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Dr. King Lun Yeung Department of Chemical Engineering Hong Kong University of Science and Technology
H2 adsorption on palladium
Adsorption Surface process Absorption bulk process
H H H H H H H H H
H H HH H H H H H H H H H H H H H H
Nomenclature
Substrate or adsorbent: surface onto which adsorption can occur. example: catalyst surface, activated carbon, alumina Adsorbate: molecules or atoms that adsorb onto the substrate. example: nitrogen, hydrogen, carbon monoxide, water Adsorption: the process by which a molecule or atom adsorb onto a surface of substrate. Coverage: a measure of the extent of adsorption of a specie onto a surface Exposure: a measure of the amount of gas the surface had been exposed to ( 1 Langmuir = 10-6 torr s) coverage = fraction of surface sites occupied
H H H H H
H H H H H H H H
adsorbate adsorbent
Adsorption enthalpy
wide range (40-800 kJmol-1) heat of liquifaction (5-40 kJmol-1) marked difference for between crystal planes often dissociative and irreversible in many cases limited to a monolayer activated process independent of surface geometry non-dissociative and reversible multilayer occurs often fast, non-activated process
IR units: wavenumbers (cm-1), 10 micron wavelength = 1000 cm-1 Near-IR: 4000 14000 cm-1 Mid-IR: 500 4000 cm-1 Far-IR: 5 500 cm-1
http://infrared.als.lbl.gov/FTIRinfo.html
I.R. Measurement
O C O Symmetric Stretch
Assymmetric Stretch
I.R. Spectrum of NO on Pt
Adsorption decreases
Temperature increases
H- C N
H- C N
Pt
H- C N
Pt
CN
Pt 30 L HCN, 200 K dissociative chemisorption
(HCN) 2(HCN) (CN) (H-CN)
(a)
(b)
(c)
Adsorption Rate
Rads = k C x
x - kinetic order k - rate constant C - gas phase concentration
Rads = k P x
x - kinetic order k - rate constant P - partial pressure of molecule
Adsorption Rate
Molecular level event
Note: f() is a function of surface coverage special case of Langmuir adsorption f() = 1- E(), the activation energy is also affected by surface coverage
S also depends on
crystal planes and may be influenced by surface reconstruction.
Sticking Coefficient
Sticking Coefficient
Steering Effects
Surface Coverage ()
Estimation based on gas exposure
Adsorption Energetics
Potential energy (E) for adsorption is only dependent on distance between molecule and surface
adsorbate
surface
P.E. is assumed to be independent of: angular orientation of molecule changes in internal bond angles and lengths position of the molecule along the surface
Adsorption Energetics
Physisorption versus chemisorption
repulsive force
E(ads)
E(ads) Chemisorption
small minima large minima weak Van der Waal formation of surface attraction force chemical bonds
Chemisorption
surface
attractive forces
Physical Adsorption
Applications: surface area measurement pore size and volume determination pore size distribution
0.3 nm
E(d)
metal surface
where: n is the amount of gas adsorbed at P nm is the amount of gas in a monolayer P0 is the saturation pressure n at P = P0 C is a constant defined as:
BET Isotherm
Assumptions
adsorption takes place on the lattice and molecules stay put, first monolayer is adsorbed onto the solid surface and each layers can start before another is finished, except for the first layer, a molecule can be adsorbed on a given site in a layer (n) if the same site also exists in (n-1) layer, at saturation pressure (P0), the number of adsorbed layers is infinite (i.e., condensation), except for the first layer, the adsorption enthalpy (HL) is identical for each layers.
Activated Carbon
Applications: active surface area measurements surface site energetics catalytic site determination
CO
Pt surface
Note: there is no activation barrier for adsorption fast process, there us an activation barrier for desorption slow process.
E(d) d
physisorption chemisorption
H2 dissociation chemisorption
E(d)
E(d)
E(d)
direct chemisorption
Ea(ads) ~ 0
Ea(ads) > 0
- Eades = -E(ads)
~ -H(ads)
CH4
Krypton
(111)
(100)
O=O
NN
both molecular and dissociative chemisorption occurs. molecular chemisorption -donor or -acceptor interactions. dissociative chemisorption occupy highest co-ordinated surface sites, also causes surface distorsion.
(111)
(100)
CC metal carbide
forms metal carbides with metals located at the left-hand side of the periodic table. molecular chemisorption occurs on d-block metals (e.g., Cu, Ag) and transition metals
Ethene
2HC=CH2
furnace
catalyst
Pulse H2, O2 or CO gases
exhaust
100 l (STP)
1 g 0.10 wt. % Pt/-Al2O3 T = 423 K, P = 1 bar 3.75 peaks (H2) 4.50 peaks (O2)
exhaust
Isotherms
Langmuir isotherm
S - * + A(g) S-A
Adsorbed molecules surface sites H(ads) is independent of the process is reversible and is at equilibrium
K=
[S-M] [S - *] [A]
Isotherms
Langmuir isotherm Molecular chemisorption
b=
(1-) P
bP 1+ bP
Dissociative chemisorption
(bP)0.5 1+ (bP)0.5
0.8 0.6
0.4 0.2 0
P1
0.2
0.4
0.6
0.8
P1
Determination of H(ads)
( InP ) 1/T
=const
(ads) R
InP
(P1, T1)
(P2, T2)
0.6
0.8
P1
1/T
Adsorption Isotherms
bP << 1 = bP V = kP
where k = bV
bi P = =
H(ads)
In = =
Valid for low partial pressure most frequently used for describing pollutant adsorption on activated carbons
= A InBP
H(ads)
0.2 - 50 L
Applications: active surface area measurements surface site energetics catalytic site determination
CO
Pt surface
Note: there is no activation barrier for adsorption fast process, there us an activation barrier for desorption slow process.
[ ]
0.2 - 50 L
= Na
k exp (
-Ed ) RT
Linear heating rate T = T0 + t dT = dt Assuming k and Ed are independent of coverage and m = 1 (i.e., first order desorption)
Ed RTp2
k exp -Ed ( RT )
k exp -Ed ( RT )
slope, m Ea
[ ]
0.2 - 50 L
= 2(Na)p
k exp -Ed ( RT )
Characterized by a shift in the peak maxima toward lower temperature as the coverage increases
Sulfur-treated catalyst
Kelvin Probe
Measures the change in work function ()
Typical Kelvin probe for adsorption studies
Scanning Kelvin probe for surface work function (i.e., elemental and compositional) imaging also known as scanning electrical field microscopy
Kelvin Probe
Basic principle
is the least amount of energy needed for an electron to escape from metal to vacuum. is sensitive optical, electrical and mechanical properties of materials
bi P = =
H(ads)
In = =
Valid for low partial pressure most frequently used for describing pollutant adsorption on activated carbons
= A InBP
H(ads)
0.2 - 50 L
Applications: active surface area measurements surface site energetics catalytic site determination
CO
Pt surface
Note: there is no activation barrier for adsorption fast process, there us an activation barrier for desorption slow process.
[ ]
0.2 - 50 L
= Na
k exp (
-Ed ) RT
Linear heating rate T = T0 + t dT = dt Assuming k and Ed are independent of coverage and m = 1 (i.e., first order desorption)
Ed RTp2
k exp -Ed ( RT )
k exp -Ed ( RT )
slope, m Ea
[ ]
0.2 - 50 L
= 2(Na)p
k exp -Ed ( RT )
Characterized by a shift in the peak maxima toward lower temperature as the coverage increases
Sulfur-treated catalyst
Kelvin Probe
Measures the change in work function ()
Typical Kelvin probe for adsorption studies
Scanning Kelvin probe for surface work function (i.e., elemental and compositional) imaging also known as scanning electrical field microscopy
Kelvin Probe
Basic principle
is the least amount of energy needed for an electron to escape from metal to vacuum. is sensitive optical, electrical and mechanical properties of materials