to slit
f

5. Zandman, F., S. Redner, and D. Post, Photoelastic 2 = fcc ( R1 R0 )


(22a)

(22a)
2 = 1 + c ( R1 R0 )
(22a)
coating Analysis in Thermal Fields.Experimental
1 + c

Mechanics 3: 215-221 (September 1963).


Calculated
(19)
Calculatedfrom
from
(19)and
and(22)
(22)
Calculated from (19) and (22)
1 = 2 + fc ( R1 R0 )
(23)

(23)
1 = 2 + fc ( R1 R0 )
(23)

Note that the only difference between Equations (22) and
Noteis
that
the
only
difference
between
Equations(22)
(22)and
and
Note
that
only
difference
(22a)
thatthe
(22a)
has
a negativebetween
sign. Equations
(22a)isisthat
that(22a)
(22a)has
hasaanegative
negativesign.
sign.
(22a)

6. Zandman, F., S. Redner, and E.I. Reigner, reinforcing


Effect of Birefr ingent Coatings. Exper i mental
Mechanics 2: 55-64 (February 1962).

Micro-Measurements Technical References


Tech Note TN-701, Calibration of PhotoStress Coatings.

Oncethe
the principal
principal strains
have
beenbeen
measured,
the prinOnce
strains
have
measured,
the
Once
the principal
strains
have been measured, the principal
stresses
can then
calculated.
principal
stresses
canbethen
be calculated.
cipal stresses can then be calculated.

Tech Note TN-704, How to Select PhotoStress Coatings.


Tech Note TN-706, Corrections to PhotoStress Coating
Fringe-Order Measurements.

8.0 Bibliography

Tech Note TN-708, Principal Stress Separation in


PhotoStress Measurements.

1. Blum, A.E., The Use and Understanding of Photoelastic


Coatings, Strain, Journal of the British Society for
Strain Measurement 13: 96-101 (July 1977).

Application Note IB-221, Instructions for Coating and


Contouring PhotoStress Sheets.

2. Post, D. and F. Zandman, Accuracy of Birefringentcoating method for Coatings of Arbitrary Thickness.
Experimental Mechanics 1: 22-32 (January 1969).

Application Note IB-223, Instructions for Bonding Flat


and Contoured PhotoStress Sheets to Test-Part Surfaces.

3. Redner, S., Photoelastic Coatings. Experimental


Mechanics, 20: 403-408 (November 1980).

(21)
(21)

20a) is
20a) is

For technical questions, contact


photostress@vishaypg.com

Tech Note

Document Number: 11212


Revision 29-Jun-2011

www.vishaymg.com
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technical support, contact


technical support, contact
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photostress@vishay.com

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