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2011 - Chemical Effect On The Material Removal Rate in The CMP of Silicon Wafers 0% au considerat acest document utilComparative Analysis of Dry-EDM and Conventional EDM For The Manufacturing of Micro Holes in Si3N4-TiN 0% au considerat acest document util2005 - The Effect of Anisotropic Wet Etching On The Surface Roughness Parametersand Micro Nanoscale Friction Behavior of Si (1 0 0) Surfaces 0% au considerat acest document util2007 - Study On Optical Polishing of Optical Glass by Means of Ultrasonic Magnetorheological Compound Finishing 0% au considerat acest document utilAn Investigation of Ultrasonic-Assisted Electrical Discharge Machining in Gas 0% au considerat acest document utilBoiler Basics PDF 0% au considerat acest document util2004 - Experimental Investigation On Mechanisms of Silicon Chemical Mechanical Polishing 0% au considerat acest document util2002 - A Micro-Contact and Wear Model For Chemical-Mechanical Polishing of Silicon Wafers 0% au considerat acest document utilDefects in Crystals 0% au considerat acest document utilTrue Stress PDF 0% au considerat acest document utilAfter GATE PDF 0% au considerat acest document util