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Rinse Sampling for


Cleaning Validation Studies

V
Destin A. Le Blanc
alidation of cleaning processes used for product contact
surfaces in pharmaceutical manufacturing is required by
FDA. The 1993 decision of US v. Barr Laboratories gave
FDA the right to mandate that cleaning is a critical process
that must be validated (1). Although this decision focused mainly
on issues related to retesting after out-of-specification results, it also
held that FDA had the right in this case to mandate validation of
cleaning processes. In July 1992, while this case was being litigated,
the agency’s Mid-Atlantic Region staff developed an internal in-
spection guideline for cleaning validation (2). In July 1993, the more
official and still current “Guide to Inspections of Validation of Clean-
ing Processes” was issued (3).
The 1992 Mid-Atlantic guide discusses three types of sampling:
direct surface, rinse, and placebo. Direct surface is rated most de-
sirable, rinse is considered less desirable, and placebo is considered
generally unacceptable. In the 1993 guide, although not explicitly
stated, the relative ranking of these methods is assumed to hold —
CALGON VESTAL

with direct surface being most desirable and placebo being accept-
able only if direct surface or rinse sampling is also done. Two rea-
sons support the less-desirable designation for rinse sampling. The
first issue is whether the residue of concern is soluble in the rinse
solution. One analogy is that of a dirty pot. If the concern is
whether or not a washed pot is clean, does one examine the rinse
Rinse-sampling procedures that draw from the final water or the pot itself? The second concern is the analytical strategy
rinse solution can provide upper-limit estimates of used. Some pharmaceutical companies previously analyzed the
potential contamination in subsequently manufactured rinse water and tested it merely for USP compendial specifications
products. The process can be improved by separating
for purified water or for water for injection. FDA argued (quite
rightly) that manufacturers should have a target residue and mea-
the process rinse from the sampling rinse. This may
sure that target residue. It is possible that the rinse water meets USP
result in more accurate actual estimates, more
specifications and yet may not reasonably indicate contaminants
flexibility in selecting analytical procedures, and more in the rinse water because the target residue is present either at a
flexibility in choosing a sampling rinse solution that is level or as a chemical species that cannot be adequately detected by
different from the process rinse solution. Procedures USP water specifications.
for such determinations depend on adequate rinse The 1993 document does offer some guidance on acceptable
recovery studies. This article describes these studies. residue levels by citing a paper from scientists at Eli Lilly about
their procedures for setting residue limits (4). These residue limits are
based on the possible contamination of product subsequently manu-
factured in the same equipment. The Eli Lilly scientists proposed
limits in the subsequent product that would produce 0.001 of a min-
imum daily dose of the drug residue in a maximum daily dose of
the next drug product. They also proposed that if the calculated value
based on the 0.001 daily dose is more than 10 ppm, then a default
value of 10 ppm residue in the subsequent product should be used.
Based on possible contamination of the subsequent product, it
is then possible to calculate — using parameters such as batch size,
Destin A. Le Blanc is vice-president of scientific technical support, surface area, and sampling technique — items such as allowable
Calgon Vestal Division, Steris Corp., PO Box 147, St. Louis, contamination per surface area or per swab sample. Although
MO 63166, tel. (314) 535-1187, fax (314) 535-1083, e-mail swab-sampling residue limits have been discussed in numerous
(destin_leblanc@steris.com). papers (5,6,7), rinse sampling has not been covered as rigorously.
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Based on the author’s experience, manufacturers have often ment is filled with rinse solution, the solution is circulated or
made assumptions about acceptable rinse water limits without otherwise agitated until it is uniform, and then it is dumped.
adequate consideration of the potential for contamination of For rinse sampling, a portion of that final rinse is sampled, and
the subsequently manufactured product. In many cases, a rinse then that sample is analyzed for the target residue. If X liters
water limit of 10 ppm has been automatically selected and as- are used in the final rinse, the subsequently manufactured prod-
sumed to represent an acceptable residue limit in the rinse so- uct is made with a batch size of Y liters, and Z ppm (adjusted
lution. The rest of this article focuses on the critical relation- by a recovery factor that will be discussed later) residue is mea-
ship between rinse-sampling results and potential contamination sured in the last rinse, then the level of residue C that can po-
of the subsequent product. Issues covered include rinse sam- tentially contaminate the subsequent product can be reasonably
pling as it is currently done (i.e., grab sample at the end of the assumed to satisfy the following limit:
rinsing process), rinse-sampling processes that may provide C  (Z)(X)  (Y) [1]
more scientifically justified residue limits, and methods that
may adequately determine rinse-sampling recovery. For example, for a 1000-L vessel, it may take 1100 L of rinse
water to adequately rinse the vessel in a batch-rinsing process
SINGLE-POINT FINAL-RINSE SAMPLING (the extra water is associated with the pumping lines as the rins-
In this method, manufacturers obtain a sample at the end of the ing solution is recirculated). If the measured residue is 5.0 ppm
final rinsing process. If the rinsing medium is water, then this is in that final rinse solution, and if the batch size of the subse-
obviously a water sample; if a solvent is used for the final rinse, quently manufactured product is 900 L, then the maximum po-
then this is a solvent sample. The volume of rinse sample taken tential contamination in the next product will be
will depend on the analyses done but typically is in the 500–1000- (5.0 ppm)(1100 L)  (900 L)  6.1 ppm [2]
mL range. The sampling point is usually identified as that point
at the end of the cleaning circuit at which the water exits the The measured level in the rinse water is less than the potential
cleaning circuit. Assuming that a specific residue is targeted, as maximum contamination level in the next product because the
FDA recommends, what does it mean if a chemist measures a volume of the rinse water is greater than the volume of the sub-
target residue in the grab sample and measures a level of, for ex- sequently manufactured product.
ample, 5 ppm? Can it be reasonably assumed that a level of 5 ppm This is a maximum and not a specific amount. If the sam-
in this rinse sample corresponds to a potential contamination of pling is done on the final rinse, then any rinse done subsequently
5 ppm in the subsequent product? The existing literature for should represent a significantly lower residue level. In other
cleaning validation does not provide a series of calculations to words, if the nth rinse resulted in a 5-ppm residue level, then the
go through, such as with swab sampling, that can lead to a scien- (n  1)th rinse should produce a value that is considerably less
tifically based correlation between rinse sample analysis and po- than 5 ppm. This is because the sampling of the nth rinse does
tential contamination of the subsequently manufactured product. not represent the contamination of the surfaces after the nth
How can this relationship be established? For swab samples, rinse, but rather the contamination after the (n  1)th rinse. This
factors such as batch size of subsequent product, shared sur- is adequate justification for saying that the residue in the subse-
face area, area sampled, and amount of solvent used for de- quent product in this example will be 6.1 ppm. If the limit
sorbing the swab must be considered to obtain an accurate rela- for that target residue is 10 ppm, then one can be assured of be-
tionship between the analytical result in the desorbed swab ing under that limit. On the other hand, if the limit in the subse-
sample and the corresponding contaminant levels in the subse- quent product is 3.2 ppm, then one may or may not be under that
quent product. What are the corresponding factors for rinse limit after the nth rinse, and more work must be done to either
samples? How do these factors relate to what is really of inter- confirm the accuracy of the 6.1 ppm calculation or to find
est — that is, potential contamination of the next product? whether the actual value is less than 3.2 ppm. If the acceptance
One way to establish a relationship is to make assumptions limit in the subsequent product were actually 3.2 ppm, then the
about what rinsing represents. The first and critical assumption data are insufficient to give adequate assurance. However, if
is that the target residue as it exists on the equipment surfaces is the residue is soluble in the rinse solution, then it is reasonable
solubilized in the rinse solution by the rinsing process. If this is to speculate that the results after one additional rinse might be
true, then the levels found in the rinse are indicative of the levels acceptable because the (n  1)th rinse will give a true measure
on the equipment surfaces. The second assumption is that the of what is present after the nth rinse.
rinse process adequately cleans all surfaces and any sample mea- A continuous rinsing procedure is more commonly used in
sured is therefore representative of the entire system. It should the pharmaceutical industry. In this method, the rinsing is on a
be noted that the notion of worst-case locations does not apply to continuous, once-through-to-drain basis. If the rinsing procedure
cleaning validation rinse sampling because the entire product con- is for m minutes, then at the end of m minutes, a grab sample is
tact surface is sampled. Several more assumptions that depend obtained and analyzed for the target residue. An analysis similar
on the types of rinsing process will be discussed later. to the one done in the batch-rinsing process can be done in a con-
Two scenarios of interest are possible. The first case involves tinuous rinsing procedure, although the assumptions are some-
a continuous rinse process, such as would be found in a CIP what more tenuous. The first assumption is that the sample col-
operation. The other process involves discrete rinses or batch lected at the end of m minutes is the worst case, and any
rinsing. Batch rinsing is considered first because it is the simpler subsequent sample provides a lower level (also assuming, as we
of the two. In a batch-rinsing process, the manufacturing equip- have throughout, that the residue is solubilized in the rinse solu-
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tion by the rinsing process). If the total amount of rinse solution On the other hand, if the problem is solubility of the target
collected is assumed to equal the volume of the next batch, then residue in the process rinsing solution, then it may be neces-
the analysis of that total volume would give a residue level less sary to complete the (n  1)th rinse with a solvent that more
than or equal to the residue measured in the grab sample at the readily solubilizes the target residue instead of with the process
end of m minutes. In this case, the potential contamination in rinsing solvent. For example, in aqueous cleaning with a batch-
the subsequent batch is no greater than that in the grab sample rinsing process that involves six rinses with USP purified wa-
at the end of the rinsing process. If the grab sample has a level ter, as soon as the rinsing process is complete, one can begin
that is below the acceptance limit for the target residue in the sampling with a rinse that uses a different solvent. This solvent
subsequent product, then the residue level in the subsequent could merely be water at a different pH if the target residue is a
product can be assumed to be at an acceptable level. On the other drug active that dissolves more readily at a higher or lower pH.
hand, if the level in the grab sample is above the acceptance limit It could be a 70% isopropanol solution or some organic solvent
in the subsequent product, the residue levels in the equipment if the target residue is more readily soluble in an isopropanol so-
may or may not be acceptable, and further work must be done. lution or that specified organic solvent.
Regardless of the solution used for this sampling rinse, it should
REFINEMENTS IN RINSE SAMPLING be noted that this sampling rinse is to be used only as part of the
The rinse-sampling methods described above can only provide validation studies. The (n  1)th rinse is not part of the cleaning
an upper limit for residue levels either because the equipment SOP but rather is truly part of a sampling procedure. Another fea-
is not tested after the final rinse (as in the case of the batch- ture of this approach is that it targets all surfaces in the equip-
rinsing procedure) or because a representative sampling volume ment. The positive side is that this not only ensures that all surfaces
is not adequately defined (as in the case of the continuous rinse are sampled, but it also effectively averages the contaminant levels
procedure). This is not to say that these procedures are unac- from different locations. Although it does not release a company
ceptable. The purpose of residue testing is to determine whether from the obligation to clean effectively and to achieve visibly clean
the residue is below the acceptance limit and not necessarily to surfaces, this averaging does reduce the possibility that one aber-
define the exact level of contamination. If the above methods rant result in a swab-sampling program could invalidate a cleaning
show acceptable results for residue levels, then these procedures validation study. This averaging process also assumes that the
are sufficient. On the other hand, if the upper limit of the mea- transfer of contaminants to the subsequently manufactured product
sured residue is above the acceptance limit or if the analytical is a uniform process. In the case of nonuniform contamination, this
tools do not adequately measure at those residue levels (e.g., the method gives a measurement of the total system contamination,
analytical method analyzes a solution 25 ppm, but the limit but other techniques must be considered to evaluate how that con-
in the subsequent product is 5 ppm), then a refined sampling taminant is transferred to the subsequent product.
process can provide more useful results. These sampling re- The second situation involves a continuous rinsing procedure.
finements also offer the option of using a sampling rinse that is In this case, an approach that begins the sampling rinse only af-
different from the final rinse solution. ter the rinsing process is completed may provide considerable
To more accurately measure residue with a rinse solution, one advantages in analytical method selection. Once process rinsing
must first define the sampling process so that rinse sampling is is finished, the rinse sampling is started. Note that in actual prac-
conducted only after the rinsing process is completed and then tice the process rinse and sampling rinse may, in fact, be con-
to carefully define the rinse-sampling volume. By measuring the tiguous. However, there is nothing wrong with stopping the rins-
residue in the final rinsing solution using the assumptions pre- ing process and at a later time beginning the sampling rinse. This
viously discussed, pharmaceutical companies are actually es- is no different from swab sampling in which after the rinsing
tablishing a worst-case scenario. However, rinse sampling may process is completed, the sampling process is begun at a later
be able to estimate residue levels more accurately. time. What this means practically is that, if the SOP is written
A batch-rinsing process is considered first. The key here is with a process rinse time of 10 min, then a sampling rinse is be-
that if the rinsing process in the SOP calls for n discrete process gun at the end of 10 min. The length of time needed to collect a
rinses, then an additional rinse should be done (the sampling sample (i.e., the volume of sampling rinse collected) depends
rinse) only for the validation studies, and that sampling rinse so- on the amount of sampling rinse necessary to adequately con-
lution should be analyzed. Such an analysis of the (n  1)th tact all surfaces within the equipment. For a CIP system, this
rinse should provide an accurate measurement of the residue amount will typically be the total volume of cleaning solution
on the equipment after the final (nth) process rinse if the sam- in the CIP circuit. For example, if the vessel being cleaned is a
pling rinse solution provides adequate recovery. This approach 1000-L vessel, it may take 100–200 L of cleaning solution in
may offer measured residue levels in the analyzed solution that the CIP circuit. This includes the heel in the manufacturing ves-
are lower than those in the final rinse sample. Of course, the sel, the solution in the CIP cleaning solution tank, the solution
same equation (equation 1) for calculating potential contami- in associated piping, and the solution on the dome and sidewalls
nants in the subsequent product must be used. Because the sam- of the vessel. If the amount of cleaning solution in the circuit dur-
pling volume and the volume of the subsequent product are the ing the cleaning (recirculating) step is 150 L, then it can be rea-
same, the only factor that can provide lower residues is lower sonably assumed that the circulation of 150 L of sampling rinse
amounts measured in the (n  1)th rinse. Therefore, this method would contact and adequately sample all surfaces. The next step
cannot be used to resolve problems in which the limit of detec- is to collect that sampling rinse (all 150 L), agitate it until uni-
tion of the analytical method is the limiting factor. form, take a subsample of it, and analyze that subsample.
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Such a sampling procedure can use equation 1 to measure po- compared with the amount spiked onto the coupon. As with spik-
tential contamination in the subsequent product. To continue with ing studies in swab sampling, issues such as potential interference
the above example, suppose a sampling rinse of 150 L is adequate sources must be addressed. If the analytical method is total or-
to sample a 1000-L vessel and the target residue in that sampling ganic carbon, then a control for the rinse sample solution should
rinse was measured at 5.0 ppm. What would this correspond to be run as a background subtraction. This blank should not be the
in terms of contamination of a subsequently manufactured prod- rinse-sampling solution itself but rather the solution that has been
uct of batch size 900 L? Using the equation, the calculation gives used to sample a clean, unspiked coupon.
(5.0 ppm)(150 L)  (900 L)  0.8 ppm [3] The second procedure requires placing the coupon in an ap-
propriate amount of sampling solution into the bottom of a
In other words, 5 ppm in the sampling rinse solution corresponds beaker and gently swirling for 30 s. The coupon and rinse so-
to only a maximum of 0.8 ppm residue in the subsequent prod- lution should be separated immediately to quench the dissolution
uct. If the acceptable residue limit in the next product is 10 ppm, process, and then the solution should be analyzed. This method
then an analytical method that measures at around 60 ppm could has the handling disadvantage of dealing with the underside of
acceptably measure that residue. If analytical limits of detection the coupon. Also, it is more difficult to remove the coupon from
are a problem, one solution is to move to this type of rinse- the sampling solution to quench the rinsing process. But these are
sampling procedure to leverage the analytical method. Compared not insurmountable problems. As with swab-sampling recovery,
with the batch-rinsing procedure, the surface is sampled with a the level of residue spiked onto the coupons represent those lev-
smaller volume of liquid, thus effectively concentrating the els expected to produce test solutions around the acceptance cri-
residue in the sampling solution. Certainly the same primary teria for the analytical test solution.
concern applies in this procedure as with a batch-sampling rinse
process, namely, the residue must be solubilized in the sampling DISCUSSION
rinse solution during the rinse-sampling process. The possibility In a cleaning validation study, current single-point, grab-sampling
also exists for using a sampling rinse solution that is different procedures for a rinse solution analysis at the end of the rinsing
from the process rinse solution. This may result in more rele- process can provide adequate estimates of potential contamination
vant and defendable cleaning validation processes. levels in a subsequently manufactured product. If a rinse recovery
study demonstrates residue recovery, and if proper assumptions
DETERMINATION OF SOLUBILITY IN SAMPLING RINSE are made regarding the relationship between the residue level in the
A key in any sampling procedure is that it quantitatively removes rinse solution and the potential contamination in the subsequent
the residue from the surface for subsequent analysis. In swab product, then the rinse-sampling procedure is adequate. Sampling
sampling, this is done by a swab-recovery study. Such a study the process rinse solution gives an upper limit estimate of the av-
determines not only the removal of residue by the swab but also erage overall contaminant level in the process equipment.
the subsequent desorption of the residue from the swab. Al- If a more rigorous treatment of rinse sampling is desired, if
though swab-recovery studies are common, it is also necessary to the use of a sampling solution other than the process rinse so-
perform sampling rinse–recovery studies to verify that a sam- lution is necessary, or if the analytical limits of detection are
pling rinse procedure can adequately recover residues from sur- inadequate to provide results that are below the acceptance cri-
faces. The best way to approximate a sampling rinse–recovery teria, then the use of a sampling rinse separate and distinct from
is to conduct lab studies that involve coupons. As with swab the process rinse should be considered. Such an approach that
sampling, a coupon of the substrate of interest (e.g., stainless uses a distinct sampling rinse does not obviate the value of rinse
steel) is spiked with the target residue of interest. Depending on water monitoring as a routine QC technique.
the application, the spiked residue may be dried or baked onto
the surface to simulate how it may exist in actual processing con- REFERENCES
ditions. There are two methods that can simulate rinsing. Both 1. United States v. Barr Laboratories, 812 F. Supp. 458 (DNJ 1993).
depend on a ratio of rinse-sampling solution to surface area that 2. FDA, “Mid-Atlantic Region Inspection Guide: Cleaning Valida-
tion,” 28 July 1992.
is no larger than the expected ratio under actual rinse-sampling 3. FDA, “Guide to Inspections of Validation of Cleaning Processes,” July 1993.
conditions. The temperature for the recovery study should be 4. G.L. Fourman and M.V. Mullen, “Determining Cleaning Validation
the same temperature as that of the rinse-sampling solution (or Acceptance Limits for Pharmaceutical Manufacturing Operations,”
less, if the solubility increases with increasing temperature). Pharm. Technol. 17 (4), 54–60 (1993).
One method involves positioning the spiked coupon over a 5. K.M. Jenkins and A.J. Vanderweilen, “Cleaning Validation: An
Overall Perspective,” Pharm. Technol. 18 (4), 60–73 (1994).
beaker to collect the rinse-sampling solution, then pipetting the 6. J.M. Hyde, “Cleaning Validation Strategies,” paper presented at
rinse-sampling solution over the coupon, and finally letting the ISPE CIP/SIP Seminar, Atlanta, Georgia, June 1994.
solution collect in the beaker below. After this simulated sampling 7. Cleaning and Cleaning Validation: A Biotechnology Perspective,
rinse, the collected solution is analyzed for the target residue and J.R. Voss, Ed. (PDA, Bethesda, MD, 1996).

© Reprinted from PHARMACEUTICAL TECHNOLOGY, May 1998 Printed in U.S.A.

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