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Original Article http://dx.doi.org/10.4322/2176-1523.1310

OBTAINING NIOBIUM OXIDES IN ACETIC ACID WITH


ADDITION OF HF
Patrícia Marcolin 1
Marielen Longhi 2
Letícia Caio 3
Lucas Pandolphi Zini 3
Lilian Vanessa Rossa Beltrami 4
Jéssica Cristina Silva 5
Fernando Dal Pont Morisso 5
Sandra Raquel Kunst 1
Cláudia Trindade Oliveira 5

Abstract

During anodizing, the chemical attack of hydrofluoric acid (HF) electrolytes on niobium can promote the formation
of oxides with porous structures. However, this chemical attack can also cause an intense dissolution of the oxide during its
formation. This effect can be minimized by varying the HF concentration of the anodizing electrolyte, thereby controlling
the growth of the porous oxide. Studies have alternative electrolytes that do not use HF to obtain porous oxides.
Thus, organic electrolytes, such as acetic acid, may be a viable alternative. In this context, the objective of this study is to
obtain and evaluate the anodization of niobium in acetic acid at different current densities (10, 20 and 50 mA/cm2) and to
study the influence of the addition of HF to the electrolyte. The results showed that the anodized anodic in acetic acid,
under conditions of 100 V and 10 mA/cm2, presented porous oxide with less defects. Therefore, this result indicates that
it is possible to produce porous niobium oxides by anodizing in HF-free electrolyte.
Keywords: Niobium; Anodizing; Acetic acid.

OBTENÇÃO DE ÓXIDOS DE NIÓBIO EM ÁCIDO


ACÉTICO COM ADIÇÃO DE HF

Resumo

Durante a anodização, o ataque químico de eletrólitos de ácido fluorídrico (HF) sobre o nióbio pode promover a
formação de óxidos com estruturas porosas. Contudo, este ataque químico pode causar uma intensa dissolução do óxido
durante sua formação. Esse efeito pode ser minimizado variando-se a concentração de HF do eletrólito de anodização,
controlando assim o crescimento do óxido poroso. Estudos têm buscado por eletrólitos alternativos que não utilizam
HF na obtenção de óxidos porosos. Logo, eletrólitos orgânicos, como o ácido acético, podem ser uma alternativa viável.
Neste contexto, o objetivo deste estudo é obter e avaliar a anodização de nióbio em ácido acético em diferentes densidades
de correntes (10, 20 e 50 mA/cm2) e estudar a influencia da adição de HF ao eletrólito. Os resultados mostraram que
a amostra de nióbio anodizada em ácido acético, nas condições de 100 V e 10 mA/cm2, apresentou óxido proroso com
menor quantidade de defeitos. Portanto, este resultado indica que é possível a formação de óxidos de nióbio porosos por
anodização em eletrólito livre de HF.
Palavras-chave: Nióbio; Anodização; Ácido acético.

Programa de Pós-graduação em Engenharia de Processos e Tecnologias – PGEPROTEC, Universidade de Caxias do Sul – UCS, Caxias do Sul, RS,
1

Brazil. E-mail: pmarcolin@ucs.br


Programa de Pós-graduação em Engenharia de Minas, Metalúrgica e de Materiais – PPGE3M, Universidade Federal do Rio Grande do Sul – UFRGS,
2

Porto Alegre, RS, Brazil.


Laboratório de Corrosão – LCOR, Universidade de Caxias do Sul – UCS, Caxias do Sul, RS, Brazil.
3

Laboratório de Pesquisa em Corrosão – LAPEC, Universidade Federal do Rio Grande do Sul – UFRGS, Porto Alegre, RS, Brazil.
4

Instituto de Ciências Exatas e Tecnológicas – ICET, Universidade Feevale, Novo Hamburgo, RS, Brazil.
5

2176-1523 © 2016 Associação Brasileira de Metalurgia, Materiais e Mineração. Publicado pela ABM. Este é um artigo de acesso
aberto distribuído sob os termos da licença Creative Commons CC BY-NC-ND (Attribution-NonCommercial-NoDerivs) - https://
creativecommons.org/licenses/by-nc-nd/4.0/.

Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018 35
Marcolin et al.

1 INTRODUCTION In this context, in order to obtain continuous oxides


and with uniform pores, the objective of this study is to
Metals that form an oxide layer through anodizing promote the anodization of niobium in the acetic acid
are classified as metal valve. Anodizing is an ideal process electrolyte and to evaluate the influence of different current
for creating fine and homogeneous oxide layers with good densities and the concentration of HF in the electrolyte.
dielectric and semiconductor properties. It oxidizes in
temperatures above 200°C. Its most common oxidation states
are 2+, 4+ and 5+. Niobium oxide (II) presents superconductivity 2 EXPERIMENTAL
in temperatures near absolute zero and is used in circuits
as resistor. The oxide with oxidation number 4+ acts as an Pure niobium (99.5%) was provided in form of plates
excellent semiconductor. However, Nb2O5 is the most stable by Companhia Brasileira de Metalurgia e Mineração (CBMM).
compound and demonstrates good corrosion resistance in Samples were analyzed for anodizing curves. Morphology
acid and basic environments, high refractive index and low and deposited film thickness were evaluated by scanning
absorption in UV-visible region [1,2]. electron microscopy (SEM).
Anodization allows the formation of two types of Samples were cut into the dimensions of 2.0 x 1.0 cm
oxides: barrier and porous. The barrier oxides are obtained and, posteriorly, drilled on one end for securing the electric
in electrolytes that do not attack it [1,3]. While porous oxides contact. Electrical insulation was made, leaving an exposed
are formed in electrolytes that chemically attack the oxide.
area of 1cm2 on each side of the sample.
In this process, first the barrier oxide is formed, followed
Samples was pickling in solution of hydrofluoric acid
by dissolution of the same, which gives rise to the pores.
(HF) 40% and nitric acid (HNO3) 60% during 5 minutes,
This dissolution occurs by migration of the acid anion into
with stirring. Afterwards, they were rinsed with deionized
the oxide film, forming a complex with the metal, which
water and dried with cold air. On the anodizing process was
is soluble in water and responsible for pore formation [4].
Due to its biocompatibility and osteoconductivity, used the equipment brand Minipa model MPL-3303 with a
this oxide class has potential application in the area of voltage source 300 V and 0.5 A, which was connected to a
nanobiotechnology, due to the control of pore formation, computer for data acquisition. Potential was chosen in order
such as size and uniformity, which favor cell growth [5,6]. to force occurring of breakdown, to characterize the samples
Niobium can be applied in production of nanotubes, to the edge of barrier oxide formation. Variations of current
nanowires and membranes. In form of oxide, niobium can densities used were 10, 20 and 50 mA/cm2. Table 1 shows the
be used in gas sensors, solar cells, implants, electronic and nomenclature used for the samples analyzed in this research
magnetic devices and biotechnology [7]. and process parameters are described in Tables 2, 3 and 4.
These oxides are obtained through an anodizing process For scanning electron microscopy, it was used an
and may form barrier and porous oxides. Barrier oxides equipment Jeol JSM-6510LV Scanning Electron Microscope.
are obtained in electrolytes that does not attack the oxide. Samples were analyzed in top view in order to obtain
The electrolytes used for anodizing are generally acid, information related to the morphology of the oxide formed
because they present better results [1,3]. on the substrate surface. Samples were also evaluated
The excellent corrosion resistance of niobium in many through cross section, with metallization with golden film.
environments is attributed to the presence of a superficial Oxide densities of anodized samples were calculated
film of stable oxide (Nb2O5), protector and strongly adherent. based on niobium oxide thicknesses and on anodizing
In front of their applicability and high corrosion resistance, curves, according to Equation 1, through Faraday Law.
despite its relatively high cost, niobium is a material that has Calculated values are listed on Table 5.
stood out in the scientific and technologic landscape [8].
The choice of the appropriated material for equipment, itM
ρ= (1)
projects and controlled operations, constitute the largest zFD
controlling weapons of corrosive process. Niobium, being a Where:
very corrosion resistant in various environments, becomes ρ = density (g/cm3);
a promising material for many segments of industries. Some i = current density (A/cm2);
studies related to pure niobium behavior and its alloys
t = time that i remains constant (s);
in various environments were published. Most of them
M = Nb molar mass (265,81 g/mol);
show the good corrosion resistance, especially in aqueous
environments [1,3]. z = 10, product of niobium and oxygen oxidation states;
Currently, the formation of porous structures in F = Faraday constant (9,64x10−4 C/mol);
niobium occurs very efficiently in electrolytes containing D = thickness (cm).
hydrofluoric acid (HF), that may cause an intense dissolution. Oxide production rate was calculated through
Meanwhile, in a controlled manner, through this dissolution Equation 2. The values are listed on Table 4.
oxide can be obtained [7]. Considering the harmfulness of HF,
studies are being performed with organic electrolytes, such Thickness
Oxide production rate = (2)
as acetic acid, to form porous oxide with orderly growth. Timeto reach100V
36 Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018
Obtaining Niobium oxides in acetic acid with addition of HF

Table 1. Samples and anodizing conditions 3 RESULTS AND DISCUSSION


Sample Current Applied
Electrolyte density Potential Figure 1 illustrates the scheme of different regions
(mA/cm2) (V) present on the potential versus time transients during
Nb 0 -- 0 0 niobium anodizing. And the Figure 2 shows potential and
Nb 1 Acetic acid 1 mol/L 10 300 current transients measured during anodizing in acetic acid
Nb 2 Acetic acid 1 mol/L 20 300 1 mol/L, 300 V and 10, 20 and 50 mA/cm2.
Nb 3 Acetic acid 1 mol/L 50 300 Region 1 (Figure 1 and 2), shows a linear increasing of
Nb 4 Acetic acid 1 mol/L 10 100 potential in function of time, generating a constant (∂V/∂t),
Nb 5 Acetic acid 1 mol/L + HF 0.01 mol/L 10 100 designated anodizing rate. In this region, it is observed a
Nb 6 Acetic acid 1 mol/L + HF 0.1 mol/L 10 100 characteristic behavior of barrier film formation wherein all
Nb 7 Acetic acid 1 mol/L + HF 1 mol/L 10 100
the current density is used for film formation. ∂V/∂t variation
remains constant until reach the dielectric breakdown
potential (Vb), wherein occurs a decrease of ∂V/∂t value,
showing the beginning of region 2 (Figure 1 and 2). As the
Table 2. Potential variation in function of time during anodizing
(acetic acid 1 mol/L, 300 V) Figure 2, the largest potential value is for the anodized sample
in 50 mA/cm2. This variation in ∂V/∂t, from region 1 to region
Sample ∂V/∂t (V/s) Vb (V)
2, has been already observed in other metals when anodized,
Nb 1 (10 mA/cm2) 2.22 275
characteristic of the dielectric breakdown beginning [1,9].
Nb 2 (20 mA/cm2) 3.45 275
Nb 3 (50 mA/cm2) 9.54 300
Region 2 is characterized by presenting a potential almost
constant [9].
∂V/∂t values measured for anodized Nb in the different
current densities are shown on Table 2.
Table 3. Oxide growth rate in niobium samples at 10 mA/cm2 and 100 V According with Table 2, despite the anodizing have been
Sample ∂V/∂t (V/s) made at 300 V, only the sample at 50 mA/cm2 demonstrated
Nb 4 1.84
breakdown potential of 300 V, being accompanied by oscillations
Nb 5 3.45 in the current density, characteristics of breakdown. The other
Nb 6 2.10 samples showed breakdown potential around 275 V, not
Nb7 1.27 being possible to identify oscillations in the current density.
This indicates that increasing of current density promotes
formation of an oxide with a higher growing rate and,
consequently, higher dielectric breakdown potential.
Table 4. Production and dissolution rate, ∂V/∂t, time to reach 100 V Niobium films, grown with higher ∂V/∂t, presented
and thickness, values obtained from cross section of the samples larger probability of defects formation than the formed with
lower ∂V/∂t. This could explain the higher Vb obtained in
Thickness at

rate (nm/s)

rate (nm/s)
5 min (nm)

production

this sample of 50 mA/cm2 and the observed oscillations [10].


dissolution
reach 100
Time to
Sample

Oxide

Oxide
V (s)

Nb4 57 560 10.98 -


Nb5 22 301 13.68 -
Nb6 50 301 6.02 7.66
Nb7 85 481 5.65 8.03

Table 5. Densities for oxides formed at 10 mA/cm2, acetic acid 1 mol/L,


with and without HF
Samples

Time to reach
Thickness (cm) Vb and stabilize Density (g/cm3)
potential (s)
Nb4 0.560x10−4 57 2.8066
Nb5 0.301x10−4 22 2.0153
Nb6 0.301x10−4 50 4.5803
Figure 1. Illustrative scheme of different regions present in potential
Nb7 0.481x10−4 85 4.8726 transients versus time graphs of Figure 1 during niobium anodizing.

Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018 37
Marcolin et al.

Towards the context of this study, it was decided the increase of HF concentration decreases the growth rate
to anodize niobium at 10mA/cm2, to ensure the oxide of oxide. It was observed a similar behavior with addition of
formation with lower quantity of defects and at a potential HF in oxalic acid in niobium anodizing, wherein HF induces
lesser than 300 V, avoiding occurrence of sparking. Is was the dissolution of the oxide. The dissolution process occurs
also noticed the formation of porous oxides by adding HF concurrently with the barrier oxide formation, being directly
to the electrolyte. proportional to the increase of HF concentration. Figure 4
Figure 3 illustrates potential and current exemplifies the occurrence of this factor.
transients of niobium anodized with acetic acid 1 mol/L, In Figure 4, the steps of formation refer to the
at 10 mA/cm2 and 100 V, without adding HF and with
niobium oxide formation without addition of HF, where
additions of 0.01, 0.1 and 1 mol/L of HF. All the samples
it is noticed the continuous growth of the niobium oxide.
demonstrated similar behaviors, beginning with a linear
The sequence illustrated in the entire figure refers to the
increasing of potential, wherein current density remains
constant at 10mA/cm2. After reaching potential of 100 V, oxide film formation and dissolution, which elucidates the
the samples preserve the potential constant and there is an observed low anodizing rate [4].
abrupt decrease of the current density, indicating the end Figure 5a-c show the micrographs in top view
of film formation. In this case, it cannot be said that film and cross section of the anodized samples in acetic acid
formation is completely barrier, once the addition of HF 1 mol/L, at 300 V and 10, 20 and 50 mA/cm2. It is seen,
induces the formation of a porous film. in these samples, an irregular surface with imperfections,
Table 3 shows the growth rate of oxides formed which become more evident with increasing of current
with and without addition of HF. According with Table 3, density. The sample obtained at 10 mA/cm2 demonstrates,

Figure 2. Potential and current transients in function of time, measured during niobium anodizing in 10, 20 and 50 mA/cm2, at 300 V in acetic acid 1 mol/L.

Figure 3. Potential and current transients versus time for anodized niobium at 100 V in acetic acid 1 mol/L with and without adding of HF.

38 Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018
Obtaining Niobium oxides in acetic acid with addition of HF

Figure 4. Dissolution model of niobium oxide formed in acetic acid with addition of HF.

Figure 5. (a) Micrograph of Nb2 sample: (a1) top view and (a2) cross section; (b) Micrograph of Nb2 sample: (b1) top view and (b2) cross
section; (c) Micrograph of Nb3 sample: (c1) top view and (c2) cross section.

Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018 39
Marcolin et al.

besides imperfections, the formation of pores, like pits on The pores are scattered by the sample surface,
the niobium surface. covering it completely, presumably by the increase of current
The occurrence of breakdown can also manifest in density values [11].
form of random pits on the surface of anodized sample. Figure 6 a-d, show the SEM micrographs of anodized
With increasing of current density and, consequently, with samples in acetic acid 1 mol/L, at 100 V and 10 mA/cm2,
the increase of electrons amount for oxide formation, located without HF and with HF in concentrations of 0.01, 0.1 and
points of occurrence of breakdown are noticed clearly. 1 mol/L.

Figure 6. (a) Micrograph of Nb4 sample: (a1) top view and (a2) cross section; (b) Micrograph of Nb5 sample, obtained in acetic acid
1 mol/L + HF 0.01 mol/L at 100 V for 5 minutes: (b1) top view and (b2) cross section; (c) Micrograph of Nb6 sample: (c1) top view and
(c2) cross section; (d) Micrograph of Nb7 sample: (d1) top view and (d2) cross section.

40 Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018
Obtaining Niobium oxides in acetic acid with addition of HF

The sample in presence of acetic acid showed pores the oxide dissolution rate, favoring the formation of porous
on substrate surface, however, the oxides formation occurs oxide. According to Figure 6a2, b2, c2 and d2, oxides cross
generally in environments containing strong electrolytes sections present homogeneous aspect.
able to attack chemically the substrate. Specifically, in case To calculate oxide density, only the samples
of niobium, porous oxide formation occurs in electrolytes that were not submitted to dieletric breakdown were
that contain HF or at pH=14 [12]. The formation in considered. It was utilized the oxides thickness described
presence of an organic electrolyte, acetic acid in this case,
on Table 5 to calculate the oxide density. The oxides
occurs probably because there is a small amount of oxygen
densities can have varied from 2 g/cm3 to 4 g/cm3, with
compared to aqueous solutions, thus favoring the oxide
chemical dissolution in function of oxide formation [13]. variation in the thickness of formed oxide, as reported in
In acetic acid, the maximum thickness of an intact another study in which they performed the anodization
anodic film is less than 25 nm, and thicker films, obtained of niobium to assess their anodic behavior, and found
at higher potentials, contain imperfections in their pit density values close to 4 g/cm3 [12,18]. It is observed in
appearance morphology [14]. It has been reported that Table 5 that the oxide formed without presence of HF
anodizing in organic electrolyte produces very smooth curves presents value inferior to 4 g/cm3. According to Figure 6
of anodizing, without any fluctuations in the current, which (a1) this oxide is of the porous type, which would explain
was attributed to the low concentration and diffusivity of the low density. However, for the oxides obtained
ions in the organic electrolyte [15]. An organic electrolyte with addition of HF, the oxide density increased with
has a small amount of oxygen compared to an aqueous the decrease of the HF concentration. In addition, the
solution and therefore the chemical dissolution of the oxide
increase in HF concentration formed oxides with lower
in an organic electrolyte depends on the water content [16].
∂V/∂t, consequently with fewer defects [10]. Since HF
Consequently, for the formation of porous oxides in the
causes the oxide to dissolve during its formation, this
form of nanotubes, a thicker layer of nanotubes will form
over a long time in an organic electrolyte, and the viscosity would cause oxide formation to occur in a slower way,
of the electrolyte, whether under agitation or not and therefore with less defects and higher density, which
the content of H2O, may influence the Formation of the agrees with the model suggested in Figure 4.
nanotube [17].
With addition of 0.01 mol/L of HF, there is pores
formation with less intensity. Therefore, the addition of 4 CONCLUSIONS
HF induces the pores formation and acetic acid inhibits the
dissolution process. The gradual increase of pores on the The formation of niobium oxides in acetic acid only
samples is proportional to the increase of HF concentration, occurs efficiently with the application of lower current density
however the oxides formed in organic electrolytes were (10 mA/cm2). During the anodizing process, it was observed
irregular. that the lower breakdown potential and lower ∂V / ∂t resulted
Through time and thickness values showed on in the formation of oxide with less defects.
Table 5, the oxide production rate can be calculated by In addition, the porous niobium oxide formation
the Equation 2. was obtained by anodization using the 1 mol/L oxalic acid
To calculate the oxide formation rate, only the solution under the conditions of 100 V and 10 mA/cm2
thicknesses of oxides formed until 300 s were used, and as the electrolyte. This result indicates that it is possible
the growth of the oxide layer after the time de potential to obtain porous niobium foams in free HF electrolytes.
reached 100 V was not considered significant.
However, the addition of HF to the electrolyte favors the
According to Table 4, it is observed that occurs
formation of porous oxide, where the dissolution process
an increase of the oxide production rate with addition
of HF 0.01 mol/L to the electrolyte of anodizing – acetic is more intense for higher concentration of HF (1 mol/L).
acid 1 mol/L. This corresponds to the obtained results for Despite this, the oxide obtained in 1 mol/L HF presented
the anodized sample in acetic acid 1 mol/L, in which occurs smaller ∂V/∂t, leading to the slow formation of the oxide
pores formation and consequent oxide dissolution. and consequently resulting in an oxide with fewer defects.
Comparing only the anodized samples containing This would explain the higher density observed for the oxide
HF, it is noticed that the increase of HF concentration raises formed in the higher concentration of HF.

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Received: 14 Dec. 2016


Accepted: 25 Apr. 2017

42 Tecnol. Metal. Mater. Miner., São Paulo, v. 15, n. 1, p. 35-42, jan./mar. 2018

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