Documente Academic
Documente Profesional
Documente Cultură
Number of Iterations
Convergence Rate
250 2.5
differences in the VI scheme [4,5] and the DIPIE
scheme. In each of the Pull-In search points in the 200 2
0.376 0.376
0.375 0.375
0.374 0.374
(a) (b)
0.373 0.373
0 0.005 0.01 0.015 0 0.005 0.01 0.015
1/(Number of Nodes) 1/(Number of Nodes)
9.02 9.02
DIPIE VI
9.01 9.01
9 9
Pull-In Voltage
Pull-In Voltage
8.99 8.99
8.98 8.98
1e-2
8.97 1e-3 8.97
1e-4
1e-5 1e-2
8.96 fit 1e-2
8.96 1e-3
fit 1e-3 1e-4
8.95 fit 1e-4 8.95 1e-5
fit 1e-5 1e-6
(c) (d)
8.94 8.94
0 0.005 0.01 0.015 0 0.005 0.01 0.015 0.02
1/(Number of Nodes) 1/(Number of Nodes)
Figure 5 – Convergence with mesh and accuracy refinement for the DIPIE scheme (a) and (c), and VI scheme, (b) and (d).
14000 140
and requires a user input.
Run-Time Ratio
12000 120
10000 100
Furthermore, the DIPIE scheme can be easily
8000 80
implemented in existing MEMS CAD tools using
6000 60
separate electrostatic and mechanical fields solvers.
4000 40
2000
DIPIE
20
REFERENCES
0 -6
10 10
-5
10
-4
10
0
-3 [1] S.D. Senturia, “Microsystem Design”, Kluwer Academic
accuracy Press, Boston, 2001.
Figure 6 – DIPIE against VI schemes run-time vs. [2] O. Degani, Ph.D. dissertation, Supervised by Y. Nemirovsky,
accuracy. Technion, in progress.
[3] Y. Nemirovsky and O. Degani, JMEMS, 10(4), in press.
[4] P.M. Osterberg, Ph.D. Thesis, Supervised by S.D. Senturia,
SUMMARY MIT, September, 1995.
[5] R.K. Gupta, Ph.D. Thesis, Supervised by S.D. Senturia, MIT,
The qualities of the DIPIE scheme result from the June, 1997.
fact that the original inherently unstable physical [6] P. Osterberg et. al, MEMS’94, Oiso, January 1994, pp. 28-32.
[7] M. Fischer et. al, S&A A, 1998, 67, pp. 89-95.
problem of the voltage controlled electrostatic [8] E. K. Chan et. al, JMEMS, 8(2), June 1999, pp. 208-217.
actuator is replaced by an equivalent problem that is [9] S. D. Senturia, Proc. of the IEEE, 86(8), 1998, pp 1611-1626.
inherently stable. [10] D.S. Long et. al, MSM’2000, March 27-29, 2000.
To conclude, the main advantages of the DIPIE [11] L.J. Hornbeck, U.S. Patent 5,061,049, Oct. 1991.
[12] C.T.C. Nguyen et. al, Proc. of the IEEE, 86(8), pp. 1756-
scheme over the VI scheme are: 1768.
1. Runtime – over a 100 times faster. [13] D.L. Dickensheets and R.G. Kino, JMEMS, 7(1), pp. 38-47.
2. Accuracy – consistent convergence in both [14] Coventorware, Coventor Inc., see www.coventor.com
accuracy and mesh refinements whereas the VI [15] Intellisuite, Intellisense Corp., see www.intellisense.com
scheme is inconsistent and the pull-in
deformation is impractical to extract.