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References [9] Texas Instruments Inc. ISO 9001 : 2008.

Texas
Instruments Inc., 2017.
[1] T. Bajenescu and M. Bazu. Reliability of
Electronic Components: A Practical Guide to [10] National Instrument. IMAQ Vision for Lab-
Electronic System Manufacturing. Springer- VIEW. National Instrument, October 2017.
Verlag, New York, USA, 1 edition, 1999. DOI
10.1007/978-3-642-58505-0. [11] National Instruments. Inspecting Rubber Parts
Using NI Machine Vision Systems. National In-
[2] SAMUEL L. CARRELL THOMAS D. struments, November 2017.
C. GORDON, JIM D. ADAMS and MICHAEL
[12] S. B. Kotsiantis. Supervised machine learning:
H. Elements of semiconductor-device relia-
A review of classification techniques. Infor-
bility. In Conference Proceedings from the
matica, 31:249–268, July 2007.
34th International Symposium for Testing and
Failure Analysis, volume 62, pages 149–168, [13] M. Baygin nnd M. Karakose, A. Sarimaden,
January 1974. and E. Akin. Machine vision based defect
detection approach using image processing.
[3] Altera Corporation. ISO 9001 : 2008. Altera In 2017 International Artificial Intelligence
Corporation, 2017. and Data Processing Symposium (IDAP), vol-
ume 62, pages 1–5, Sept 2017.
[4] Fuji elecric Co. ISO 9001 : 2008. Fuji elecric
Co., 2017. [14] T. Pendleton, L. Hunter, and S.H. Lau. Non-
invasive failure analysis of passive electronic
[5] Mitsubishi Electric. Semiconductor device re- devices in wireless modules using x-ray micro-
liability. Mitsubishi Electric Co., 2017. tomography (microct). In Conference Proceed-
ings from the 34th International Symposium for
[6] YXLON International GmbH. Solder joint in-
Testing and Failure Analysis, volume 7, pages
spection and analysis. YXLON International
92–98, January 2008.
GmbH, November 2017.
[15] R. Pinizzotto, F. Clark, and M. Jarvis. Qual-
[7] R. Hanke, T. Fuchs, and N. Uhlmann. X-ray ity and reliability assurance of semiconduc-
based methods for non-destructive testing and tor devices through transmission electron mi-
material characterization. Nuclear Instruments croscopy. MRS Proceedings, 62(3), 1985.
and Methods in Physics Research Section A,
591(1):14–18, June 2008. [16] R. Pinizzotto, F. Clark, and M. Jarvis. Gpflow:
A gaussian process library using tensor-
[8] H. Huang, C. Hu, T. Wang, and et. al. Surface flow. Journal of Machine Learning Research,
defects detection for mobilephone panel work- 18(3):1–6, april 2017.
pieces based on machine vision and machine
learning. In International Conference on In- [17] M. Raut and S. Barve. A semi-automated re-
formation and Automation (ICIA), volume 62, view classification system based on supervised
pages 370–375, July 2017. machine learning. In 2017 1st International

1
Conference on Intelligent Systems and Infor-
mation Management (ICISIM), Oct 2017.

[18] S. Saxena and M. Kumar. Advances in Micro-


electronics and Photonics, chapter 1, pages 1–
23. Nova Science Publishers Inc, 2012.

[19] Fujitsu semiconductor limited. Quality and Re-


liability Assurance. Fujitsu semiconductor lim-
ited, 2017.

[20] Sony. Semiconductor Quality and Reliability


Handbook. Sony, 2017.

[21] STMicroelectronics. N-channel 950 V, 0.275


typ., 17.5 A MDmeshTM K5 Power MOSFETs
in D2 PAK, TO-220FP, TO-220 and TO-247.
STMicroelectronics, October 2017.

[22] STMicroelectronics. STB18NM60ND,


STF18NM60ND, STP18NM60ND,
STW18NM60ND. STMicroelectronics,
2017.

[23] GE Inspection Technologies. Solder joint in-


spection and analysis. GE Inspection Tech-
nologies, LP, November 2017.

[24] DirectFET Technology. Recommendations for


Printed Circuit Board Assembly of Infineon
SON Packages. Infineon Technologies AG, Oc-
tober 2017.

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