HiperEtch™

New Structuring Concepts for Display Production

Easy, Fast and Environmentally Friendly
 EXPERTISE & PARTNERSHIP
Merck supports the Display industry with the background of more than 100 years of
experience in high technology products, e.g. Liquid Crystals. The local expertise and
global competence cover development, application know-how, manufacturing expertise
and worldwide market presence. As reliable partner we develop tailor-made, innovative
structuring concepts for our partners in the display manufacturing business, e.g.
touchpanel.

INNOVATION & QUALITY

With the isishape™ concept Merck offers a broad range of innovative structuring
materials that simplifies the processes and enables environmentally friendly production,
high utilization and production speed.

The isishape™ concept is recommended particular for production of new generation

Touchpanel, Flexible displays, OLEDs, EL backlights and others.

RELIABILITY
The Screen Printing of isishape™ etching pastes is an efficient and high throughput
process. In comparison to other removal techniques such as laser ablation or lithography
it provides lower operating and investment costs. Moreover it does neither cause
particles nor damages the substrate surface.

isishape™ structures layers of nearly all types of transparent conductive oxides, nitride or
oxygen compound materials (e.g. SiO2, SiNx), semiconductors (e.g. a-Si, poly-Si) and
metals (e.g. aluminium)

PROCESS

Substrate PRINTING HEATING CLEANING structured

isishape™ & DRYING Substrate

EASY, FAST & ENVIRONMENTALLY FRIENDLY

isishape™ is being applied in only 4 processing steps:

• Printing small amounts of etching paste on regions where material needs to be
removed.
• Heating up the substrate with the printed paste pattern.
Etching starts where the paste was printed only.
• Rinsing in DI-water cleans the substrate from the removed layer material.
• Drying the substrate finishes the structuring process.
APPLICATIONS
Printable Structuring Solutions

Functional and Semiconductors

TCO Layers Metal Layers
Antireflective Layers (wafers and layers)

ITO SiO2 c-Si AI

IZO SiNx a-Si Ag

AZO

ZnO

Other Structuring Solutions upon request. The chemical concept enables selective etching of layer systems.
Please contact for your specific application needs.

ENVIRONMENT & WASTE WATER

Being environmentally friendly, isishape™ products support the green factory concept
because they contain lowest concentrations of etching species and organic solvents. Due
to the very good material utilisation the water consumption in the cleaning process is
minimal. In addition cleaning and rinsing in DI water does not require organic detergents.
Both leading to extremely low COD (Chemical Oxygen Demand) and BOD (Biological
Oxygen Demand) values.

SUMMARY
The isishape HiperEtch™ concept shows many advantages in Display Applications:

Excellent processing
• Uses standard equipment for printing, etching and rinsing
• Provides improved paste spreading and very good line resolution down to 40 µm
• Leads to low material consumption
• Allows fast structuring time

Environmentally friendly
• Results in very low organic concentration in rinse water
• Enables easy cleaning without organic detergent
• isishape™ products in general contain no fluoride
Disclaimer
This information is intended to provide general notes on our products and their uses. We provide information and advice
to our customers on products and application technologies to the best of our knowledge and ability, but without
obligation or liability. Therefore, it should not be construed as guaranteeing specific properties of the products described
or for their suitability for particular applications.
Existing laws, regulations, and any existing industrial property rights are to be observed in all cases by our customers.
This also applies in respect to any rights of third parties. Our information and advice do not relieve our customers of their
own responsibility for checking the suitability of our products for the envisaged purpose.
The quality of our products is guaranteed under our General Conditions of Sale.

Contact addresses
Germany Merck KGaA Korea Merck Advanced Technologies Ltd.
Business Development Chemicals Mr. Chang-Hoon Koh
Structuring Solutions Haesung-2-Bldg.
Ms. Ursula Lehwald 4th Floor, 942-10, Daechi-3-dong,
Frankfurter Straße 250 Kangnam-ku,
64293 Darmstadt Seoul 135-725
Phone: +49 (0) 6151/72-8342 Phone: +82-2-2185-3898
Fax: +49 (0) 6151/72-918342 Fax: +82-2-2185-3880
ursula.lehwald@merck.de ch.koh@merck.co.kr

Japan Merck Ltd. Taiwan Merck Display Technologies Ltd.

Mr. Jun Nakanowatari Ms. Wen Lien
ARCO Tower, 5F. No. 33-1, Ching Chien 1 Rd.,
8-1, Shimomeguro 1-chome Kuanyin Ind. Park
Meguro-ku Taoyuan, Taiwan, R.O.C.
Tokyo 153-8927 Phone: +886-3-4836521 Ext. 2692
Phone: +81-3-5434-4740 Fax: +886-3-4160440
Fax: +81-3-5434-4708 wen.lien@merck.com.tw
jun_nakanowatari@merck.co.jp

Hong Kong Merck Limited Hong Kong USA EMD Chemicals Inc.,
Published
China Mr. Henry Tse Mr. Robert Miller 02/2008
29/F, 3 Lockhart Road, 480 South Democrat Road
Wanchai, Hongkong Gibbstown, NJ 08027
Phone: +852 / 2376 6341 Phone: +856-599-6634
Fax: +852 / 2576 1912 Fax : +914-785-5894
henry.tse@merck.com.hk robert.miller@emdchemicals.com

For further information please visit www.isishape.com