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Research Areas
http://vlsicad.ucsd.edu/
Funding Sources
SRC NSF IMPACT+ Qualcomm Samsung NXP Sandia
Design for Manufacturability
DFM = new bridges and synergies between
design and process technologies
Enables “design-based equivalent scaling” to
keep Moore’s Law going
Leakage power reduction
Modify gate-length of transistors to reduce power without performance loss
Conflict Graph
Design flows for multiple-patterning
In sub-28nm processes, multiple exposures are needed to print critical
chip layers: layout and mask design have new coloring rules, new
Double-Patterning Mask
Decomposition
variability models
Adaptive and Resilient Circuits
Technology Roadmap Adaptive voltage scaling for power reduction
Design and tape out of design-
dependent performance
monitors; optimization of DVFS
strategies
International Technology Roadmap for Approximate computation
Semiconductors (ITRS) Error-correctable approximate adder enables
Chair of Design and System Drivers runtime power-accuracy tradeoff; composition
chapters since 2000 and synthesis of approximate modules
UCSD develops core models for the Error-tolerant design
roadmap: layout density, low-power Minimize power by timing ARM DDRO
Cortex M3
design technology, MPU and SOC product slack redistribution for given
scaling workload, target error rate
Projection of key IC product classes
that drive need for semiconductor accurate
results
design, process technology
Quantify value to IC products
of interconnect, device, CAD technology approximate results
improvements