Process Control & Instrumentations

CEV 544

(Gas Pressure Control Plant)

GROUP 1:
1. Akashah Bin Zabri
2. Faradilah Binti Ajma’in
3. Nazihah Binti Bustari
4. Muhammad Muain Bin Md Sharif
Objectives

 To measure the pressure in the tank

 To study the characteristics in open loop and close
loop system using tangent method (TM) and
reformulated tangent method (RTM) on pressure
loop control
 To study the disturbance test
 Variables

 Control Variable : Pressure in the tank

 Manipulated Variable: Outlet gas flowrate

 Disturbance Variable : Inlet flowrate

: Temperature surrounding
Process & Instrumentation Diagram

P&ID for gas pressure system

 Start-up

The valve of air The valve of The control

supply is open (IAS) is fully panel is switch
at 30 psig open on
Open Loop Test

Select manual Enter the set

Set speed chart at
mode to set point, SP 20
1800 mm/hr
output psig

Wait until the process

Press the
is stable, then record Enter the MV
record (RCD)
the initial value of PV at 40%
button
and MV

Wait until the

process is stable, Calculate the value
Change the
then record the of P&I by using TM
MV to 50%
final value of PV and RTM
and MV
Close Loop & Disturbance Test

In manual mode, Change to auto

Record the
insert the value of mode and wait
initial value of
P&I from TM until the process
PV and MV
calculated value is stable

Continue the
Change the
Set the MV to 55% process with
process to
and wait for 3 load
manual
seconds disturbance
mode
test

Change the Wait until the Repeat all steps

process to process is for the RTM
auto mode stable calculated value
 Load Disturbance Test

Wait for 3 seconds

Make a change to
Set the controller to then set the
MV of about 5% to
manual mode controller to auto
10%
mode

If the process
becomes
Set MV to the last
oscillatory/unstable,
stable value
set the controller to
manual mode
Shut down

Switch of Change to
Set the MV
the record manual
to zero
button mode

Close PAS Switch off

and IAS the main
valves power