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EE415/515 Fundamentals
of Semiconductor Devices
Fall 2012
Lecture 3:
Density of States, Fermi Level
(Chapter 3.4-3.5/4.1)
Density of States
• Need to know the density of electrons, n, and
holes, p, per unit volume
• To do this, we need to find the density of
permitted energy states and then the
probability (given by the Fermi function) that
these states are occupied by an electron
• See Neamen Sections 3.4 and 3.5 for
derivations, and compare these with
alternative approaches given below
J.E. Morris ECE415/515 Fall 2012 2
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Density of States
Density of States
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Density of States
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Density of states
g ( p )dp 2
4 p dp V
2
2(4 p 2 dp ) where the 2 is due to spin degeneracy
3
h V h3
To convert to energy density : - E E C p 2 2mn* in the conduction band, where E EC
p 2 2mn* ( E EC )
2 p.dp 2mn* .dE
1 1
p 2 dp (2mn* ) 2 ( E EC ) 2 mn* dE
1 1
2mn*
So writing g ( p )dp / V g C ( E )dE 3
4 (2mn* ) 2 ( E EC ) 2 dE
h
4 3 1
2m* 3 1
3 (2mn* ) 2 ( E EC ) 2 dE 4 ( 2 n ) 2 ( E EC ) 2 dE
h h
is electron density of states/unit energy/unit vol in the conduction band
and electron density/unit energy/unit vol in the conduction band is
n( E )dE f FD ( E ) g C ( E )dE
3
1
g (k )dk 2 4k 2 dk / in 3D
8 a
2
1
2 2k dk / in 2D
4 a
1
2 dk / in 1D
2 a
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Fermi function
So the collision probability is C. p ( E1 ). p( E2 ).[1 p( E3 )].[1 p( E4 )]
and applying Equilibrium and Energy Conservation again:
C. p ( E1 ). p ( E 2 ).[1 p ( E1 )].[1 p ( E 2 )] C. p ( E1 ). p ( E 2 ).[1 p ( E1 )].[1 p ( E 2 )]
1 p ( E1 ) p ( E1 ) 1 p( E 2 ) p( E 2 )
i.e. . .
p ( E1 ) 1 p ( E1 ) p( E 2 ) 1 p( E 2 )
1 p( Ei ) p( Ei )
and . (constant) an exponential solution again,
p( Ei ) 1 p( Ei )
1 p( Ei )
i.e. A. exp E (where A 2 exp 2 E )
p( Ei )
1 1
i.e. p ( E ) exp E for large,
1 A exp E A
1
,
kT
1 E 1
and writing exp F , f FD
A kT E EF
1 exp
kT
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MB/FD/(BE) comparisons
Ni N
M
N E
i 1
i i E
i 1
Fermi distributions
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1
T 0 K : E EF 0
1 exp
1
E EF 1
1 exp
1
For all T f (EF )
2
At T = 0 K
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At T > 0 K
Fermi levels
The Fermi distribution gives the probability that an available state will
be occupied.
• Within the band gap there are no available states.
• Even with non-zero f(E) there is no occupancy in the gap. (An
energy state at the Fermi level would have a probability of ½ of
being occupied, if there was one.)
At 0K every available state up to the Fermi level is occupied and every
state above the Fermi level is empty.
Fermi function is “symmetric” about the Fermi level
For holes:
E EF
exp
1 kT 1
1 f (E) 1
E EF E EF E E
1 exp 1 exp 1 exp F
kT kT kT
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Example 3.8:
(fMB-fFD)/FFD=5%
at E-EF=kT ln(1/0.05) ≈ 3kT
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n(E) = gC(E).f(E)
p(E) = gV(E).[1-f(E)]
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kT
3
2m * 2
4 2 n F1 2 F ,
h
1
2 d E EC E EC
where F1 F 0 , , F F
1 exp F
2
kT kT
This is the (tabulated) Fermi Integral
A similar treatment gives a similar result for g V ( E ) and p 0 for holes in the valence band
1
E EC E EF E EF E EC
[writing x , dE kTdx, exp exp C exp , and using x 2 e x dx ]
kT kT kT kT 0 2
3 1 3
2m * kT 2 E EF 2 2mn* kT 2 E EF E EF
4 n2 exp C . 2 2
exp C
N C exp C
h kT 2 h kT kT
3
2mn* kT 2
where N C 2 2
h
NC is the effective density of states as if all electrons at conduction band edge EC. Only
limiting assumption is that EC-EF>>kT; if so, result holds for intrinsic and extrinsic.
(Note: EF→EC for N-type, but approx usually still OK.)
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Electron Concentrations
Simplify: represent states throughout the conduction band by
an effective density of states Nc located at Ec.
n0 = Ncf(Ec)
If Ec – EF > 3kT then
f(Ec) ~ e-(Ec-EF)/kT (Maxwell-Boltzmann)
kT = 0.026 eV at 300K, so usually OK
n0 = Nc e-(Ec-EF)/kT ; Nc = 2[2πmn*kT/h2]3/2
Termed non-degenerate.
If EF within 3kT of either band edge or inside band
degenerate and we need to use the full Fermi function.
Hole Concentrations
Concentration of holes in valence band
p0 = Nv [1 – f(Ev)]
If EF – Ev > 3kT then Fermi function reduces to
Maxwell Boltzmann and
p0 = Nv exp[ -(EF – Ev)/kT ]
Nv = [2π mp*kT/h2]3/2
p0 = ∫gV(E)[1-f(E)]dE
1-f(E)=1-[1+exp((E-EF)/kT)]-1
=[exp (E-EF)/kT)]/[1+exp((E-EF)/kT)]
=1/[1+exp((EF-E)/kT)] ≈ exp-(EF-E)/kT
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Intrinsic Concentrations
EF = EFi for intrinsic material
n0=ni = Ncexp[-(Ec-EFi)/kT] pi = Nvexp[-(EFi-Ev)/kT]
n0 p0 = constant.
Plug in above => n0 p0 = ni2 = [NcNv]exp[-(EC-EV)/kT]
ni = [NcNv]1/2 exp[-Eg/2kT]
= 2[2πkT/h2]3/2(mnmh)3/2 exp[-Eg/2kT]
Remember n0p0 = ni2 and ni = 1.5x1010 cm-3 for Si
You’ll use both often!
Also for Si: 6 different conduction band valleys (2 each x,y,z)
3 1
(mn* ) 2 6m mt 2
*
Note: mn varies in different sources
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Intrinsic concentrations
Temperature
Dependence
ni T3/2 exp[-Eg/2kT]
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Physical constants
(@300 K unless noted)
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Intrinsic EF position
n 0 p 0 ni p i
EC E Fi E Fi EV
N C exp
kT N V exp kT
E Fi EC E V E Fi
n ( N C ) n ( N V )
kT kT
1 1 NV
E Fi ( EC EV ) kT .n
2 2 NC
1 3 m *p
( EC EV ) kT .n *.
2 4 m
n
3 m *p
i.e. E Fi E midgap kT .n *. E midgap if m *p mn*.
4 m
n
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