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Outline
References
Thickness
Refractive index
Pattern Transfer
Deposit photoresist Expose on contact aligner Plasma etch using SF6 chemistry Strip resist
20%, 80C
Break the wafer into die Mount the die on a metal plate Test using the Hysitron Nanoindenter
F
Testing
Cantilever
Youngs Modulus
Fixed-Fixed Beams
The Mask
Cantilever Data
F=kx
Force (m icroN ewtons)
12 10 8 6 4 2 0 0 100 200 300 400 500 600 Displacement (nanometers)
Force on a Beam
Uniaxial Stress
d2w = M EI dx2
H = thickness
W = width
I=
1 WH3 12
Reference: Senturia, S.D. Microsystems Design. Norwell, MA: Kluwer Academic Publisher, 2001.
POINT LOAD
MR 0 FR x L
Deflection of a Cantilever - 2
Deflection of a Cantilever - 3
Deflection of a Plate - 1
ANTICLASTIC CURVATURE
Poission effect leads to transverse strain y given by y=-x where is Poisson's ratio (unitless and about 1/3 for most materials) So y = z
Deflection of a Plate - 2
E But y is
constrained to be zero 0 = y = y x E
Replace Modulus(E) with Plate Modulus
Ref: Senturia (Kluwer)
Fall 2005 M.A. Schmidt 3.155J/6.152J Lecture 13 Slide 21
x =
x y
E x = 2 x 12 4 3 1 4
Plate Modulus
Fixed-Fixed Beam
1800
Load (m icroN ewtons)
1600 1400 1200 1000 800 600 400 200 0 0 500 1000 1500 2000 2500 3000 3500 Displacement (nanometers)
2WP0 = 20WH
0 H P0 = Leads to the Euler beam equation which is equivalent to a distributed load d 2w q0 = P0W = 0WH 2 dx Insert as added load into beam equation : d 4w EI 4 = q + q0 dx d 4w d 2w EI 4 0WH 2 = q dx dx
Ref: Senturia (6.777)
Graph found in Senturia, S.D. Microsystems Design. Norwell, MA: Kluwer Academic Publisher, 2001.
Important when
Compliant Supports
Cantilevers
Fixed-Fixed Beams
Residual stress
Experimental error
Compliant supports
Beam versus Plate
Others.