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18 Thin Solid kThns, 219 (1992) 18 23

Effects of solvent on properties of sol-gel-derived TiO 2 coating films

Lili Hu*, Toshinobu Yokot, Hiromitsu Kozuka and Sumio Sakka


Institute Jbr Chemical Research, Kyoto University, Uji. Kyoto-Fu 611 (Japan)
(Received November 26. 1991; revised February 21, 1992; accepted May 5, 1992)

Abstract

The effects of the kind of solvent on the properties of TiO2 coating films prepared by the sol-gel method using
titanium isopropoxide (Ti(OC3H7i)4) as the starting material have been investigated. Ethanol, ethanol mixed with
isopropyl alcohol, and ethanol with 2-ethoxyethanol were used as the solvents. The kind of solvent was found to
affect the crystallization behaviour, microstructure, and photoelectrochemical properties of the resultant TiO2
coating films.

I. Introduction 2. Experimental details

The sol-gel method is one of the most important 2.1. Preparation o f Ti02 coating films
techniques for the synthesis of various functional coat- Three kinds of sols, TI, T2 and T3, for dip coat-
ing films [1] because it possesses a number of advan- ing were prepared using ethanol, ethanol mixed with
tages over conventional film formation techniques, such isopropyl alcohol and ethanol mixed with 2-ethoxy-
as low temperature processing, easy coating of large ethanol respectively. They were prepared by mix-
surfaces, and possible formation of porous films and ing titanium isopropoxide (Ti(OC3Hyi)4), anhydrous
homogeneous multicomponent oxide films. The present ethanol (CzHsOH), isopropyl alcohol (C3H7OH), or
authors [2] have applied the sol-gel dip coating method 2-ethoxyethanol (C2HsOCH2CHzOH), hydrochloric
for preparing semiconducting oxide films, such as TiO2, acid and distilled water in a similar way to that de-
SrTiO3, BaTiO3, c~-Fe20 3, which can be used as pho- scribed previously [3, 4]. The chemical compositions are
toelectrodes for the decomposition of water. As a shown in Table 1. All chemicals were supplied by Wako
result, it was found that in the sol-gel-derived TiO2 Pure Chemical Industries Ltd., Osaka. The equivalent
films [3 6] the cell performance as a photoanode is oxide content of TiO2 in these sols was kept constant at
significantly affected by the pore characteristics, specific 10.8% by weight. Silica glass plates coated with Sb203-
surface area, and surface state of the film. It is pre- doped SnO 2 conducting film (Nesa silica glass) were
sumed that such properties may be strongly dependent used as substrates. The substrate was dipped in the sol
on the sol gel processing conditions including the and withdrawn at a speed of 0.25 mm s - ~ to make a gel
kind and concentration of the solvent and the heat coating film. The TiO2 gel films were heated to temper-
treatment. atures ranging from 300 °C to 900 '~C for 10 min in air.
In the present study, the present authors focus on The samples were put directly into a furnace which was
the effect of the kind of solvent on the hydrolysis and maintained at a given temperature.
condensation reactions of Ti(OC3HTi)4, the crystalliza-
tion behaviour of the gel films, and the microstructure 2.2. Characterization
and photoelectrochemical properties of the resultant The crystallization behaviour of the TiO2 gel films
TiO 2 coating films. Three kinds of solvents, ethanol, was examined by X-ray diffraction using Cu K~ radia-
ethanol mixed with isopropyl alcohol and ethanol with tion. The as-prepared surface and the fracture surface
2-ethoxyethanol, were examined. of the gel and ceramic coating films heated to 100 °C
and 500 °C respectively were observed by a Hitachi
model 450S scanning electron microscope. The thick-
ness and refractive index of the coating films were
*On leave from Shanghai Institute of Optics and Fine Mechanics, measured by an ellipsometer (model DVA-36VW, Mi-
Academia Sinica, Box 8216, Shanghai, China. zojiri Optical Works, Tokyo) using an He Ne laser as
"['Author to whom correspondenceshould be addressed. the light source.

0040-6090/92/$5.00 ,C 1992 ElsevierSequoia. All rights reserved


L. Hu et al. / S o l - g e l TiO 2 coatings 19

TABLE I. Compositions and viscosities of starting solutions

Sol Composition (mol) TiO2 a Viscosity


(wt.%) q (cP)
Ti(OC 3Hi7 )4 C 2 HsOH C 3H 7OH C 2H50C2H4OH HCI H20

Tl 0.05 0.46 0.007 0.05 10.8 3.3


T2 0.05 0.265 0.15 -- 0.007 0.05 10.8 5.4
T3 0.05 0.41 -- 0.025 0.007 0.05 10.8 3.8

~Equivalent oxide content of TiO 2 in sols.

The photocurrent-potential curves for the TiO2 films prepared by dipping ten times in T1, T2 and T3 sols
coating film used as a photoelectrode were measured respectively and heating at 500 °C for 10 min after each
in a buffer solution of pH7 (0.2MNazB407+ coating. As seen in Figs. 2(c) and 2(d), both gel and
0.14 M H2SO 4 + 0.3 M Na2SO4) using a potentiostat crystallized coating films from T2 sol consist of particles.
(model HG-501, Hokuto Denki Co. Ltd., Tokyo). A On the contrary, as seen in Figs. 2(a) and 2(e), a
500 W xenon lamp (Ushio Denki Co. Ltd., Tokyo) was
used for illuminating the film electrode.

3. Results

3.1. Thickness and microstructure of the Ti02 coating


films
Figure 1 shows the relationship between the film
thickness and the number of dippings for the TiOz
coating films which were obtained by heating the gel
films at 500 °C for 10 min after each dipping. A linear (a) (b)
relationship going through the origin was found to hold
for every sol. The average thickness of a fired film with lpm
one dipping was calculated to be 0.081 I~m, 0.115 lam
and 0.085 tam for T1, T2 and T3 sols respectively,
indicating that the film for one dipping is thicker for T2
sol than for T1 and T3 sols.
Figure 2 shows the scanning electron microscopy
(SEM) photographs of the films. Figures 2(a), 2(c) and
2(e) are the as-prepared surfaces of the films prepared
by dipping eight times in T1, T2 and T3 respectively
and heated at 100 °C for 10 min after each coating, and (c) (d)
Figs. 2(b), 2(d) and 2(f) are the fracture surfaces of the

u I i i i
1.2 roT1 ./
LO
0.8
o T3 //j

I (e) (f)
0 2 4 6 8 10 12
Number of dipping, Fig. 2. SEM photographs of the TiO 2 coating films from (a), (b) TI,
(c), (d) T2, and (e), (f) T3 sols. (a), (c), (e) As-prepared surfaces:
Fig. 1. Relation between the thickness and the number of dippings eight dippings; heated at 100 °C for 10 min after each coating. (b),
for the TiO 2 coating films. The coating films were heated at 500 °C (d), (f) Fracture surfaces: ten dippings; healed at 500 °C for 10 min
for 10 min after each coating. after each coating.
20 L. Hu et al. / Sol-gel TiO2 coatings

300'C, lOmin 400'C, lOmin

T1

T2
T3 ~ T3
I I I I I I [ I

20 30 40 5O 60 20 30 40 5O 60
(a) 20/deg (c) 2e/deg

350'C,
lOmin I j~ 450"C,
lOmin
TI
II
f T2

T3
I | I I

2O 30 40 5O 60 20 30 40 50 60
(b) 2e/deg (d) 2O/deg

900'C,10rain
0 0 anatllse

rutile
0

(a) T1

O
~ (b) T2

500"C,
10rain

is= %
1~1 ~ I (c) T3
_.~ .1~ T2

20 30 40 50 60 20 30 40 50 60
(e) 20/deg (f) 20/deg
Fig. 3. X-ray diffraction patterns of the TiO2 coating films obtained by heating the gel films at various temperatures.

layer structure is observed for the gel films from T1 and and 2(f) shows that the films from T2 sol have a rather
T3 sols heated at 100 °C, which then changes into a rough surface after heating at 500 °C, while those from
columnar structure on heating at 500 °C as seen from T1 and T3 sols have a smooth surface. In particular,
Figs. 2(b) and 2(f). A comparison of Figs. 2(b), 2(d) the film from T3 has a very smooth surface.
L. Hu et al. / Sol-gel 7702 coatings 21

i , i ,
TABLE 2. Refractive index of TiO2 coating films prepared from
different coating solutions

Sample Refractive index for the following heating

T1
temperature (°C)

500

2.169
600

2.222
700

2.254
800

2.400
,., 0 I

500
i

600 700
I L

800
t
T2 2.078 2.111 2.207 2.353
T3 2.140 2.194 2.220 2.367
Fig. 4. Porosity of the TiO 2 coating films as a function of the
temperature of heat treatment.

3.2. Crystallization 50
Figure 3 shows the X-ray diffraction patterns of the T8
films. They were prepared by dipping 5 times in T1, T2
and T3 sols and heating at 300, 350, 400, 450, 500 and i 40
30
900 °C for 10 rain after each coating. All the films are
amorphous at 300 °C, and anatase crystals are precipi- 20
tated at 350 °C, 400 °C and 450 °C for the films made T1
from T3, T2 and T1 sols respectively. Rutile phase is
found in T1 and T3 samples on heating at 900 °C, while a , , ~dark
no trace of rutile phase is observed for the T2 sample at -1.0 -0.5 0.5 1.0 1.5 2.0
900 °C.
E / V vL 8CS
3.3. Refractive index and porosity Fig. 5. Photocurrent-potential curves of the TiO 2 coating films ob-
Table 2 summarizes the refractive indices of the tained from five dippings by heating at 500 °C for 10 rain after each
coating films prepared by heating the gel films at 500, coating,
600, 700 and 800 °C for 10 min. The crystalline phase
precipitated in these films was anatase. It is seen that
the refractive index increased with increasing heating 14 mA cm -z, indicating a big difference in cell perfor-
temperature in each of the T1, T2 and T3 series. It is mance between the TiO2 film electrodes prepared from
noticed that at a given temperature the refractive index different sols.
is larger in the order T2 < T 3 <T1. The values are
smaller than that of dense anatase, 2.52, found in the
literature [7]. 4. Discussion
The porosity of the coating films was calculated using
the equation [8] 4.1. Hydrolysis and condensation reactions
n2--1 Titanium alkoxides have different structures depend-
porosity :- 1 (1) ing on the kinds of alkoxyl groups and/or solvents
nd 2 - 1
[9, 10]. The titanium atom is tetrahedrally coordinated
where nd is the refractive index of pore-free anatase in Ti(OC3Hvi)4, while it is pentahedrally coordinated in
(2.52 [7]), and n is the refractive index of the porous Ti (OC2H5)4 [11, 12]. In addition, Ti(OC3H7i)4 in iso-
coating film. The porosity-heating temperature curves propyl alcohol is monomeric, while Ti(OC2Hs)4 in
are shown in Fig. 4. The porosity decreased from ethanol is associated and solvated to form a dimeric
30%-40% for a heating temperature of 500 °C to 10%- complex, Tiz(OC2Hs)8 • 2CzHsOH. Higher rates of hy-
20% for 800 °C. drolysis and condensation reactions are expected for
monomeric alkoxides than for oligomeric alkoxides be-
3.4. Photoelectrochemical properties cause there is less steric hindrance. This is revealed in a
TiO2 coating films subjected to heat treatment at previous study [13], where monodispersed, fine particles
500 °C for 10 min after each coating were employed are obtained by hydrolysing Ti(OCzHs) 4 in ethanol,
as photoanodes for photocurrent measurements. The while non-monodispersed, large particles are formed
photocurrent-potential curves measured in an elec- from Ti(OC3Hvi)4 dissolved in isopropyl alcohol.
trolyte of pH 7 are shown in Fig. 5. The T3 sample had In T1 sol of the present work Ti(OC3HTi)4 is dis-
the largest photocurrent of about 48 mA cm-2, while solved in ethanol. So, it is possible that the ester
the T1 sample had the smallest photocurrent of about exchange between the isopropoxide and ethanol would
22 L. Hu et al. / Sol gel TiO: coatings

lead to the formation of a complex such as be the only parameter that governs the film thickness of"
Ti2(OC2Hs)8 x(OC3H7i),-2C2HsOH, which may TiO2 coating films. The values in the fifth column in
have a more oligomeric nature than monomeric Table 3 are in good agreement with those in the last
Ti(OC3HTi)4. On the contrary, in T2 sol, a larger column, indicating that the film thickness is controlled
portion of Ti(OC3H7i)4 molecules would remain as mainly by the viscosity of the sols.
monomer than in T1 sol because of the addition of
isopropyl alcohol to the solvent. Then, the alkoxides in 4.3. Crystallization behaviour
T2 sol possibly have higher reaction rates of hydrolysis In TiO2 gel films prepared from T2 and T3 sols,
and condensation than in T1 sol. This may be reflected anatase phase precipitated at lower temperatures,
in the higher viscosity of T2 sol than T1 sol as shown in around 350-C and 400"C respectively, while those
Table 1. The higher reaction rates in T2 sol result in the prepared from T1 sol exhibited the highest crystalliza-
formation of larger particles in the sol and a rough tion temperature (about 450 '~C). This indicates that the
surface of the coating films, whereas the lower reaction addition of isopropyl alcohol or 2-ethoxyethanol to
rates in T1 sol give rise to the formation of columnar ethanol promotes the crystallization of the TiO2 gel
particles in the sol and a smooth surface of the film. films. A similar phenomenon was also reported by
The hydrolysis and condensation in T3 sol are as- Takahashi and Matsuoka [15], who found that the use
sumed to proceed in almost the same manner as in T I of diethanolamine instead of ethanol as a solvent for
sol, since only a small amount of 2-ethoxyethanol was Ti(OC3H7i)4 promotes the precipitation of both ana-
added. In fact, similar values of viscosity and film tase (about 400 °C) and rutile (about 650 cC) phases
thickness, non-particulate, columnar structure of the out of TiO2 coating films.
film and smooth surface were observed in both the TI Such a difference may be caused by (1) stress gener-
and the T3 samples. ated in the films and (2) different structures of particles
contained in the gel films. Since there are no significant
4.2. Parameters affecting the film thickness differences in particle structure between TI and T3
Orgaz and Capel [ 14] found that the film thickness t samples as seen from Fig. 2, the second cause cannot
of oxide glass coating films obtained by the dip coating explain the difference in crystallization behaviour. In
method obeys the following semiempirical equation: the present study, silica glass plates with Nesa coating
were used as the substrates, whose thermal expansion
t = (P~/Po) WKaO1V/psg),/2 (2)
coefficient is as small as 5 x 10 7 °C t. The TiO 2 gel
where p~ and P0 are the densities of the sol and the films tend to shrink as heat treatment proceeds, result-
heat-treated glass film respectively, and W is the ratio ing in pore disappearance and densification. This, in
between heat-treated coating weight and liquid coating turn, produces tensile stress in the films, the magnitude
weight, r/ is the viscosity of the sol, a is the surface of which should increase as the densification proceeds,
tension of the sol, K is a constant, V is the withdrawing in the order T2 < T3 < T1 in the present case, as ex-
speed and g is the gravitational acceleration. Table 3 pected from Table 2. Therefore, it may be concluded
summarizes the viscosity r/and the surface tension a of that the crystallization into anatase phase is suppressed
sols, the film thickness t per coating, and the ratio of by the tensile stress arising in the TiO2 films during
the film thickness t(Ti) of sample T2 and T3 to t(T1) heating because it would accompany additional shrink-
of sample T1, and the square root of the ratio of the age in the films.
viscosity q(Ti) of T2 and T3 sols to q(T1) of T1 sol.
Since the equivalent TiO2 content of each sol and the 4.4. Photoelectrochemical properties
withdrawing speed are kept constant and the surface Addition of isopropyl alcohol or 2-ethoxyethanol to
tensions of the solvents are almost the same (see Table the starting coating solutions enhanced the photocur-
3) in the present samples, the viscosity of the sol would rent of the as-prepared TiO2 coating films as shown in

T A B L E 3. Parameters determining the thickness of sol gel-derived TiO2 coating films

Sample q (cp) ° a (dyn c m - t)b t (p.m) ~ t(Ti)/t(T1 ) [r/(Ti)/q(T1 )] ~/2

TI 3.3 22.4 0.081 1 1


T2 5.4 22.0 0.115 1.41 1.28
T3 3.8 22.7 0.085 1.05 1.15

~'Measured viscosity of the sols.


bSurface tension of the solvent.
~Average film thickness per coating.
L. Hu et al. / Sol-gel Ti02 coatings 23

Fig. 5. The possible reasons for the different photoelec- films were studied. It was found that the addition of
trochemical properties are differences in (1) crystallinity, isopropyl alcohol or 2-ethoxyethanol to ethanolic solu-
(2) specific surface area, (3) electrical resistance of the tions of titanium isopropoxide significantly influences
sol-gel-derived TiO 2 film electrodes, and (4) Ti 3 + con- the crystallization behaviour, microstructure, and pho-
centration at the surface [4-6]. toelectrochemical properties of the resultant TiO2 film.
It is reasonable to assume that the crystallinity of the Enhancement in the photocurrent of the film was as-
TiO 2 coating films heated at the same temperature is sumed to be caused by an increase in crystallinity, a
higher in the order T1 < T2 < T3, on the basis of the decrease in resistance, an increase in surface area and
observed crystallization temperature in the order an increase in the amount of Ti 3+ ions of the as-pre-
T3 < T2 < T1. The specific surface area increases in the pared TiO2 coating films.
order T1 < T3 < T2 as expected from the porosity data
in Fig. 4 and the capacitance data obtained by the
impedance analysis, The capacitances measured at 0 V
Acknowledgments
(with respect to a saturated calomel electrode) in a
solution o f p H 7 were 0.14 F m - 2 for T1, 0.24 F m -2 for
The authors would like to express their sincere grati-
T2, and 0.21 F m - 2 for T3, which obviously indicates
tude to the Asahi Glass Foundation for Industrial
that the specific surface area increases in the order
Technology for the financial support. This work was
T1 < T3 < T2 in accordance with the porosity data. In
also supported in part by a Grant-in-Aid for Scientific
addition, it was also found from the impedance analysis
Research from the Ministry of Education, Science and
of the TiO2 film electrodes that the TiO2 film resistance
Culture, Japan.
in the dark is 470 f~ for T1,340 f~ for T2 and 180 f~ for
T3 samples, decreasing in the order of T1, T2 and T3
samples. These facts suggest that higher crystallinity,
lower resistance and larger specific surface area result in References
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Springer, Heidelberg, 1991, p. 89.
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play an essential role in the decomposition of water 4 T. Yoko, K. Kamiya and S. Sakka, Yogyo Kyokai Shi, 95 (1987)
150.
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concentration of Ti 3+ in the T3 sample can easily be (1988) 259.
11 C. Sanchez, F. Babonneau, S. Doeuff and A. Leaustic, in J. D.
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The effects of the additives in the dip coating solu- 16 T. Yoko, L. Hu, H. Kozuka and S. Sakka, to be submitted to J.
tions on the properties of the resultant TiO2 coating Electroanal. Chem.

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