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DYNAMICS
Inverter Dynamics
Dynamic Behavior
Delay Definitions
Voltage Transfer Characteristic
Switching Threshold
Propagation Delay
Transient Response
Inverter Sizing
Power Dissipation
Short Circuit Currents
Technology Scaling
EE415 VLSI Design
Dynamic Behavior
Propagation Delay, Tp
Defines how quickly output is affected by input
Measured between 50% transition from input to
output
tpLH defines delay for output going from low to high
tpHL defines delay for output going from high to low
Overall delay, tp, defined as the average of tpLH and
tpHL
EE415 VLSI Design
Dynamic Behavior
Rise and fall time, Tr and Tf
Defines slope of the signal
Defined between the 10% and 90% of the
signal swing
Propagation delay and rise and fall times
affected by the fan-out due to larger
capacitance loads
EE415 VLSI Design
Delay Definitions
Vin
50%
t
t
Vout
t
pLH
pHL
90%
50%
10%
tf
EE415 VLSI Design
tr
Ring Oscillator
v1
v0
v0
v2
v1
v3
v4
v5
T = 2 tp N
EE415 VLSI Design
v5
Voltage
Transfer
Characteristi
c
S
D
Vin
Vout
CL
D
G
S
IDn
V in = V DD +VGSp
IDn = - IDp
V out = VDD +VDSp
S
D
Vin
Vout
Vout
IDp
CL
D
G
Vin=0
IDn
IDn
V in=3
VGSp=-2
VGSp=-5
V DSp
Vin = V DD+VGSp
IDn = - IDp
Vin=0
Vin=3
VDSp
Vout = V DD+VDSp
Vout
IDn (A)
PMOS
NMOS
X 10-4
Vin = 0V
Vin = 2.5V
Vin = 0.5V
Vin = 2.0V
Vin = 1.0V
Vin = 2V
Vin = 1.5V
Vin = 1.0V
Vin = 0.5V
Vin = 1.5V
Vin = 2.0V
Vin = 2.5V
Vout (V)
Vin = 0V
0.25um, W/Ln = 1.5, W/Lp = 4.5, VDD = 2.5V, VTn = 0.4V, VTp = -0.4V
EE415 VLSI Design
Vout (V)
NMOS sat
PMOS res
NMOS sat
PMOS sat
NMOS res
PMOS sat
Vin (V)
EE415 VLSI Design
NMOS res
PMOS off
Cutoff
Linear
Saturation
pMOS
Vin -VDD=VGS< VT
Vin -VDD=VGS> VT
Vin -Vout=VGD< VT
Vin -Vout=VGD>VT
nMOS
Vin = VGS< VT
Vin =VGS> VT
Vin =VGS> VT
VDD
Regions of operations
For nMOS and pMOS
V
In CMOS inverter
S
D
in
Vout
D
G
S
EE415 VLSI Design
CL
Switching Threshold
(V0.5)
VDSAT(V)
k(A/V2)
(V-1)
NMOS
0.43
0.4
0.63
115 x 10-6
0.06
PMOS
-0.4
-0.4
-1
-30 x 10-6
-0.1
= 3.5
Simulated Inverter VM
VM is relatively insensitive to
variations in device ratio
setting the ratio to 3, 2.5
and 2 gives VMs of 1.22V,
1.18V, and 1.13V
VM (V)
~3.4
.1
(W/L)p/(W/L)n
Note: x-axis is semilog
EE415 VLSI Design
Noise Margins
Determining VIH and VIL
3
VOH = VDD
Vout
2
VM
VOL = GND 0
VIL
Vin VIH
A piece-wise linear
approximation of VTC
EE415 VLSI Design
Vout (V)
2.5
2
1.5
1
0.5
0
VM 1.25V, g = -27.5
VIL = 1.2V, VIH = 1.3V
NML = NMH = 1.2
0.5
1
Vin (V)
1.5
2.5
Output resistance
low-output = 2.4k
high-output = 3.3k
Gain Determinates
Vin
0
0.5
0
-2
-4
gain
-6
1.5
-8
-10
-12
-14
-16
-18
Determined by technology
parameters, especially .
Only designer influence through
supply voltage and VM (transistor
sizing).
Vout (V)
Variation
2.5
2
1.5
Bad PMOS
1 Good NMOS
0.5
0
0 0.5 1
Good PMOS
Bad NMOS
Nominal
Vin (V)
1.5
2.5
threshold
EE415 VLSI Design
Vout (V)
Vout (V)
Gain=-1
Vin (V)
Device threshold voltages are
kept (virtually) constant
Vin (V)
Device threshold voltages are
kept (virtually) constant
Propagation
Delay
VDD
Rp
Vout
Vout
CL
Rn
CL
Vin = V DD
Vin = 0
Gate response time is determined by the time to charge C L
through Rp (discharge CL through Rn)
EE415 VLSI Design
VDD
M2
Vin
Cg4
Cdb2
Cgd12
M4
Vout
M1
Cdb1
Cw
Vout2
Cg3
M3
Interconnect
Fanout
Simplified
Model
Vin
Vout
CL
Delay
Approach 1
VDD
tpHL = CL Vswing/2
Iav
Vout
Iav
Vin = V DD
EE415 VLSI Design
CL
CL
kn VDD
tpHL = f(Ron.CL)
= 0.69 RonCL
Vout
CL
Ron
ln(0.5)
Vout
1
VDD
Vout VOH e
t /( Ron C L )
0.5
0.36
Vin = V DD
RonCL
EE415 VLSI Design
+
vgs
gmvgs
Define
ro
Transient Response
3
2.5
tp = 0.69 CL
(Reqn+Reqp)/2
2
Vout(V)
tpLH
tpHL
1.5
1
0.5
0
-0.5
0
0.5
t (sec)
1.5
2.5
-10
x 10
Inverter Transient
Response
3
VDD=2.5V
0.25m
W/Ln = 1.5
W/Lp = 4.5
Reqn= 13 k ( 1.5)
Reqp= 31 k ( 4.5)
Vin
2.5
2
Vout (V)
1.5
tpHL
tf
tpLH
tr
0.5
tpHL = 36 psec
tpLH = 29 psec
-0.5
0
0.5
1.5
t (sec)
2.5
x 10-10
so
tp = 32.5 psec
tp(normalized)
4.5
4
3.5
3
2.5
2
1.5
1
0.8
1.2
1.4
1.6
VDD(V)
1.8
2.2
2.4
3.8
3.6
3.4
3.2
tp(sec)
3
2.8
2.6
2.4
2.2
2
1
S
EE415 VLSI Design
11
13
15
self-loading effect
(intrinsic capacitance
dominates)
tpLH
tpHL
tp(sec)
tp
= (W/Lp)/(W/Ln)
of 2.4 (= 31 k/13 k)
gives symmetrical
response
of 1.6 to 1.9 gives
optimal performance
tp(sec)
x 10-11
ts(sec)
for a minimum-size inverter
with a fan-out of a single gate
x 10-11
Inverter
Sizing
In
metal1-poly via
polysilicon
VDD
PMOS (4/.24 = 16/1)
NMOS (2/.24 = 8/1)
ndiff
GND
metal2-metal1 via
Inverter Delay
Minimum length devices, L=0.25m
Assume that for WP = 2WN =2W
same pull-up and pull-down currents
approx. equal resistances RN = RP
approx. equal rise tpLH and fall tpHL delays
Analyze as an RC network
1
1
WP
WN
RP Runit
Runit
RN RW
Wunit
Wunit
Delay (D): tpHL = (ln 2) RNCL
Load for the next stage:
EE415 VLSI Design
C gin
W
3
Cunit
Wunit
2W
RW
CL
RW
Load (CL)
tp = k RWCL
k is a constant, equal to 0.69
Assumptions: no load -> zero delay
EE415 VLSI Design
Wunit = 1
Delay
2W
W
Cint
CL
CN = Cunit
Delay = kRW(Cint + CL) = kRW Cint(1+ CL /Cint)
= Delay (Internal) + Delay (Load)
EE415 VLSI Design
Load
Delay Formula
t p kR W C int 1 C L / C int t p 0 1 f /
Cint = Cgin
with 1
f = CL/Cgin
effective fanout
R = Runit/W ;
tp0 = 0.69RunitCunit
EE415 VLSI Design
Cint =WCunit
Inverter Chain
In
Out
Cg,1
and
so
If CL is given
How should the inverters be sized?
How many stages are needed to minimize the delay?
CL
F C L / C gin ,1
f NF
Minimum path delay
t p Nt p 0 1 N F /
EE415 VLSI Design
Example
In
C1
Out
1
f2
CL= 8 C1
f 38 2
t p 3t p 0 1 2 /
Notice that in this case we may not have any time savings
EE415 VLSI Design
Optimal Number of
Inverters
Optimum Number of
Stages
For a given load, CL and given input capacitance Cin
Find optimal sizing f
ln F
N
C L F Cin f Cin with N
ln f
t p Nt p 0 F
1/ N
/ 1
t p 0 ln F
t p t p 0 ln F ln f 1
ln 2 f
For = 0, f = e, N = lnF
EE415 VLSI Design
ln f ln f
f
0
f exp1 f
normalized delay
Fop
Example of Inverter
(Buffer) Staging
1
Cg,1 = 1
CL = 64 Cg,1
8
1
Cg,1 = 1
tp
64
65
18
15
2.8
15.3
16
Cg,1 = 1
1
CL = 64 Cg,1
4
2.8
Cg,1 = 1
EE415 VLSI Design
CL = 64 Cg,1
8
22.6
CL = 64 Cg,1
F ( = 1)
Unbuffered
Two Stage
Chain
Opt. Inverter
Chain
10
11
8.3
8.3
100
101
22
16.5
1,000
1001
65
24.8
10,000
10,001
202
33.1
Design Challenge
Power
Dissipation
Power Dissipation
Power consumption determines heat dissipation and
energy consumption
Power influences design decisions:
packaging and cooling
width of supply lines
power-supply capacity
# of transistors integrated on a single chip
Power requirements make high density bipolar ICs
impossible (feasibility, cost, reliability)
EE415 VLSI Design
Power Dissipation
Supplyline sizing
Battery
drain,
cooling
Power Dissipation
Ppeak = static power + dynamic power
Dynamic power:
(dis)charging capacitors
temporary paths from VDD to VSS
proportional to switching frequency
Static power:
static conductive paths between rails
leakage
increases with temperature
EE415 VLSI Design
Power Dissipation
Propagation delay is related to power
consumption
tp determined by speed of charge transfer
fast charge transfer => fast gate
fast gate => more power consumption
Power-delay product (PDP)
quality measure for switching device
PDP = energy consumed /gate / switching
event
measured using ring oscillator
EE415 VLSI Design
Power Dissipation
Supplyline sizing
Battery
drain,
cooling
Dynamic Power
Dissipation
Vdd
Vin
Vout
CL
Energy/transition = CL * Vdd2
Power = Energy/transition * f = CL * Vdd2 * f
E 0 1 = CL Vdd V dd Vt
= C V 2 n N
N
L
dd
01
n N
lim
N N
P av g = 0 1 C Vdd 2 f clk
L
Vin
Vout
CL
IVDD (mA)
0.15
0.10
0.05
0.0
1.0
2.0
3.0
Vin (V)
4.0
5.0
Vdd =3.3
Vdd =2.5
Pnorm
5
4
3
Vdd =1.5
2
1
0
tsin/tsout
Leakage
Vdd
Vout
Drain Junction
Leakage
Sub-Threshold
Current
p+
p+
ReverseLeakageCurrent
+
V
dd
IDL=JSA
Istat
Vin =5V
Vout
CL
Bad News
Ed Nowak, IBM
Impact of
Technology
Scaling
Goals of Technology
Scaling
Technology Scaling
Technology Nodes
Green
in use
Orange
- in development
Blue
in plans
Technology Nodes
350
180
100
50
25
13
http://broadband02.ici.ro/program/klingenstein_3d.pdf
EE415 VLSI Design
http://broadband02.ici.ro/program/klingenstein_3d.pdf
Leakage currents
Currents [A/m]
http://broadband02.ici.ro/program/klingenstein_3d.pdf
Supply voltage
http://broadband02.ici.ro/program/klingenstein_3d.pdf
LMDS
RADAR
Automotive Military
76...78 94
201
6
201
3
201
0
200
7
http://broadband02.ici.ro/program/klingenstein_3d.pdf
200
4
EE415 VLSI Design
200
CMOS
SiGe-BICMOS
III-V (InP)
Technology Scaling
10
10
10
10
-1
-2
10
1960
1970
1980
1990
Year
2000
2010
Technology Scaling
tp decreases by
13%/year
50% every
5 years!
Propagation Delay
General Scaling
most realistic for todays situation
voltages and dimensions scale with different factors
EE415 VLSI Design
Transistor Scaling
(velocity-saturated devices)
Dilbert