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vacuum
(Establishing a primary standard
for the range down to 10-10 Pa)
Ladislav Peksa
Common Metrological Vacuum Laboratory
Faculty Math&Phys Charles University in Prague
and Czech Metrological Institute
Czech Republic
ladislav.peksa@mff.cuni.cz
ORIFICE FLOW STANDARD
VACUUM
Low vacuum
E 5 > p ≥ E 2 Pa
(rough vacuum)
Medium vacuum
E 2 > p ≥ E -1 Pa
(fine vacuum)
To meet this condition is the more difficult the lower pressure are of interest because less
and less amount of gas is used. Idea enabling to design primary standards for
pressures from the ranges of high and ultrahigh vacuum is to exchange the working
gas during the process of calibration, to admit new pure working gas and
simultaneously to pump it out together with the undesired gas. This way the ratio of
the desired and undesired gas amounts is much better, influence of the undesired gas
can be neglected.
Gas must not be pumped out from the calibration chamber during the
calibration! (?)
Gas pressure as a physical quantity which can be expressed in one
instant as one reading (the same for any point of the vessel) is defined
only for gas in equilibrium state with Maxwellian velocity distribution.
1. With zero pumping speed and thus with entirely undisturbed in the
calibration chamber;
2. With so small pumping speed that the disturbance of Maxwellian
distribution is negligible;
3. With so high pumping speed in the calibration chamber that the
Maxwellian distribution there is significantly disturbed.
Static expansion system
Q
p
S EFF
(
Molecular beam/enclose gauge principle is
comparable with the OFS.
Grosse G Messer G. Calibration of vacuum gauges at
pressures below 10-9 mbar with a molecular beam mehtod.
Vakumm Technik 1981; 30: 226-331
)
Pressure ratio technique
(pressure division, dynamic reduction)
Question:
Can be a primary UHV standard down to 10-10 Pa based on the orifice
flow principle (at present state of vacuum science and technology)?
Q q SURFACE
q is the outgassing rate. SEFF is surely higher than single conductance C of the
opening in the calibration chamber, most advantageous shape with smallest possible
surface is a sphere, thus
11 q SURFACE
1 10 Pa p
438 SURFACE / 1000
Material with achievable outgassing rate in the order of magnitude
10-12 Pa·m/s - 10-13 Pa·m/s has to be used.
BRIEF EXCURSION INTO MATERIALS FOR VACUUM CHAMBER DESIGN
REFRIGERATOR-COOLED
BOILING POOL-CRYOPUMP
(BATH)
BAKE-ABLE REFRIGERATOR CRYOPUMP
LEYBOLD 2007
Special solution suitable to reach XHV:
cryopump with additional LN2-cooling
during baking allows baking of chamber
and pump housing to >180 C
during bakeout
Pult1 x 10-9... 1 x 10-10 mbar
after bakeout
Pult< 1 x 10-12 mbar
Cryopump is used during bakeout
much more effective to pump water
vapour
4E-8
3E-8
2E-8
1E-8