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125
Chapter
Sensors for
Transducers
5.1
INTRODUCTION
Transducers are electromechanical devices that convert a mechanical change, such as
displacement or force, into a change in an electrical signal that can be monitored as
a voltage after conditioning. A wide variety of transducers are available for use in
measuring mechanical quantities. Transducer characteristics, which include range, linearity, sensitivity, and operating temperatures, are determined primarily by the sensor
that is incorporated into the transducer to produce the electrical output. For example,
a set of strain gages on a tension link provides a transducer that produces a resistance change \R/R in proportion to the load applied along the axis o f the link. The
strain gages serve as the sensor in this force transducer and play a significant role in
establishing the characteristics of the transducer.
Sensors used in transducer design include potentiometers, differential transformers,
strain gages, capacitors, piezoelectric and piezoresistive crystals, thermistors, and so
on. The important features of these different sensors are described in this chapter.
The range of the potentiometer is controlled by the active length L of the coil.
Linear potentiometers are available in many lengths up to about 1 m. The range of
the angular-displacement potentiometer can be extended by arranging the coil in the
form of a helix. Helical potentiometers are commercially available with as many as
20 turns; therefore, angular displacements as large as 7200 deg can be measured quite
easily.
In order to improve resolution, potentiometers have been introduced that utilize
thin films with controlled resistivity instead of wire-wound coils. The film resistance
on an insulating substrate exhibits high resolution, lower noise, and longer life. For
example, a resistance of 50 to 100 ft/mm can be obtained with the conductive plastic
films that are used for commercially available potentiometers with a resolution of
0.001 mm.
The dynamic response o f both the linear and the angular potentiometer is severely
limited by the inertia of the shaft and wiper assembly. Since this inertia is large,
5.2
POTENTIOMETERS
The simplest type of potentiometer, shown schematically in F i g . 5 . 1 , is the slide-wire
resistor. This sensor consists of a length I of resistance wire attached across a voltage
source v,. The relationship between the output voltage v and the position x of a
wiper, as it moves along the length of the wire, can be expressed as
(5.1)
126
Differential Transformers
5.3
DIFFERENTIAL TRANSFORMERS
Differential transformers, based on a variable-inductance principle, are also used
to measure displacement. The most popular variable-inductance sensor for lineardisplacement measurements is the linear variable differential transformer (LVDT). An
LVDT, illustrated in Fig. 5.3a, consists of three symmetrically spaced coils wound
onto an insulated bobbin. A magnetic core, which moves through the bobbin without
contact, provides a path for magnetic flux linkage between coils. The position of the
magnetic core controls the mutual inductance between the center or primary coil and
the two outer or secondary coils.
Coil 1, secondary
Coil 2, secondary
n r
Difference voltage
m
Figure 5.3 (a) Sectional view of a linear variable differential transformer (LVDT). (b) Schematic diagram of the LVDT
circuit.
127
When an ac excitation is applied to the primary coil, voltages are induced in the
two secondary coils. The secondary coils are wired in a series-opposing circuit, as
shown in Fig. 53b. When the core is centered between the two secondary coils, the
voltages induced in the secondary coils are equal but out o f phase by 180 deg. Since
the coils are in a series-opposing circuit, the voltages v, and v in the two coils cancel
and the output voltage is zero. When the core is moved from the center position, an
imbalance in mutual inductance between the primary and secondary coils occurs and
an output voltage, v = v - v,, develops. The output voltage is a linear function
of core position, as shown in Fig. 5.4, as long as the motion of the core is within
the operating range of the LVDT. The direction of motion can be determined from the
phase of the output voltage relative to the input voltage.
2
The frequency of the voltage applied to the primary winding can range from 50 to
25,000 Hz. I f the L V D T is used to measure transient or periodic displacements, the
carrier frequency should be 10 times greater than the highest frequency component
in the dynamic signal. Highest sensitivities are attained with excitation frequencies
between 1 and 5 k H z . The input voltage can range from 5 to 15 V The power
required is usually less than 1 W. Sensitivities of different LVDTs vary from 0.02 to
0.2 V / m m of displacement per volt of excitation applied to the primary coil. At rated
excitation voltages, sensitivities vary from 0.16 to 2.5 V / m m of displacement. The
higher sensitivities are associated with short-stroke LVDTs, with an operating range
of 2 mm; the lower sensitivities are for long-stroke LVDTs, with an operating range
of 1 5 0 m m .
Since the L V D T is a passive sensor that requires ac excitation at a frequency different
from common ac supplies, signal conditioning circuits are required for its operation.
A typical signal conditioner (see Fig. 5.5) provides a power supply, a frequency
generator to drive the LVDT, and a demodulator to convert the ac output signal from
the L V D T to an analog dc output voltage. Finally, a dc amplifier is incorporated in
the signal conditioner to increase the magnitude of the output voltage.
Power
supply
DC
amplifier
Frequency
generator
signal
129
input, resolution is determined by the characteristics of the voltage recorder. Noncontact also ensures that life w i l l be long, with no significant deterioration of performance
over this period. The small core mass and freedom from friction sive the sensor a
limited capability for dynamic measurements. Finally, the sensors are not damaged by
overtravel; therefore, they can be employed as feedback transducers in servo-controlled
systems where overtravel may occur owing to accidental deviations beyond the control
band. Typical performance characteristics for LVDTs, DCDTs. and RVDTs are listed
in Table 5 . 1 .
1
Figure 5.5 Block diagram of the signal conditioning circuit for an LVDT.
During the past decade, microelectronic circuits have been developed that permit
miniaturization o f the signal conditioners so that they can be packaged within the
case of an LVDT. The result is a small self-contained sensor known as a direct-current
differential transformer ( D C D T ) . A D C D T operates from a battery or a regulated power
supply and provides an amplified output signal that can be monitored on either a D V M
or an oscilloscope. The output impedance of a D C D T is relatively low (about 100 ft).
Both the LVDT and the D C D T are used to measure linear displacement. A n analogous device known as a rotary variable differential transformer (RVDT) has been developed to measure angular displacements. As shown in Fig. 5.6, the RVDT consists of
two primary coils and two secondary coils wound symmetrically on a large-diameter
insulated bobbin. A cardioid-shaped rotor, fabricated from a magnetic material, is
mounted on a shaft that extends through the bobbin and serves as the core. As the
shaft rotates and turns the core, the mutual inductance between the primary and secondary windings varies and produces an output voltage versus rotation response that
resembles a modified sinusoid.
Although the RVDT is capable of a complete rotation (360 deg), the range of linear
operation is limited to 4 0 deg. The linearity of a typical RVDT, having a range of
4 0 deg, is about 0.5 percent of the range. Reducing the operating range improves
the linearity, and an RVDT operating within a range of 5 deg exhibits a linearity of
about 0.1 percent of this range.
The LVDT, DCDT, and RVDT have many advantages as sensors for measuring displacement. There is no contact between the core and the coils; therefore,
friction and hysteresis are eliminated. Since the output is continuously variable with
= ^"
(5.2)
where
p is the specific resistance o f the metal
L is the length of the conductor
A is the cross-sectional area of the conductor
Differentiating Eq. 5.2 and dividing by the resistance R gives
dR
dp
= +
dL
dA
(a)
y
R
p
L
A
'
The term dA represents the change in cross-sectional area of the conductor resulting
from the applied load. For the case of a uniaxial tensile stress state, recall that
e
dL
=
and
dL
= ~ ~J^
V
e, = -vs
where
is the axial strain in the conductor
, is the transverse strain in the conductor
v is Poisson's ratio of the metal used for the conductor
If the diameter of the conductor is do before application of the axial strain, the diameter
of the conductor d after it is strained is
f
= d (l
(c)
- Vj
Figure 5.6 Simplified cross section of a rotary variable differential transformer (RVDT).
dL
-2v
L
(d)
Model
Number
Nominal
Linear
Range
(in.)
050 H R
100 H R
200 HR
300 H R
400 H R
500 H R
1000 H R
2000 H R
3000 H R
4000 H R
5000 H R
10000 H R
0.050
0.100
0.200
0.300
0.400
0.500
1.000
2.000
3.000
4.000
5.000
10.000
. .
Sensitivity
[(mV/V)/0.001 i n . ]
50
100
125
150
0.10
0.10
0.10
0.10
0.15
0.15
0.25
0.25
0.15
0.15
0.15
0.15
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.25
0.35
0.35
0.35
1.00
0.50"
0.50"
0.50"
1.00"
1.00"
0.50
0.50
0.50
0.50
0.60
0.75
1.30"
1.00"
1.00"
1.00"
6.3
4.5 .
2.5
1.4
0.90
0.73
0.39
0.24
0.27
0.22
0.15
0.08
Secondary
Primary
430
4000
1070
1150
1100
1700
5000
4000
2700
3000
460
460
330
115
275
375
320
330
375
550
310
550
400
750
Nominal
Linear Range (in.)
Scale
Factor (V/in.)
Response
- 3 dB (Hz)
050 D C - D
100 D C - D
200 D C - D
500 D C - D
1000 D C - D
2000 D C - D
3000 D C - D
5000 D C - D
10000 D C - D
0.050
0.100
0.200
0.500
1.000
2.000
3.000
5.000
10.000
200
100
50
20
10
5.0
3.3
2.0
1.0
500
500
500
500
200
200
200
200
200
Impedance ( f t )
30
40
60
Sensitivity
KmV/V)/degree]
0.25
0.5
0.5
1.0
1.5
3.0
2.3
1.1
125
750
500
2000
2.5
0.5
0.5
1.0
1.5
3.0
2.9
1.7
370
2500
1300
5400
Primary
Secondary
132
133
(5.3)
Sa
m=i!
(i 2 )
+
(5.4)
The quantity S is defined as the sensitivity of the metal or alloy used for the conductor.
It is evident from Eq. 5.4 that the strain sensitivity of a metal or alloy is a result of
the changes in dimensions of the conductor, as expressed by the term (1 + 2v), and
the change in specific resistance, as represented by the term (dp/p)/e.
Experimental
studies show that the sensitivity S ranges between 2 and 4 for most metallic alloys
used in strain-gage fabrication. Because the quantity (1 + 2v) is approximately 1.6
for most of these materials, the contribution owing to the change in specific resistance
with strain varies from 0.4 to 2.4. This increase in specific resistance is the result of
variations in the number of free electrons and their changing mobility with applied
strain.
A
A list of the alloys commonly employed in commercial strain gages, together with
their sensitivities, is presented in Table 5.2. The most commonly used strain gages
are fabricated from the copper-nickel alloy known as Advance or constantan. The
response curve for this alloy (AR/R as a function of strain) is shown in Fig. 5.8. This
alloy is widely used because its response is linear over a wide range of strain (beyond
8 percent), it has a high specific resistance, and it has excellent electrical stability
with changes in temperature.
Most resistance strain gages are of the metal-foil type, where the grid configuration is formed by a photoetching process. Since the process is versatile, a wide
variety of gage sizes and grid shapes can be produced. Typical examples are shown in
Fig. 5.9. The shortest gage available is 0.20 m m ; the longest is 102 m m . Standard
gage resistances are 120 and 350 O ; however, special-purpose gages with resistances
of 500, 1000, and 5000 ft are also available.
The etched metal-film grids are extremely fragile and easy to distort, wrinkle, or
tear. For this reason, the metal grid is bonded to a thin plastic film, which serves as
a backing or carrier, before photoetching. The carrier film, shown in Fig. 5.7, also
provides electrical insulation between the gage and the component after the gage is
bonded.
A strain gage exhibits a resistance change AR/R
the direction of the grid by the expression
AR
-g- = V
(5.5)
where S is the gage factor or calibration constant for the gage. The gage factor S is
always less than the sensitivity of the metallic alloy S because the grid configuration
of the gage with the transverse conductors is less responsive to axial strain than a
straight uniform conductor.
The output AR/R o f a strain gage is usually converted to a voltage signal with a
Wheatstone bridge, as illustrated in Fig. 5.10. I f a single gage is used in one arm of
the Wheatstone bridge and equal but fixed resistors are used in the other three arms,
the output voltage is
S
Composition (%)
Material
Advance or Constantan
Nichrome V
Isoelastic
Karma
Armour D
Platinum-Tungsten
45
80
36
74
70
92
N i , 55 Cu
N i . 20 Cr
N i , 8 Cr, 0.5 M o , 55.5 Fe
N i , 20 Cr, 3 A l , 3 Fe
Fe, 20 Cr, 10 A l
Pt, 8 W
Sa
2.1
2.1
3.6
2.0
2.0
4.0
= ^
4
(5-6)
M
\R
134
Capacitance Sensors
135
-v S e
s
(5.7)
The input voltage is controlled by the gage size (the power it can dissipate) and
the initial resistance o f the gage. As a result, the sensitivity, S = v /s
=
v S /4,
usually ranges from 1 to 10 p,V / (p.m / m).
...
I t
I)
CAPACITANCE SENSORS
ia
i1?
The capacitance sensor, illustrated in Fig. 5.11a, consists o f a target plate and a
second plate known as the sensor head. These two plates are separated by an air gap
of thickness h and form the two terminals o f a capacitor, which exhibits a capacitance
C given by
kKA
C =
(5.8)
where
250WY
250TK
SU*-
K is the relative dielectric constant for the medium in the gap (K = 1 for air)
k is a proportionality constant; k = 0.225 for dimensions in inches and k =
0.00885 for dimensions in millimeters
h
Target
Figure 5.9 Configurations of metal-foil resistance strain gages. (Courtesy of Micro-Measurements Division, Measurements Group, Inc., USA), (a) Single-element gage, (b) Singleelement gage, (c) Single-element gage, (d) Two-element rosette, (e) Two-element rosette.
if) Two-element stacked rosette, (g) Three-element rosette, (h) Three-element rosette, (i) Threeelement stacked rosette. (J) Torque gage. (*) Diaphragm gage. (<) Stress gage, (m) Singleelement gage for use on concrete.
To constant current
AC power supply
Sensor
head
To s h i e l d
power supply
Electrostatic
field
(a)
Target
To c o n s t a n t current
AC power supply
Sensor
head
Guard
I
To s h i e l d
power supply
Electrostatic
field
lb)
Figure 5.11 Capacitor sensor (a) without guard ring, where edge
effects in the electrostatic field affect the range of linearity, and
(b) with guard ring to extend the range of linearity.
132
133
dp
+ ^ ( i
2v)
(5.3)
P
alloy is widely used because its response is linear over a wide range of strain (beyond
8 percent), it has a high specific resistance, and it has excellent electrical stability
with changes in temperature.
dp/p
+ (1 + 2v)
(5.4)
The quantity S is defined as the sensitivity of the metal or alloy used for the conductor.
It is evident from Eq. 5.4 that the strain sensitivity of a metal or alloy is a result of
the changes in dimensions of the conductor, as expressed by the term (1 + 2v), and
the change in specific resistance, as represented by the term (dp/p)/s.
Experimental
studies show that the sensitivity S ranges between 2 and 4 for most metallic alloys
used in strain-gage fabrication. Because the quantity (1 + 2v) is approximately 1.6
for most of these materials, the contribution owing to the change in specific resistance
with strain varies from 0.4 to 2.4. This increase i n specific resistance is the result of
variations in the number of free electrons and their changing mobility with applied
strain.
A
A list of the alloys commonly employed in commercial strain gages, together with
their sensitivities, is presented in Table 5.2. The most commonly used strain gages
are fabricated from the copper-nickel alloy known as Advance or constantan. The
response curve for this alloy (AR/R as a function of strain) is shown in Fig. 5.8. This
Most resistance strain gages are of the metal-foil type, where the grid configuration is formed by a photoetching process. Since the process is versatile, a wide
variety of gage sizes and grid shapes can be produced. Typical examples are shown in
Fig. 5.9. The shortest gage available is 0.20 m m ; the longest is 102 m m . Standard
gage resistances are 120 and 350 ft; however, special-purpose gages with resistances
of 500, 1000, and 5000 ft are also available.
The etched metal-film grids are extremely fragile and easy to distort, wrinkle, or
tear. For this reason, the metal grid .is bonded to a thin plastic film, which serves as
a backing or carrier, before photoetching. The carrier film, shown in Fig. 5.7, also
provides electrical insulation between the gage and the component after the gage is
bonded.
A strain gage exhibits a resistance change AR/R that is related to the strain s in
the direction of the grid by the expression
AR
(S.5)
where 5 is the gage factor or calibration constant for the gage. The gage factor S is
always less than the sensitivity of the metallic alloy S because the grid configuration
of the gage with the transverse conductors is less responsive to axial strain than a
straight uniform conductor.
The output AR/R o f a strain gage is usually converted to a voltage signal with a
Wheatstone bridge, as illustrated in Fig. 5.10. I f a single gage is used in one arm of
the Wheatstone bridge and equal but fixed resistors are used in the other three arms,
the output voltage is
S
Composition (%)
Material
Advance or Constantan
Nichrome V
Isoelastic
Karma
Armour D
Platinum-Tungsten
45
80
36
74
70
92
N i , 55 Cu
N i . 20 Cr
N i , 8 Cr, 0.5 M o , 55.5 Fe
N i , 20 Cr, 3 A l , 3 Fe
Fe, 20 Cr, 10 A l
Pt, 8 W
5A
2.1
2.1
3.6
2.0
2.0
4.0
AR
(5.6)
136
Eddy-Current Sensors
The capacitance sensor has several advantages. It is noncontacting and can be used
with any target material, provided the material exhibits a resistivity less than 100
ft/cm-. The sensor is extremely rugged and can be subjected to high shock loads
(5000 g) and intense vibratory environments. Its use as a sensor at high temperature
is particularly impressive. Capacitance sensors can be constructed to withstand temperatures up to 2000F, and they exhibit a constant sensitivity S over an extremely
wide range of temperature ( 7 4 - 1 6 0 0 F ) . Examination of the relation for 5 in Eq. 5.12
shows that the dielectric constant K is the only parameter that can change with temperature. Since K is constant for air over a wide range of temperature, the capacitance
sensor has excellent temperature characteristics.
If the separation between the head and the target is changed by an amount Ah, then
the capacitance C becomes
C + AC =
kKA
(a)
(h + /Ah)
AC
I +
(5.9)
(Mi/h)
The change in the capacitive impedance Z is usually measured with the circuit
illustrated schematically in Fig. 5.12. The probe, its shield, and the guard ring are
powered with a constant current ac supply. A digital oscillator is used to drive the ac
supply and to maintain a constant frequency at 15.6 kHz. This oscillator also provides
the reference frequency for the synchronous detector. The voltage drop across the probe
is detected with a low-capacitance preamplifier. The signal from the preamplifier is
then amplified again with a fixed-gain instrument amplifier. The high-voltage ac signal
from the instrument amplifier is rectified and given a sign in the synchronous detector.
The rectified signal is filtered to eliminate high-frequency ripple and give a dc output
voltage related to Ah. A linearizing circuit is used to extend the range of the sensor
by accommodating for the influence of the fringes in the electrostatic field. Finally,
the signal is passed through a second instrument amplifier where the gain and zero
offset can be varied to adjust the sensitivity and the zero reading of the D V M display.
When the gain and zero offset are properly adjusted, the D V M reads A/i directly to
the scale selected by the operator.
c
(2.42)
oiC
With a capacitance change AC ,
1
Z
+ AZc =
(b)
C + AC
gives
AC/C
(5.10)
1+ AC/C
Zc
137
Ah
(5.11)
5.6
EDDY-CURRENT SENSORS
An eddy-current sensor measures distance between the sensor head and an electrically
conducting surface, as illustrated in Fig. 5.13. Sensor operation is based on eddy
currents that are induced at the conducting surface as magnetic flux lines from the
sensor intersect with the surface of the conducting material. The magnetic flux lines
Target
Probe
Synchronous
detector
Linearization
circuit
0"
Output
''amplifier
^ Analog
output
The sensitivity of the capacitance probe is given by Eqs. 2.42, 5.8, and 5.11 as
AZ
Ah
Zc
h
1
wCh
(5.12)
wkKA
Sensitivity can be improved by reducing the area A of the probe; however, as noted
previously, the range of the probe is limited by linearity to about D / 2 . Clearly there
is a range-sensitivity trade-off. Of particular importance is the circular frequency u>
in E q . 5.12. Low frequency improves sensitivity but limits frequency response of the
instrument, another trade-off. It is also important to note that the frequency of the ac
power supply must remain constant to maintain a stable calibration constant.
Low-capacitance
preamplifier
Constant current
AC source
Digital
tscillator
Power
supply
Digital
readout
Ground return
to chassis
figure 5.12 Schematic diagram of the instrument system used with a capacitor sensor.
138
Piezoelectric Sensors
-*
!*/
1 M H z magnetic field
//
System electronics
l
r
Output
1JV
P I E Z O E L E C T R I C SENSORS
A piezoelectric material, as its name implies, produces an electric charge when it
is subjected to a force or pressure. Piezoelectric materials, such as single-crystal
quartz or polycrystalline barium titanate, contain molecules with asymmetrical charge
distributions. When pressure is applied, the crystal deforms and there is a relative
displacement of the positive and negative charges within the crystal. This displacement
of internal charges produces external charges of opposite sign on the external surfaces
of the crystal. I f these surfaces are coated with metallic electrodes, as illustrated in
Fig. 5.15, the charge q that develops can be determined from the output voltage v,
since
q = vC
(5.13)
(5.14)
where
S
A
Piezoelectric Sensors
140
141
Pressure p
Piezoelectric
crystal
Electrode
A.
4 y-lilil
Pressure p
Area A
(a)
(2.42)
(dC
(5.15)
(5.16)
kK
jcoC
Clearly, the impedance ranges from infinity for static applications to about 10 k f t for
very high frequency applications (100 kHz). With this high output impedance, care must
be exercised in monitoring the output voltage; otherwise, serious errors can occur.
Most transducers exhibit a relatively low output impedance (in the range of 100 to
1000 ft). When piezoelectric crystals are used as the sensing elements in transducers,
the output impedance is usually extremely high, but it is a variable. The output
impedance of a small cylinder of quartz depends on the frequency w associated with
the applied pressure. Since the sensor acts like a capacitor, the output impedance is
Again, voltage sensitivity S of the sensor is a function of the orientation of the axis
of the cylinder relative to the crystallographic axes. Typtcal values of S are also
r
the most stable of the piezoelectric material and is nearly loss free both mechanically
and electrically. Its properties are: modulus of elasticity, 86 GPa; iesist.v.ty, 10
0 m,
S (pC/N)
g
Transducer
5 ( V m/N)
V
2.2
-2.0
4.4
Parallel to polarization
130
0.011
-56
-0.004
Perpendicular to polarization
Amplifier
1
!
I
I
0.055
-0.05
0.11
Figure 5.16 Schematic diagram of a measuring system
with a piezoelectric sensor.
140
Piezoelectric Sensors
Pressure p
Electrode
J > i \\\ \ \ \
-ft
"
Piezoelectric
crystal
Electrode
\)
141
tit I'Tf
Pressure p
Zc = t V
(a)
?L\h
kK
S
'
Most transducers exhibit a relatively low output impedance (in the range of 100 to
1000 fi). When piezoelectric crystals are used as the sensing elements in transducers,
the output impedance is usually extremely high, but it is a variable. The output
impedance of a small cylinder of quartz depends on the frequency ai associated with
the applied pressure. Since the sensor acts like a capacitor, the output impedance is
kK
(5.16)
S hp
jiot
(2.42)
tut
Clearly, the impedance ranges from infinity for static applications to about 10 k f l for
very high frequency applications (100 kHz). With this high output impedance, care must
be exercised in monitoring the outpnt voltage; otherwise, serious errors can occur.
A circuit diagram of a typical system used to measure a voltage produced by a
piezoelectric sensor is shown in Fig. 5.16. The piezoelectric sensor acts as a charge
generator. In addition to the charge generator, the sensor is represented by parallel
components, including a capacitor C (about 10 pF) and a leakage resistor R (about
p
Orientation
Material
S (pC/N)
g
Quartz Si2
Single crystal
2.2
-2.0
Barium titanate
4.4
130
BaTi0
Ceramic, poled
3
Perpendicular to polarization
-56
Transducer
S (V m/N)
Amplifier
!
0.055
-0.05
0.11
0.011
-0.004
~J7
I _
Charge generator
I
I
142
10' ft). The capacitance of the lead wires C must also be considered, because even"
relatively short lead wires have a capacitance larger than that of the sensor. The ampju
fier is either a cathode follower or a charge amplifier with sufficient input impedance
to isolate the piezoelectric sensor in spite of its very large output impedance. If
pressure is applied to the sensor and maintained for a long period of time, the charge
q developed by the piezoelectric material leaks off by way of a small current flow
through R and the amplifier resistance R . The time available for readout of the
signal depends on the effective time constant t of the circuit, which is given by
L
R C<
E
Rp
(C,
T A.4
A
+ C
+ C)
A
(5.17)
Equation 5.18 shows that the resistivity of the semiconductor can be adjusted to any
specified value by controlling the concentration of the trace impurity. The impurity
concentrations commonly employed range from 1 0 to 10 atoms/cm , which permits
a wide variation in the initial resistivity. For example, the resistivity for P-type silicon
with a concentration of 10 atoms/cm is 500 fidm,
which is about 30,000 times
higher than the resistivity of copper. This very high resistivity facilitates the design
of miniaturized sensors.
16
20
Equation 5.18 also indicates that the resistivity changes when the piezoresistive
sensor is subjected to either stress or strain because of the variations in the mobility
fj.. This change of resistivity is known as the piezoresistive effect and can be expressed
by the equation
where
R
C
20
Pij
= u p + Tr.juni
(5.19)
where
Time constants ranging from 1000 to 100,000 s can be achieved with quartz sensors
and commercially available charge amplifiers. These time constants are sufficient to
permit measurement of quantities that vary slowly with time or measurement of static
quantities for short periods of time. Problems associated with measuring the output
voltage diminish as the frequency of the mechanical excitation increases and the output
impedance Z of the sensor decreases.
The inherent dynamic response of the piezoelectric sensor is very high, since the
resonant frequency of the small cylindrical piezoelectric element is so large. The resonant frequency of the transducer depends on the mechanical design of the transducer
as well as the mass and stiffness of the sensor. For this reason, specification of frequency response will be deferred to Chapter 9. It should be noted here, however, that
the most significant advantage of the piezoelectric sensor is its very high frequency
response.
i, j , k, and /
iTjjki
Tki
5, j
range from 1 to 3
is a fourth rank piezoresistive tensor
is the stress tensor
is the Kronecker delta
Pit
= PU + Ti a
+ TT (022 + cr )]
PZ2
= p [ l + 7T, T 2 +
TTniP'ii
TT (o-
12
P33 = P [ l +
iri
CT33
l2
33
+
+
cr )]
22
Pl2 = P*MT|2
P23 = P1T44T23
P31 = pTTuTi\
5.8
P I E Z O R E S I S T I V E SENSORS
,
Piezoresistive sensors, as the name implies, are fabricated from materials that exhibit
a change in resistance when subjected to a pressure. The development of piezoresistive
materials was an outgrowth of semiconductor research conducted by the Bell Telephone
Laboratories in the early 1950s. This research eventually led to the transistor.
Piezoresistive sensors are made from semiconductive materials usually silicon,
with boron as the trace impurity for the P-type material and arsenic as the trace
impurity for the N-type material. The resistivity p of a semiconducting material can
be expressed as
where the subscripts 1 , 2 , and 3 identify the axes of the single crystal.
These equations indicate that the piezoresistive crystal, when subjected to a general
state of stress, becomes electrically anisotropic. The resistivity depends on the stresses
t , which are referred to the axes of the semiconductor silicon. Because of this
electrical anisotropy, Ohm's law is written as
u
', = Ptji)
(5.21)
where
v' is the potential gradient (V/m)
i' is the current density ( A / m )
2
p =
(5.18)
where
e is the electron charge, which depends on the type of impurity
N is the number of charge carriers, which depends on the concentration of the
impurity
fj. is the mobility of the charge carriers, which depends on strain and its direction
relative to the crystal axes
'[1
+ 1"llO ll +
r
i' [l + lT O2
22
Tr ((T22
l2
+ C 3 3 ) ] + 77-44(1,T,2 +
3X3])
7 r ( ( 7 3 3 + C T , , ) ] + 7744(13-123 + M T
1 2
-l =
P
2 3
(5.22)
144
Photoelectric Sensors
These results show that the voltage drop across a sensor depends on the current
density i', the state of stress r , and the three piezoresistive coefficients. The piezoresistive coefficients can be adjusted by controlling the concentration of the impurity
and by optimizing the direction of the axis of the sensor with respect to the crystal
axes. The sensitivity of a typical sensor is high (for example, a piezoresistive strain
gage exhibits a gage factor of 100, whereas a metal-foil strain gage exhibits a gage
factor of 2).
145
O u t p u t leads
During the past decade, considerable progress has been made in applying fabrication
techniques used in the microelectronics industry to the development of microminiature
sensors. These solid-state sensors incorporate silicon as the mechanical element and
piezoresistive sensors. In a piezoresistive pressure sensor, a diaphragm is etched from
silicon to form the mechanical element of the transducer. Resistances that form the
arms of a Wheatstone bridge are diffused or ion implanted directly into the silicon
diaphragm.
Extremely small sensors may be produced using micromachining techniques that
involve photolithography methods developed in the microelectronics industry. An accurate pattern of the mechanical element is transferred to a photoresist coating on a
silicon wafer. Anisotropic etchants, which etch at different rates along different crystal
axes, are used to produce three-dimensional shapes in exposed silicon areas.
An example of a solid-state sensor that utilizes micromachining and a number of
integrated-circuit technologies is shown in Fig. 5.17. This neural microprobe was
developed to record signals from single cells in the brain. Eight of the thirty-two
recording sites on each probe can be selected for monitoring and amplification. The
on-chip amplifiers, which require no off-chip components, each occupy only 0.06
mm and provide a gain of 300. The overall probe is 4.7 mm long.
2
5.9
P H O T O E L E C T R I C SENSORS
In applications in which contact cannot be made with the specimen being examined,
a photoelectric sensor can often be employed to monitor changes in the intensity
of light that can be related to the quantity being measured. In these applications,
the photoelectric device is the detector and the entire system, including the detector,
amplifiers, signal conditioners, and readout devices, is often called a radiometer.
There are two basic types of detectors, thermal and photon, depending on the signal
input to the detector. Thermal detectors, which utilize thermocouples and thermopiles
(described in Section 5.12), employ heat transfer and temperature change to sense
radiation. These detectors, with time constants on the order of 100 ms, respond very
slowly when compared with photon detectors. Thermal detectors are used effectively
to measure light intensity in continuous-wave laser beams, where the intensity of the
radiation is extremely high and the intensity of the output is constant with time.
Photon detectors are used more widely as general-purpose sensors because they
are more sensitive and respond more quickly with time. The three common types of
photon detectors are ( I ) photoconductors, (2) photoemissive tubes, and (3) semiconductor photovoltaic diodes. Several characteristics of these photon detectors permit
classification of their performance. The first is noise equivalent power (NEP), which
is the radiant flux required to give an output signal equal to the detector noise. This
definition gives a signal-to-noise ratio of one with
NEP =
(5.23)
where v is the noise signal in volts and R is the responsivity in V/W given by:
(5.24)
v
H
A
(a)
The NEP value depends on wavelength, modulation frequency, detector area, temperature, and detector bandwidth. Detector bandwidth is usually 1 Hz, and N E P is
sometimes expressed in units of W - H z " ' ' .
/
146
Photoelectric Sensors
v = RHA
= vH-= kvH
NEP
(5.2S)
Ideal p h o t o c o n d u c t o r
3 0 0 K background
where k = A Q / N E P is a constant.
The linearity of a photon detector is usually represented by the output current versus
light intensity relationship illustrated in Fig. 5.18. The lower limit coincides with the
N E P where the noise signal v = v. The linear range of the silicon photodiode
shown in Fig. 5.18 extends from the N E P level to an upper limit, which depends on
the load resistance in the external circuit. Typically, this linear range covers 8 to 10
orders of magnitude.
The normalized sensitivity, known as the specific detectivity D*, is defined to allow
comparisons of types of detectors independent of detector area Ar> and bandwidth f ,
Thus.
LiTa0
.1
hK
.2
Wavelength
10 2 0
50
pyroelectric
Thin-film thermopile
100
Xfim
The bandwidth is incorporated into the sensitivity relation because noise power is
proportional to /;,.. Noise signal v is then proportional to Jfbw
The sensitivity is a function of the wavelength A of the radiation and the material used in the
photon detector. The specific detectivity D* for several detectors is presented in
Fig. 5.19.
= RHA
is <fiven by Eq
iR
(a)
and
<P -
5.9.1
147
SH
(5.27)
Vacuum-tube Detectors
flowing
.Ad
(5.28)
R-
where
Rl
R
Evacuated glass
envelope
10-'
Cathode
Semitransparent
Photocathode
o
10"
Phototube
: l
. ' A
-10
- 8
- 6
-4
[Q-2
ib)
Light intensity HA
(W)
148
Photoelectric Sensors
Electrode
Plastic c o a t i n g
149
P h o t o c o n d u c t i v e layer
Electrode
R
- Ceramic base
1 <i
(a)
(6)
Figure 5.22 (a) Construction details for a plastic-coated photoconduction cell, (b)
Equivalent electrical circuit with R replacing the photoconduction cell.
( T
5.9.2
G = i,vJ "
Photoconductive Cells
(5.29)
The photocurrent requires some time to develop after the excitation is applied and
some time to decay after the excitation is removed. The rise and fall times for commercially available photoconductors are usually several seconds. Because of these delays, the CdS and CdSe photoconductors are not suitable for dynamic measurements.
Instead, their simplicity, high sensitivity, and low cost lend them to applications involving counting and switching based on a slowly varying light intensity.
where
k i and k are constants for a given tube
v is the applied voltage between the anode and cathode
n is the number of stages
2
5.9.3
Semiconductor Photodiodes
Although semiconductor photodiodes may be classified as photoconductors. photodiodes fabricated from silicon and incorporating a P/N junction differ so markedly
in both construction and performance that they are described separately here. The
150
151
Active d i a m e t e r
Metal
\
-r-t
Oxide
'
Metal
(a)
Active diameter
Guard ring
Oxide.
| / \
J -
N+
'
II I
i-W-
EGG S G D - 1 0 0 A
w/////// v/////////A
(i)
I'H
Of;
Figure 5.23 (a) Photodiode designed and connected for zero-bias operation in the
photovoltaic mode, (b) Photodiode designed with a guard ring and connected in a
circuit with negative-bias for operation in the photoconduction mode.
many applications. The photodiodes may be used in either mode with operational
amplifiers to give an exceptionally high responsivity. For example, the photovoltaic
detector shown in Fig. 5.24a gives R = 130 X 10 W W with a gain-bandwidth
product o f 100 k H z when the signal is amplified with an operational amplifier. The
photoconductive detector shown in Fig. 5.246 gives a lower responsivity R = 5 x 10
VAV, but the gain-bandwidth product is 20 M H z .
6
Continued improvements in semiconductor photodiodes expand the sensors available. Space limitations, however, preclude a more thorough treatment in this book.
Placement o f large numbers of photodiodes along a line or over an area to create
line or area arrays of sensors has greatly expanded the number of applications for
photodiodes i n field measurements o f light patterns.
(5.30)
where
7b
is a reference temperature
Ao
152
5.11
Use of E q . 5.32 is convenient and acceptable when the temperature range is small and
the higher order terms of E q . 5.31 are negligible. Differentiation of Eq. 5.32 shows
that the slope of the specific resistance curve is negative.
Thermistors have many advantages over other temperature sensors and are widelyused in industry. They can be small (0.005-in. diameter) and consequently permit point sensing and rapid response to temperature change. Their high resistance
minimizes lead-wire problems, and their output is more than 10 times that of an
RTD, as shown in Fig. 5.26. Finally, thermistors are very rugged, which permits
use in those industrial environments where shock and vibration occur. The disadvantages of thermistors include nonlinear output with temperature, as indicated by
Eqs. 5.31 and 5.32, and a limited range. Significant advances have been made in
thermistor fabrication methods, and it is possible to obtain stable, reproducible, interchangeable thermistors that are accurate to 0.5 percent over a specified temperature
range.
THERMISTORS
A second type of temperature sensor based on resistance change of the sensing element
with temperature is known as a thermistor. A thermistor differs from a resistance
temperature detector because the sensing element is fabricated from a semiconducting
material instead of a metal. The semiconducting materials, which include oxides
of copper, cobalt, manganese, nickel, and titanium, exhibit very large changes in
resistance with temperature. As a result, thermistors can be fabricated in the form of
"extremely small beads, as shown in Fig. 5.25.
Resistance change with temperature for a thermistor can be expressed by an equation
of the form
lnp = A
0+
+ g +
+ ^
(5.31)
5.12
where
p
is the specific resistance of the material
A], A ,....
A are material constants
6
is the absolute temperature
2
The temperature-resistance relationship as expressed by E q . 5.31 is usually approximated by retaining only the first two terms. The simplified equation is then expressed as
In p = Ao +
(5.32)
THERMOCOUPLES
A thermocouple is a temperature sensor consisting of two dissimilar materials that
are in thermal and electrical contact. A potential develops at the interface of the two
materials as the temperature changes. This thermoelectric phenomenon is known as
the Seebeck effect. Thermoelectric sensitivities (p-V^C) for a number of different
materials in combination with platinum are listed in Table 5.4. The data of Table 5.4
can be used to determine the sensitivity of any thermocouple junction by noting, for
example, that
^Chromel/Alumel
^Chromel/platinum
^Alumel/platinum
154
Crystal Oscillators
155
Meter
Material B
Material B
Material A
100
200
300
400
500
Temperature C
characteristics of thermistors
and RTDs.
Common thermocouple material combinations include iron/constantan, Chromel/Alumel, Chromel/constantan, copper/constantan, and platinum/platinum-rhodium.
The output voltage from a thermocouple junction is measured by connecting two
identical thermocouples into a circuit, as shown in Fig. 5.27. The output voltage v
5.13
CRYSTAL OSCILLATORS
from this circuit is related to the temperature at each junction by an expression of the
form
= S A/em
where
S/
A B
7j
Ti
(5.33)
T)
2
Material
Constantan
Nickel
Alumel
Carbon
Aluminum
Silver
Sensitivity
(pATC)
-35
-15
-13.6
+ 3
+ 3.5
+ 6.5
Sensitivity
Material
Copper
Gold
Tungsten
Iron
Chromel
Silicon
(p-vm
+
6.5
+
6.5
+
7.5
+ 18.5
+ 25.8
+440
Time is defined as the interval between two events, and measurements of this interval
are made by making comparisons with some reproducible event. For example, the
time required for the earth to orbit the sun gives the measurement o f a year, and
the time required for the earth to rotate on its axis gives the measurement of a day.
Emphemeris time is based on astronomical measurements of the time required for the
earth to orbit the sun. Sidereal time is earth rotation time measured with respect to a
distant star. Solar time is earth rotation time measured with respect to the sun. Sidereal
time is used primarily in astronomical laboratories. Solar time is used for navigation
on earth and in daily life.
The fundamental unit o f time in both the English and International (SI) systems of
units is the second. Prior to 1956, the second was defined as 1/86,400 of a mean solar
day (average period of revolution of the earth on its axis). In the late 1950s, atomic
research revealed that certain atomic transitions can be measured with excellent repeatability. As a result, the Thirteenth General Conference on Weights and Measures, which
was held in Paris in 1967, redefined the second as the duration of 9,192,631,770 periods of the radiation corresponding to the transition between the two hyperfine levels
of the fundamental state of the atom of cesium 133. The estimated accuracy o f this
standard is two parts in 10 . Currently, standards laboratories throughout the world
have cesium-beam oscillators that agree in frequency to within a few parts in 1 0 .
9
156
Summary
157
SUMMARY
Crystal
oscillator
A wide variety of basic sensors have been described in this chapter. These sensors
are sometimes used directly to measure an unknown quantity (such as use of a thermocouple to measure temperature): however, in many other instances, the sensors
are one component of a more involved transducer, such as a piezoelectric crystal in
an accelerometer. Important characteristics that must be considered in the selection
process of a sensor include the following:
1. Size. Smaller is better, because of enhanced dynamic response and minimum
interference with the process or event.
2. Range. Extended range is preferred so as to increase the latitude of operation.
Time t
(a)
3. Sensitivity. Higher output devices have the advantage of requiring less amplification.
Hi
-VA
4. Accuracy. Devices that exhibit errors of 1 percent or less after considering zero
shift, linearity, and hysteresis are preferred.
5. Frequency response. Wide-response sensors that permit application in both
static and dynamic loading situations are preferred.
6. Stability. Low drift in output over extended periods of time and with changes
in temperature and humidity is essential.
7. Temperature limits. The ability to operate from cryogenic to elevated temperatures is considered important.
8. Economy. Reasonable costs are preferred.
Buffer
(6)
Figure 5.28 (a) The pulse train generated by a crystal oscillator
operating at a frequency/, (b) Feedback from the crystal in a
series-resonance oscillator operating at the natural frequency of
the crystal maintains the stability of the oscillator.
Electronic counters, which are multipurpose instruments based on digital circuits,
are utilized in engineering laboratories to measure time and several other time-related
quantities. Components used in these instruments include an internal clock, gates,
comparators, scalers, and counters.
The internal clock, which provides the time base for the digital electronic counter,
is the time sensor. The clock is a crystal oscillator that issues a train of pulses, as
illustrated in Fig. 5.28a. The oscillator circuit, shown in Fig. 5.286, incorporates a
piezoelectric crystal, usually quartz, to provide stability to the circuit. The oscillator
is driven at the natural frequency of the crystal, and the feedback from the crystal
maintains the oscillator frequency equal to the natural frequency for extended periods
of time. Long-term frequency stability varies, depending on the quality of the oscillator, from one part in 10 to one part in 10 . Short-term stability, measured in hours,
is about one pan in 10 . Small frequency changes occur owing to aging of the crystal
and are usually of the order of 1 to 10 ppm/yr.
Crystal oscillators are available with frequencies that cover a very wide range (1 to
150 M H z ) . At the lower frequencies (1 to 20 MHz), the quartz crystal is usually
driven at its fundamental frequency, and at the higher frequencies, overtone modes of
resonance are employed to stabilize the oscillator.
Most counters used in engineering laboratories utilize a 10 MHz crystal oscillator,
which is housed in a small oven to maintain a constant temperature and improve stabilitys
9. Ease of application.
R E F E R E N C E S
158
Summary
EXERCISES
5.1
5.17
Describe the differences between a sensor and a transducer. Give an examp
5.3
5.4
5.6
5.7
What happens i f v, is
(d)
5.7 m V
5.23
5.24
5.25
5.26
5.27
functioning
(b)
Prepare a sketch of the output signal as a function o f time for an LVDT with
(a)
functioning
(b)
(b)
(c)
polymers
nonmagnetic metallic foils
Indicate procedures that permit usage of the sensor in these three cases.
5.28
(a)
(b)
What two factors are responsible for the resistance change dR/R
in an electrical
resistance strain gage? Which is the most important for gages fabricated trom
5.29
Determine the output voltages for the piezoelectric crystals described in Exercise 5.28.
5.30
constantan?
5.16
200
5.22
and is to detect the onset of yielding, specify the maximum range. What is the
5.15
2.06
mild steel. I f the strain extensometer is to be used only in the elastic region
5.14
650
1000
650
5.13
2.07
(b)
its core moving at constant velocity from one end of the L V D T through the
5.12
350
A short-range displacement transducer utilizes a cantilever beam as the mechanical element and a strain gage as the sensor. Derive an expression for the
displacement S of the end of the beam in terms of the output voltage v.
5.11
(c)
(d)
1600
5.9
2.02
3.47
5.21
120
350
5.20
(a)
(b)
5.19
e(jtuVm)
For the conditions described in Exercise 5.17, determine the output voltage v
for an initially balanced bridge i f the input voltage r, is
(a) 2 V
(c) 7 V
(b) 4 V
(d) 10 V
5.5
5.18
A 20-tum potentiometer with a calibrated dial (100 divisions per turn) is used
tance of 20 k f t and a resolution of 0.05 percent, what is the minimum
tfo(ft)
159
What function does the thin plastic film serve for an electrical resistance strain
gage?