Documente Academic
Documente Profesional
Documente Cultură
VLSI Testing
Testing
Yield
Yield Analysis
Analysis &
& Fault
Fault Modeling
Modeling
Virendra Singh
Indian Institute of Science
Bangalore
virendra@computer.org
VLSI
VLSI Chip
Chip Yield
Yield
E0-286@SERC
Clustered
Clustered VLSI
VLSI Defects
Defects
Good chips
Faulty chips
Defects
Wafer
Unclustered defects
Wafer yield = 12/22 = 0.55
Jan 18, 2008
E0-286@SERC
Yield
Yield Parameters
Parameters
(+x )
E0-286@SERC
Yield
Yield Equation
Equation
Y = Prob ( zero defect on a chip ) = p (0)
Y = ( 1 + Ad / )
Example: Ad = 1.0, = 0.5, Y = 0.58
Unclustered defects: = , Y = e
- Ad
E0-286@SERC
Defect
Defect Level
Level or
or Reject
Reject Ratio
Ratio
E0-286@SERC
Determination
Determination of
of DL
DL
E0-286@SERC
Modified
Modified Yield
Yield Equation
Equation
Three parameters:
Fault density, f = average number of stuck-at
faults per unit chip area
Fault clustering parameter,
Stuck-at fault coverage, T
The modified yield equation:
Y (T ) = (1 + TAf / ) -
Assuming that tests with 100% fault coverage
(T =1.0) remove all faulty chips,
Y = Y (1) = (1 + Af / ) -
Jan 18, 2008
E0-286@SERC
Defect
Defect Level
Level
Y (T ) - Y (1)
DL (T ) = -------------------Y (T )
( + TAf )
= 1 - -------------------
( + Af )
Where T is the fault coverage of tests, Af is the
average number of faults on the chip of area A,
is the fault clustering parameter. Af and are
determined by test data analysis.
Jan 18, 2008
E0-286@SERC
Yield
Yield and
and Fault
Fault Coverage
Coverage
Defect Level
30
25
20
15
10
5
0
0
Jan 18, 2008
10
20
30
40 50 60 70
Fault Coverage
E0-286@SERC
80
90 100
10
Computed
Computed DL
DL
(Courtesy: IBM)
E0-286@SERC
11
Revenues
Time
Time to
to Market
Market
Loss of
Revenues
Time to
Market
Jan 18, 2008
Time in Months
T
E0-286@SERC
12
Wearout
Failure Rate
Infant
Mortality
1-20 weeks
10-20 years
Product Life Time
E0-286@SERC
13
Definitions
Definitions
E0-286@SERC
14
Why
Why Model
Model Faults?
Faults?
E0-286@SERC
15
Some
Some Real
Real Defects
Defects in
in Chips
Chips
Processing defects
Missing contact windows
Parasitic transistors
Oxide breakdown
. . .
Material defects
Bulk defects (cracks, crystal imperfections)
Surface impurities (ion migration)
. . .
Time-dependent failures
Dielectric breakdown
Electromigration
. . .
Packaging failures
Contact degradation
Seal leaks
. . .
Ref.: M. J. Howes and D. V. Morgan, Reliability and Degradation Semiconductor Devices and Circuits, Wiley, 1981.
Jan 18, 2008
E0-286@SERC
16
Electromigration
(a)
(b)
(c)
E0-286@SERC
17
RL
A
R1
R2
(a)
B
A
Z
A
Z
(b)
E0-286@SERC
18
A
Z
Poly
Metal
Diffusion
E0-286@SERC
19
L1
L2
L2
(a)
(b)
Stuck-at 1
Vdd
Stuck-at 0
GND
(c)
Bridging Fault
(d)
E0-286@SERC
20
Observed
Observed PCB
PCB Defects
Defects
Occurrence frequency (%)
Defect classes
Shorts
Opens
Missing components
Wrong components
Reversed components
Bent leads
Analog specifications
Digital logic
Performance (timing)
51
1
6
13
6
8
5
5
5
E0-286@SERC
21
Failure Classification
IC Failures
M ode
D uration
Incorrect D esign
Perm anant
H ard
E0-286@SERC
22
Common
Common Fault
Fault Models
Models
Single stuck-at faults
Transistor open and short faults
Memory faults
PLA faults (stuck-at, cross-point, bridging)
Functional faults (processors)
Delay faults (transition, path)
Analog faults
E0-286@SERC
23
Single
Single Stuck-at
Stuck-at Fault
Fault
s-a-0
g
1
1(0)
h
i
k
0(1)
E0-286@SERC
24