Patinal EMD Catalogue Tcm2080 128020

Evaporation Materials
Product Catalog | 2015
EMD Performance Materials | One International Plaza, Suite 300, Philadelphia, PA 19113 · Tel: 484-652-5659,
Fax: 484-652-5668 · PhotonicsUS@emdgroup.com · www.patinal.com
n n or on er s e o eco e ore co e e
re r n or on er s ro e
re e so ons for o s co n c en es
offer n rocess s n e
s s n for o e c s
o re ens e ro c or fo o
The Patinal product range comprises more than 40 evaporation
materials including fluorides, o ides, sulfides, and metals as well as
special mi tures and substances available as granules, tablets, or
discs.
The proprietary Substances H, M, L and WR Patinal offer unique
properties beyond the performance of standard materials - they will
allow you to achieve higher yields and better performance.
Patinal evaporation materials - the answer for your design
requirements.
n c on s or
At the Gernsheim site in Germany we develop and produce
innovative materials for physical vapor deposition. We use this
e perience to help you address new challenges: Whenever you want
to test one of our materials in a new design, please feel free to
contact your local sales people for support. They will forward your
inquiry to Gernsheim and you will receive personal and individual
support - accompanying you from R D to production.
Patinal evaporation materials - more than ust materials.
o r r ner or e
Patinal evaporation materials are available world wide from our
subsidiaries with ust a few clicks at www.patinal.com you can
identify your local contact.
In ma or markets like SA, Germany, China, Japan, Taiwan, Korea
dedicated specialists will be at your disposition to take care of your
needs.
Wherever you are, Patinal evaporation materials are always close.
ce en
The brand name Patinal stands for e cellence from production to
quality control: More than 30 years of production e perience in
evaporation materials combined with nearly two centuries of
analytical e pertise provide the superior quality and reliability of
our products. In addition to the analysis of impurities we also carry
out application tests to make sure that every batch of our materials
is behaving reproducibly in your evaporation processes.
EMD delivers the quality, you can rely on.
ec er s for e rocesses
Patinal evaporation materials are designed to improve the quality
and yield of your processes: High purity will help to ma imize
transmission. Optimized melting properties reduce defects caused by
spattering, special stoichiometries (like subo ides) reduce premelting
times. In the same time, unusual refractive indices allow completely
new designs and new compositions provide unprecedented coating
stability.
Patinal innovations tailored for your success.
Ro co nce
The RoHS compliance information is part of our Certificate of
Analysis (CoA) and sent to you with every batch of Patinal
material you purchase. This facilitates the assessment of the
conformity of your products and documentation towards your
customers.
n
or on
er s
es ne for erfor nce o cs
ese e es e n o er e
of s n for o
c er o cs
Thanks to its wide optical transmission range the high inde
material Substance H4 H4 HD Patinal is very successful in the
digital camera applications. In addition, it delivers highly
reproducible optical properties and allows very high process yields.
TiO S Patinal and Titanium O ide Patinal are high inde
material with low outgassing. This allows fast processing with stable
layer properties. MgF2 LO Patinal is a low inde material with very
low spitting due to its very low o ygen content. Substance L5 L5 HD
Patinal replaces SiO2 on plastic substrates where improved
damp heat durability is desired.
c ck s ro ec on co onen s
Optical pickups and digital pro ector optics contain comple optical
interference filters for antireflective (AR), highly reflective (HR) and
beam splitter combiner (BS) functions. Substance L5 L5 HD Patinal
is an e cellent low inde material with very good durability and
adhesion on plastics. Substance H4 H4 HD Patinal is a highly
transparent high inde material for 405 nm Blu-Ray applications.
Substances M2 M3 Patinal are medium inde materials with indices
of 1.7 and 1.8, which enable the three material design of wide band
(non) polarizing beam splitters combiner components.
rec s on o cs / cs
Our Substance WR Patinal offers very durable hydro and
oleophobic coatings for easy fingerprint removal on precision
optics. Substances WR and WR Patinal provide easy to clean,
water repellent and oil repellent properties for eyewear. The low
index material Substance L /L HD Patinal offers better damp/heat
durability than SiO multilayers on plastics.
Substance H Patinal shows improved melting behavior for easier
process control. Indium Tin Oxide ITO Patinal is used for
antistatic coatings. Brown A Patinal and Black A Patinal are color
materials suitable for manufacturing brown colored sun glasses.
Laser / UV optics
LaF3 Patinal® is a high index material suitable for high end
applications like wafer stepper optics. It enables high laser induced
damage threshold (LIDT) values for DUV and VUV with excimer
lasers. MgF2 LO Patinal® is a low index material with low spitting
due to its very low oxygen content. Like LaF3 Patinal® it has a high
LIDT. AlF3 Patinal® delivers a higher refractive index contrast to LaF3
than MgF2, which can be favorable for wavelengths below 220 nm
(DUV applications). HfO2 grey Patinal® is a highly transparent high
index material which allows the manufacturing of very robust
UV/VIS/NIR coatings. SiO2 Patinal® is an extremely pure, top quality
low index material for sensitive applications and processes.
IR optics
For IR optics EMD offers a wide range of suitable materials with
high transparency in the IR range:
Low index Patinal® materials include Chiolite, Cryolite, AlF3, MgF2,
YbF3, and YF3. Medium index Patinal® materials comprise CeF3, GdF3,
LaF3, NdF3, Substance M1/M2/M3 Patinal®, PbF2, SiO, and Y2O3.
High index Patinal® materials contain HfO2 , ZrO2 , Substance
H1/H2/H4 Patinal®, Nb2 O5 , Ta2 O5 , TiO2 , ZnS, Cr2 O3 .
Microscopy
For microscopy high quality, non fluorescent materials with low
impurity levels are required:
HfO2 grey Patinal® is a highly transparent high index material which
provides coatings of high mechanical stability.
LaF3 Patinal® and MgF2 LO Patinal® are a non fluorescent material
combination suitable for VUV.
SiO2 Patinal® is an extremely pure, top quality low index material.
Beam splitters
For the design and manufacturing of wide band non polarizing beam
splitters special medium index materials are needed: They have to
show refractive indices of 1.7-1.8 combined with very high
transparency .
EMD’s proprietary Substances M2 (ri 1.7) and M3 (ri 1.8) Patinal®
combine the special refractive indices with a transmission range
from 220 to 8,000 nm and high durability, making these new
designs possible.
Imaging sensors
The manufacturing of coatings on high resolution CMOS and CCD
imaging sensors requires very low defect coating procedures.
For these requirements the following materials show individual
advantages: MgF2 LO Patinal® is a low index material with low
spitting due to its low oxygen content. Substance H4 / H4 HD
Patinal® is a highly transparent high index material for AR coatings
with excellent refractive index reproducibility and process stability.
Both Substances WR Patinal® and Indium Tin Oxide (ITO) Patinal®
can be used for dust protection by low sticking coefficient and
antistatic properties respectively.
Fax: 484-652-5668 · PhotonicsUS@emdgroup.com · www.patinal.com 5
ss r nce
Research, production, and sales of our Patinal evaporation materials take
place under a certified DIN EN ISO 9001 : 2000 quality management system
and DIN EN ISO 14001 environmental management system. The quality of the
materials is assured by our manufacturing processes and in-process controls,
and quality tests. Each batch is released only after passing chemical analysis
and application tests designed to confirm the suitability of the material for the
evaporation process.
The application test comprises an assessment of the evaporation behavior of

the material and - depending on the material - further relevant physical
analysis such as measurement of the transmittance properties of thin layers
made from the material, determination of residual gas concentration or
determination of evaporation residue.
n c e o s
Physical Properties Tablet dimension
Particle size
Density
Hardness
Chemical analysis Wet chemical methods

Instrumental methods
Application tests Evaporation test

Evaporation residue
Transmittance and reflectance spectra
Refractive inde
Absorption
Fluorescence
Contact Angle (static, dynamic)
Abrasion resistance
For quality control we use a wide variety of methods such as

AAS, ICP-MS, ICP-OES, RF, TGA, -ray diffraction, MS, REM.
Ro co nce
The RoHS parameters are determined individually for every single
batch and the RoHS limits are part of our specifications. Starting
from the batch number of the material you used in your production,
you can easily trace the individual values in the certificate of
analysis, which combines the documentation of both chemical purity
and RoHS compliance. For your documentation, the Certificates of
Analysis are available on paper as well as pdf-files. This facilitates
the assessment of the conformity of your products and
documentation towards your customers. Especially in case of audits
carried out by your customers, our documentation will be very
helpful for you to prove RoHS compliance for every batch you used.
n ons
The following tables contain information on our evaporation materials
according to:
er s n e c or er
In this table you find all Patinal evaporation materials with their basic optical
parameters refractive inde and transmission range.
The values given for refractive inde , transmission range and evaporation
temperature are based on information from the literature or from our own
measurements on thin layers. Refractive indices obtained from thin films are
highly dependent on the evaporation conditions and should thus be regarded
as guideline values only. Generally the values given were obtained from thin
layers deposited onto hot substrates. Depending on the thickness of the layer
and the application criteria, the usage of material in spectral regions outside of
those indicated is feasible in individual cases (e.g. for fluorides in the V V).
er s refr c e n e
Same information as in table before, but arranged in order of increasing
refractive inde .
or on con ons
Contains application parameters like evaporation temperature and evaporation
source recommended for the various materials.
The abbreviations in the evaporation source column mean:
Al2O3 Aluminium o ide crucible
Mo Molybdenum boat
Pt Platinum boat
Ta Tantalum boat
W Tungsten boat or filament
e s n ck es
In this table the geometric forms available are listed for each substance,
together with package sizes and catalog numbers. In the description of tablets
or discs, the first parameter is always the diameter, and the second the
thickness. The designation “tablet” indicates that top and bottom are slightly
conve “disc” indicates a plane surface. Due to the manufacturing process
used, both of these forms can vary slightly in their dimensions. The specified
dimensions are average values.
er s refr c e n e
Refr c e n e er r ns ss on R n e
1 n o e 1 n
1 n r o e 1 n
1 n n f or e 1 1 n
1 n nes f or e 1 n
1 n con o e n
1 n s nce n
1 n s nce n
o 1 n s nce R1 o n
o 1 n s nce R o n
1 n er f or e 1 n
1 n r f or e 1 n
1 n o n f or e 1 1 n
1 n n n f or e 1 1 n
1 n eo f or e 1 1 n
1 n n o e n
1 n er f or e n
1 n s nce 1 9 n
1 n s nce 1 1 n
1 n e f or e 1 n
1 1 n con ono e n
1 n s nce 1 n
1 n r o e n
19 n fn o e n
n n no e 1 n
n rcon o e n
1 n s nce 1 n
1 n s nce n
1 n s nce n
1 n s nce n
1 n n o e n
n o o e n
n n o es 1 n
n nc s f e 1 n
1 n ro o e 1 1 n
er s n e c or er
er ens Refr c e n e r ns ss on R n e
n f or e /c 1 n 1 1 n
n o e 9 /c 1 n n
er f or e 1 /c 1 n n
o e /c 1 n 1 n
ro o e 1 /c 1 n 1 1 n
r o e 9 /c 1 n 1 n
o n f or e /c 1 n 1 1 n
fn o e 9 /c 19 n n
n no e /c n 1 n
n n f or e /c 1 n 1 1 n
e f or e /c 1 n 1 n
nes f or e 1 /c 1 n 1 n
o o e /c n n
eo f or e /c 1 n 1 1 n
con ono e 1 /c 1 1 n n
con o e /c 1 n n
s nce 1 1 /c 1 n n
s nce /c 1 n n
s nce 9 /c 1 n n
s nce /c 1 n n
s nce 1 /c 1 n 9 n
s nce /c 1 n 1 1 n
s nce /c 1 n 1 n
s nce R1 1 /c o 1 n o n
s nce R 1 /c o 1 n o n
n o e /c 1 n n
n o es /c n 1 n
r f or e 1 /c 1 n 1 n
r o e /c 1 n n
er f or e 1 /c 1 n 1 n
nc s f e 9 /c n 1 n
rcon o e 9 /c n n
or on con ons
s nce or or on or on
e er re so rce
n f or e 1 e e o
n o e e e
B ck 1 1 o
Bro n 1 1 o
er f or e e 1 1 e e
o e 1 1 o
ro r 1 1 e e
ro o e r 19
r o e 1 o
o n f or e 1 1 e e o
fn o e f e e
fn o e re 1 f e e
n no e 1 1 e e
n n f or e 1 1 e e o
e f or e 1
nes f or e 1 1 e e o
eo f or e 1 1 o
o o e 1 19 e e
con o e 1 e e
con ono e 1 1 e e o
er 1 1 e e o
s nce 1 e e
s nce e e
s nce e e o ner
s nce o e e
s nce 1 1 e e
s nce e e
s nce o 1 e e
s nce R1 e e n rec o
s nce R e e o
n o e 19 e e
n o e 1 e e
n o e 1 e e
n o e 1 1 e e
n o e 1 1 e e
1 s er s c c c ne n s o s fferen co or n es n r er
ck n ens
r s ne ro c
1 Fax: 484-652-5668 · PhotonicsUS@emdgroup.com · www.patinal.com
or on con ons
s nce or or on or on
e er re so rce
n o e e e
n o e ck 1 e e
er f or e 1 1 e e o
r f or e o 11 e e o
r o e e e
nc s f e n 1 11 e e o
nc s f e s e n 1 11 e e o
rcon o e r o e e
rcon o e re 1 r o e e
e s n ck es
s nce or e ck e e o
n f or e r n es 1k 1 1
o 1
n o e r n es 1k 1 1
o 1
r n es 1k 1 1
o 1
r n es 1k 1 11 1
o
es o 1k 1 1
9
neron roc r on o on re es
c on re es
B ck o er 1k 1 1 1
ess n
e s n ck es
s nce or e ck e e o
Bro n o er 1k 1 1
ess n
er f or e e r n es 1k 9 1
o 1
o e 1 r n es 1k 1
o 1
ro r o er 1k 1 99 1
ess n
r n es 1k 11 1
o 1
scs o 1 1 scs
1 ck 9
ro o e r o er 1k 1
ess n
r o e r n es 1 R
o 1
o n f or e r n es 1 1 R
o 1
fn o e f scs o 1k 11 9 1
1
fn o e f r n es 1k 11 1
re 1 o 1
es o 1k 1 1
9
n no e /1 ) es o 1k 11 1
for er s nce
e s n ck es
s nce or e ck e e o
n n f or e r n es 1k 11 9 1
o 1
e f or e r n es 1k 1
o 1
nes f or e r n es 1k 1 1
ess n1
r n es 1k 1 9 1
o 1
r n es 1k 1 1
o 1
r n es 1k 1 1
o 1
r n es 1k 1 1
o
nes f or e r n es 1k 11 11
o o e o 1
eo f or e r n es 1 9 R
o 1
o o e r n es 1k 1 1 91
o 1
con o e r n es 1k 1 1
o 1
r n es 1k 1 1
o 1
r n es 1k 11 1
o
e s n ck es
s nce or e ck e e o
con ono e r n es 1k 1 1 1
o
r n es 1k 11 1
o
eces 1k 1 1
o 1
er r n es 1 1 R
o 1
s nce 1 r n es 1k 1 1
o 1 1
es no con e 1k 1 1
o 1 9
s nce r n es 1k 1 1 1
o 1
s nce r n es 1k 1
o 1
s nce r n es 1k 1 1
o
ck n ens
Items and Packages
Substance Formula Shape Package Item No.
Substance L5 Granules, 1 kg 00832261

about 0.5-4 mm
Substance L5 HD (2) Granules, 1 kg on request

about 1-2 mm
Substance L5 HD (2) Discs about 8g, 1 kg on request

11.5 x 19.5 mm
Substance M1 Granules, 1 kg 00833361

about 1-4 mm

about 1-4 mm

about 1-4 mm
Tantalum(V) oxide Ta2O5 Granules, 1 kg 00850061

about 1-4 mm 1 kg 00850061
Tablets, about 0.5 g, 1 kg 00817261

6.3 x 3 mm
Titanium(II) oxide TiO Granules, 1 kg 00830361

about 0.8-2 mm
Titanium(III) oxide Ti2O3 Tablets, about 1g, 1 kg 01020361

about 10.4 x 5.1 mm
Titanium oxide X Ti3O5 Granules, 1 kg 1.00097.1053

about 0.8- 4 mm
Titanium oxide S TiO1,7 Granules, 1 kg 01682861

about 1-4 mm
Pellets, 1 kg 01670061
about 10 x 5.5 mm
Titanium(IV) oxide, TiO2 Tablets, about 2 g, 1 kg 01177161

black (1) 13 x 5.5 mm
(2) HD (high packing density)

(3) Crystalline product
e s n ck es
s nce or e ck e e o
er f or e r n es 1k 1 1 1
ess n1
r f or e r n es 1k 1
ess n1
r o e r n es 1k 1 1
o 1
nc s f e n es o 1 1k 1
9
nc s f e n r n es 1k 9 1
s e o 1
rcon o e r scs o 1k 111 1

1
rcon o e r es o 1 1k 9 1
re 1 1
es o 1k 9 1
1 9
scs o 1k 9 1
1
1 s er s c c c ne n s o s rk co or co re o e r c c ne er
Substances WR Patinal for hydrophobic and oleophobic layers
s nce e ck e e o
s nce R1 es 1 cs 1 19 9
es 11 1 cs on re es
e s 1 11 1 1 cs 9
ro n o eo o c s nces R n re e for r e sc e ro c on
n e r n e of scre e rocess c e o n concen r ons e se con c s
s nce R e s 11 on re es
s nce R scs 1 on re es
References / o rn s
Bezuidenhout DF, Clarke KD, Pretorius R: “The optical properties of YF3 films”
Thin solid films 155, 17 (1987)
Chopra KL, Ma or S, Pandya DK: “Transparent conductors a status review”

Thin solid films 102, 1 (1983)
Chow R, Falabella S, Loomis GE, Rainer F, Stolz CJ, Kozlowski MR: “Reactive
evaporation of low-defect density hafnia” Applied Optics 21, 5567 (1993)
Dobrowolski JA, Ho FC, Menagh D, Simpson R, Waldorf AJ: “Investigation of

the evaporation process conditions on the optical constants of zirconia films”
Applied Optics 28, 3997 (1989)
Friz M, Amadori E, K nig F, McNally SM: “Influence of impurities on the

optical properties of hafnium o ide and tantalum o ide thin films” Proc. SVC
32nd Ann. Techn. Meeting, 264 (1989)
Friz M, K nig F, Feiman SD: “New materials for production of optical coatings”
Proc. SVC 35th Ann. Techn. Conf. 143 (1992)
Hass G: “Reflectance and preparation of frontsurface mirrors for use at various

angles of incidence from the ultraviolet to the far infrared” J. Opt. Soc. Am.
72, 27 (1982)
Heitmann W: “Reactive evaporation in ionized gases” Applied Optics 10, 2414

(1971)
Heitmann W: “Properties of evaporated SiO2, SiO Ny and TiO2 films” Applied

Optics 10, 2685 (1971)
Herrmann WC: “E-beam deposition characteristics of reactively evaporated

Ta2O5 for optical interference coatings” J. Vac. Sci. Technol. 18, 1303 (1981)
Jacobson MR, Feiman SD, Tian i , McLeod HA: “Optical properties of undoped
CaF2-doped yttrium fluoride and ytterbium fluoride coatings frabricated by
th
conventional ion-assisted deposition” Proc. SVC 37 Ann. Techn. Conf. 248
(1994)
Kaiser N, hlig H, Schallenberg B, Anton B, Kaiser , Mann K, Eva E: “High

damage threshold Al2O3 SiO2 dielectric coatings for e cimer lasers” Thin Solid
Films 260, 86 (1995)
Kolbe J, Kessler H, Hofmann T, Meyer F, Schink H, Ristau D: “Optical

properties and damage thresholds of dielectric V V V-coatings deposited by
conventional evaporation, IAD and IBS” Proc SPIE 1624 (1991) 221
K nig F, Friz M: “Development of medium and high refractive inde coating

materials for the visible and V spectral range” Proc. SVC 37th Ann. Techn.
Conf. 118 (1994)
McNally JJ et. al: “Ion-assisted deposition of optical and protective coatings

for heavy metal fluoride glass” Applied Optics 25, 1973 (1986)
References / o rn s
Mendes S, Jacobson MR, Feiman S, Tian i , Ogloza A, McLeod HA:
“Optical, mechanical and microstructural properties of yttrium fluoride
coatings fabricated by conventional ion-assisted deposition” Proc. SVC 36th
Ann. Techn. Conf. 109 (1993)
Niederwald HJ, Lau S, Kennedy M, Schallenberg , Duparr A, Mertin M,

Kaiser N, Ristau D: “Ion-assisted deposition of o ide materials at room
temperature by use of different ion sources” Applied Optics 38, 3610 (1999)
Rainer F, Lowdermilk WH, Milam D, Carniglia CK, Hart TT, Lichtenstein TL:
“Materials for optical coatings in the ultraviolet” Applied Optics 24, 496 (1985)
Ritter E: “Dielectric film materials for optical applications” Physics of thin

films 8, 1 (1975)
Schmitt DR: “High reflectance low scatter laser mirrors” Proc. SPIE, Thin films
in optics 1125 (1989)
Schnellbügel A, Hagedorn H, Anton R: “Ion assisted deposition of non-to ic

coatings for high power CO2 laser optics” SPIE Vol. 2253, 839 (1994)
Smith D, Baumeister P: “Refractive inde of some o ide and fluoride coating

materials” Applied Optics 18, 111 (1979)
Stetter E, Esselborn R, Harder N, Friz M, Tolles P: “New materials for optical

thin films” Applied Optics 15, 2315 (1976)
Stolz CJ, Kozlowski MR: “Reduce defects to increase laser damage threshold”
Laser Focus World Nov. 1994, 83
Taylor Kruschwitz JD, Pawlewicz WT: “Optical and durability properties of

infrared transmitting thin films” Applied Optics 36, 2157 (1997)
Tatian B: “Fitting refractive inde data with the Sellmeier dispersion formula”
Applied Optics 23, 4477 (1984)
oeller A, Bei wenger S, Goetzelmann R, Matl K: “Plasma ion assisted

deposition: A novel technique for the production of optical coatings” Proc.
SPIE 2253 (1994)
uber A, Kaiser N, Stehl : “Variable-angle spectroscopic ellipsometry for deep

V characterization of dielectric coatings” Thin Solid Films 261 37 (1995)
ukic M, Torr DG, Spann JF, Torr MR: “Vacuum ultraviolet thin films” Applied
Optics 29 4284 (1990)
References / Books
Anders H: “Dünne Schichten für die Optik” Wissenschaftliche
Verlagsgesellschaft Stuttgart 1965
Barry, Hall, Harris: “Thin film technology” D. van Nostrand Co. 1968
(Bell telephone lab series)
Bäumer S: “Handbook of Plastic Optics” Wiley-VCH Berlin 2005
Frey H, Kienel G: “Dünnschicht-Technologie” VDI-Verlag Düsseldorf 1987
Holland L: “Vacuum deposition of thin films” Chapman and Hall Ltd. London
1961
Kaiser N, Pulker HK: “Optical Interference Coatings” Springer Ser. Opt. Sc. 88
Maissel, Francombe: “An introduction to thin films” Gordan and Breach 1973
Maissel, Glang: “Handbook of thin film technology” McGraw-Hill 1970
McLeod HA: “Thin film optical filters” 2nd edition, Adam Hilger Ltd. London
1986
Pulker HK: “Coatings on glass” Thin film science and technology 6, Elsevier
Amsterdam 1984
Savage JA: “Infrared optical materials and their antireflection coatings”

Adam Hilger Ltd. Bristol 1985
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Marcel Dekker New York 1996
Warning:
Personnel should avoid evaporants and by-products formed during evaporation.
If dust develops during cleaning of evaporation equipment, suitable respiratory protection must be provided.
Disclaimer:
Products are warranted to meet the specifications set forth on their label/packaging and/or certificate of analysis
at the time of shipment or for theexpressly stated duration. EMD MAKES NO REPRESENTATION OR WARRANTY
OF ANY KIND, EXPRESSED OR IMPLIED, INCLUDING MERCHANTABILITY OR FITNESS FOR A PARTICULAR USE
REGARDING OUR PRODUCTS OR ANY INFORMATION PROVIDED IN CONNECTION THEREWITH. EMD shall not
in any event be liable for incidental; consequential; indirect; exemplary or special damages of any kind resulting
from any use or failure of the products: All sales are subject to EMD’s complete Terms and Conditions of Sale.
Prices are subject to change without notice. EMD reserves the right to discontinue products without prior notice.
EMD Performance Materials
One International Plaza, Suite 300
Philadelphia, PA 19113
Phone: 484-652-5659
Fax: 484-652-5668
PhotonicsUS@emdgroup.com
www.patinal.com www.patinal.com
Merck KGaA
Mainzer Strasse 41
64579 Gernsheim, Germany
Phone: +49 6258 12-6888
Fax +49 6258 12-6567
photonics@merckgroup.com
www.patinal.com
Merck Ltd. Japan

Arco Tower 5F
1-8-1 Shimomeguro, Meguro-ku
Tokyo 153-8927, Japan
Phone: +81 3 5434-6135
Fax: +81 3 5434-4981
Merck Chemicals (Shanghai) Co., Ltd.

Tower 2, Kingdee Building,
No. 88 Chen Hui Road,
Zhangjiang Hi-Tech Park, Pu Dong,
Shanghai 201203
P.R. China
Phone: +86 21 2033-8288
Fax: +86 21 6247-9991
Merck Display Technologies Ltd.

No. 39, Ching Chien I Rd., Kuanyin Ind. Park
Taoyuan 32853, Taiwan
Phone: +886 3 483-6521
Fax: + 886 3 416-0440
Merck Advanced Technologies Ltd.

3rd Floor, Haesung-2-Bldg., Teheran-Ro 508,
Gangnam-Gu, Seoul 135-725, Korea
Phone: +82 2 2185 3945
Fax: +82 2 2185 3880

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Evaporation Materials

Product Catalog | 2015

The application test comprises an assessment of the evaporation behavior of

Chemical analysis Wet chemical methods

Application tests Evaporation test

For quality control we use a wide variety of methods such as

Substance L5 Granules, 1 kg 00832261

Substance L5 HD (2) Granules, 1 kg on request

Substance L5 HD (2) Discs about 8g, 1 kg on request

Substance M1 Granules, 1 kg 00833361

Substance M2 Granules, 1 kg 00994161

Substance M3 Granules, 1 kg 00995261

Tantalum(V) oxide Ta2O5 Granules, 1 kg 00850061

Tablets, about 0.5 g, 1 kg 00817261

Titanium(II) oxide TiO Granules, 1 kg 00830361

Titanium(III) oxide Ti2O3 Tablets, about 1g, 1 kg 01020361

Titanium oxide X Ti3O5 Granules, 1 kg 1.00097.1053

Titanium oxide S TiO1,7 Granules, 1 kg 01682861

Titanium(IV) oxide, TiO2 Tablets, about 2 g, 1 kg 01177161

(2) HD (high packing density)

rcon o e r scs o 1k 111 1

Substances WR Patinal for hydrophobic and oleophobic layers

Chopra KL, Ma or S, Pandya DK: “Transparent conductors a status review”

Dobrowolski JA, Ho FC, Menagh D, Simpson R, Waldorf AJ: “Investigation of

Friz M, Amadori E, K nig F, McNally SM: “Influence of impurities on the

Hass G: “Reflectance and preparation of frontsurface mirrors for use at various

Heitmann W: “Reactive evaporation in ionized gases” Applied Optics 10, 2414

Heitmann W: “Properties of evaporated SiO2, SiO Ny and TiO2 films” Applied

Herrmann WC: “E-beam deposition characteristics of reactively evaporated

Kaiser N, hlig H, Schallenberg B, Anton B, Kaiser , Mann K, Eva E: “High

Kolbe J, Kessler H, Hofmann T, Meyer F, Schink H, Ristau D: “Optical

K nig F, Friz M: “Development of medium and high refractive inde coating

McNally JJ et. al: “Ion-assisted deposition of optical and protective coatings

Niederwald HJ, Lau S, Kennedy M, Schallenberg , Duparr A, Mertin M,

Ritter E: “Dielectric film materials for optical applications” Physics of thin

Schnellbügel A, Hagedorn H, Anton R: “Ion assisted deposition of non-to ic

Smith D, Baumeister P: “Refractive inde of some o ide and fluoride coating

Stetter E, Esselborn R, Harder N, Friz M, Tolles P: “New materials for optical

Taylor Kruschwitz JD, Pawlewicz WT: “Optical and durability properties of

oeller A, Bei wenger S, Goetzelmann R, Matl K: “Plasma ion assisted

uber A, Kaiser N, Stehl : “Variable-angle spectroscopic ellipsometry for deep

Bäumer S: “Handbook of Plastic Optics” Wiley-VCH Berlin 2005

Frey H, Kienel G: “Dünnschicht-Technologie” VDI-Verlag Düsseldorf 1987

Maissel, Glang: “Handbook of thin film technology” McGraw-Hill 1970

Savage JA: “Infrared optical materials and their antireflection coatings”

Willey RR: “Practical design and production of optical thin films”

Merck Ltd. Japan

Merck Chemicals (Shanghai) Co., Ltd.

Merck Display Technologies Ltd.

Merck Advanced Technologies Ltd.

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