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Rigaku Corporation
Application laboratory
Keigo Nagao
Feature of TTRAX
Rigaku TTRAX
2
X-ray
source
Detector
Sample holder
In-Plane measurement
(2/scan)
Horizontal goniometer
High power X-ray source
Parallel beam method
In-Plane axis
Feature of TTRAX
Feature of TTRAX
In Horizontal goniometer
Hard-to-pack sample
Independent on
sample condition
Feature of TTRAX
Target
Feature of TTRAX
Parallel Beam
Detector
RS
X-ray source
DS
X-ray source
Detector
SS
DS
Multi layer
Miller
Sample
Focusing method
Parallel beam
Systematic error
1. Flat sample
2. Umbrella effect
3. Adsorption effect
4. Eccentric error
Umbrella effect
Intensity
Strong
medium
Feature of TTRAX
PB selection slit
Multilayer mirror
Sample
Focusing geometry (BB)
Sample
Parallel beam geometry (PB)
Feature of TTRAX
Flat
10
11
12
13
14Rough 5
2(deg)
10
11
12
13
14
2(deg)
Feature of TTRAX
X-ray source
2
Receiving slit : open
Parallel slit analyzer
X
2-
Datum surface
Eccentric surface
2
2
Basics of XRD
Interaction of substance and X-ray :1
2dsin = n
Braggs equation
2dsin =
X-ray wavelength
n1,2,3
dInterplanar spacing
Bragg angle
Basics of XRD
Interaction of substance and X-ray :2
Sample
1000
Intensity ( a.u. )
X-ray
100
10
1
0.1
0
10
2 (deg.)
Basics of XRD
Interaction of substance and X-ray :3
reflection
0
10
refraction
-1
10
Reflectivity
-2
10
-3
10
refraction
reflection
-4
10
2/ (degree)
Basics of XRD
Intensity
Intensityvs.
vs.Orientation
Orientation
Preferred
Preferredorientation
orientation
Fiber
structure
Fiber structure
Pole
Polefigure
figure
FWHM
FWHM
Crystal
Crystalquality
quality
Crystallite
Crystallitesize
size
Lattice
Latticestrain
strain
Integrated
IntegratedInt.
Int.
ofofamorphous
amorphous
Crystallinity
: :Quantitative
Quantitativeanalysis
analysis
Intensity
Integrated
IntegratedInt.
Int.
ofofcrystal
crystal
Angle2
Basics of XRD
Intensity ( counts )
Anatase
(Photocatalyst etc)
TiO2
2 ( deg. )
Rutile
(Cosmetic etc)
Basics of XRD
Basics of XRD
Crystallite size
Polycrystal
There is one or multiple crystalline in one particle.
Small angle
X-ray scattering
Crystallite size
Particle
size
The width of
diffracted line
Scherrer method
Hall method
Basics of XRD
Mo
(CPS)
Intensity(cps)
10.0
900
900
100
8.0
6.0
58.0 58.1 58.2 58.3 58.4 58.5 58.6 58.7 58.8 58.9 59.0 59.1 59.2 59.3
100
4.0
2.0
x10^3
I
40
Molybdenum - Mo
50
60
70
80
2(deg)
Basics of XRD
Crystallinity
Plastic wrap
Crystallinity .
10
15
20
25
30
2(deg)
35
40
45
Basics of XRD
3500
Intensity(CPS)
3000
2dsin=
35.12 35.16
Al2O3
25.56 25.58
2500
2000
1500
900
25
1000
500
0
23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40
2(deg)
10
Basics of XRD
d1
d2
d3
Tensile stress
d1
d4
d2
d3
d4
Basics of XRD
=0
=0
:N
Intensity(counts)
2(deg)
sin2
11
Basics of XRD
-E
cos0
Kstress constant)
180
21
Material-specific value
Eyoungs modulus, poisson ratio,
0diffraction angle in stress free condition
N
SC
XG
N
tension
SC
XG
minus psi
plus psi
compress
2
compress
tension
sin2 0
sin2
Basics of XRD
Before rubbing
Sample
After rubbing
12
Texture evaluation
13
Texture evaluation
Metal orientation
(rolled sample)
Approximate equivalent
to single crystal
Uni-axial
orientation
(Epitaxial film)
fiber orientation
Texture evaluation
nonoriented
2D image
Diffraction
pattern
2
14
Texture evaluation
Y
a
Texture evaluation
Stereographic
projection figure
15
Texture evaluation
Pole figure
RDRolling direction
X
TD
Transverse
direction
Z
TD
NDNormal direction
Texture evaluation
Sample behavior
in Reflection method and Transmission method
Reflection
method
rotation
rotation
Transmission
method
16
Texture evaluation
90
Wulff net.
62
Texture evaluation
90
35
17
Texture evaluation
100
0
90
45
90
111
54.7
210
26.6
63.4
90
35.3
65.9
211
(h2k2l2)
ND
RD
110
0
60
90
35.3
90
18.4
50.8
71.5
30
54.7
73.2
90
111
0
70.5
109.5
39.2
75.0
19.5
61.9
90
210
211
0
36.9
53.1
24.1
43.1
56.8
0
33.6
48.2
Texture evaluation
ND
111211=19.561.990
RD
RD
18
Texture evaluation
[112]
RD
[112]
19
Purpose of SAXS
Small Angle X-ray Scattering
Particle size
the distribution
molecular
structure
Principle of SAXS
X-ray
Scattering angle
( 2 = 0~10 deg. )
Sample
Scattering
Diffraction 2dsin=n
1000
Intensity ( a.u. )
Intensity ( a.u. )
1000
100
10
1
0.1
100
10
1
0.1
5
2 (deg.)
10
2 (deg.)
20
Particle information
z Particle size and particle distribution
Intensity ( a.u. )
1000
100
10
1
10
2 (deg.)
Phase information
z Long-period structure
1000
Intensity ( a.u. )
100
1/3
1/2
10
1
0.1
0
2 (deg.)
21
Ultima
TTRAX III
NANO-Viewer
Semiconductor
2D detector Pilatus100k
2D image
X-ray
source
1st slit
2nd slit
2D detector
3rd slit
Sample
3slits optics
22
NANO-Solver
Intensity ( a.u. )
Distribution ( a.u. )
4 6 8
2 (deg.)
0
5
10
Particle / Pore size ( nm )
10
size
distribution
SAXS
profile
Closely particle
sphere
cylinder
Core/shell
Intensity (a.u.)
z Size : 60nm
Intensity (a.u.)
z Size : 3nm
4
6
2 (deg.)
10
4
6
2 (deg.)
10
Normalized dispersion : 10 %
23
Intensity (a.u.)
Intensity (a.u.)
z Dispersion : 10 %
4
6
2 (deg.)
10
4
6
2 (deg.)
10
Average diameter : 3 nm
Applications of SAXS
Particle size estimation
( transmission mode )
24
104
103
102
101
100
0
4
6
2 (deg.)
No.1
No.2
No.3
Distribution( a.u.)
Intensity (CPS)
105
2
4
6
8
Particle size ( nm )
10
SAXS
No.2
No.3
Distribution( a.u.)
No.1
No.1
No.2
No.3
4
6
8
Particle size ( nm )
10
25
Intensity (a.u.)
Intensity (a.u.)
z Mesoporous silica
2
3
2 (deg.)
2
3
2 (deg.)
26